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    Multi-axis differential interferometer
    2.
    发明授权
    Multi-axis differential interferometer 有权
    多轴差分干涉仪

    公开(公告)号：US09551563B2

    公开(公告)日：2017-01-24

    申请号：US14431765

    申请日：2013-09-26

    Applicant: Mapper Lithography IP B.V.

    Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

    IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14 ,  H01J37/317

    CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

    Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

    Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

    MULTI-AXIS DIFFERENTIAL INTERFEROMETER
    4.
    发明申请
    MULTI-AXIS DIFFERENTIAL INTERFEROMETER 有权
    多轴差分干涉仪

    公开(公告)号：US20150241200A1

    公开(公告)日：2015-08-27

    申请号：US14431765

    申请日：2013-09-26

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

    IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14

    CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

    Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

    Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

    INTERFEROMETER MODULE
    5.
    发明申请
    INTERFEROMETER MODULE 审中-公开
    干燥器模块

    公开(公告)号：US20150268032A1

    公开(公告)日：2015-09-24

    申请号：US14716801

    申请日：2015-05-19

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Guido de Boer ,  Thomas Adrian Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

    IPC: G01B9/02

    CPC classification number: G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

    Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

    Abstract translation: 本发明涉及一种用于测量参考反射镜和测量镜之间的位移方向的差分干涉仪模块。 在一个实施例中，差分干涉仪模块适于朝向第一反射镜发射三个参考光束，并且三个测量光束朝向第二反射镜发射以确定所述第一和第二反射镜之间的位移。 在优选实施例中，相同的模块也用于测量围绕两个垂直轴的相对旋转。 本发明还涉及包括这种干涉仪模块的光刻系统和用于测量这种位移和旋转的方法。

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