公开(公告)号：US09423699B2

公开(公告)日：2016-08-23

申请号：US13323520

申请日：2011-12-12

Applicant: Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。

公开(公告)号：US08395772B2

公开(公告)日：2013-03-12

申请号：US12818358

申请日：2010-06-18

Applicant: Henricus Wilhelmus Maria Van Buel ,  Jeroen Thomas Broekhuijse ,  Vitaliy Prosyentsov ,  Sandra Van Der Graaf ,  Nina Vladimirovna Dziomkina

Inventor： Henricus Wilhelmus Maria Van Buel ,  Jeroen Thomas Broekhuijse ,  Vitaliy Prosyentsov ,  Sandra Van Der Graaf ,  Nina Vladimirovna Dziomkina

IPC: G01N21/00

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70616

Abstract: A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.

Abstract translation: 公开了一种用于浸没系统的传感器。 传感器包括：感测装置，透明层和不透明图案层。 感测装置被配置为感测辐射束的特性。 透明层构造成允许辐射束通过其中。 透明层覆盖感测装置。 不透明图案层被配置为赋予辐射束图案。 在图形层中是位于填充材料的开口。 填充材料对辐射束是透明的，并且具有与透明层相似的折射率。

公开(公告)号：US20180081284A1

公开(公告)日：2018-03-22

申请号：US15823247

申请日：2017-11-27

Applicant: Raymond Wilhelmus Louis LAFARRE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Paramod KARADE ,  Elisabeth Corinne RODENBURG ,  Peter VAN DELFT

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Paramod KARADE ,  Elisabeth Corinne RODENBURG ,  Peter VAN DELFT

IPC: G03F7/20 ,  B05D1/00

CPC classification number: G03F7/70691 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

公开(公告)号：US08889042B2

公开(公告)日：2014-11-18

申请号：US12367000

申请日：2009-02-06

Applicant: Nina Vladimirovna Dziomkina

Inventor： Nina Vladimirovna Dziomkina

IPC: F21V9/06 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/2041 ,  G03F7/2043 ,  G03F7/70341 ,  G03F7/70958

Abstract: A coating is disclosed. The coating may be used in an apparatus having a radiation source, e.g. a lithographic apparatus. The coating comprises the elements Si, O, F and, optionally, C and H. An article is also disclosed. The article may be any one of the group consisting of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a confinement structure. At least a portion of a surface of the article is coated with a coating. The coating comprises the elements Si, O, F and, optionally, C and H. The coating may comprise the elements Si, O, C and H.

Abstract translation: 公开了一种涂层。 该涂层可用于具有辐射源的设备中，例如， 光刻设备。 涂层包含元素Si，O，F以及任选的C和H.还公开了一种制品。 该物品可以是由衬底台，光学元件，遮挡构件，传感器，投影系统和限制结构组成的组中的任何一个。 制品的表面的至少一部分涂覆有涂层。 涂层包含元素Si，O，F以及任选的C和H.涂层可以包括元素Si，O，C和H.

公开(公告)号：US20110199592A1

公开(公告)日：2011-08-18

申请号：US12946618

申请日：2010-11-15

Applicant: Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

Inventor： Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

IPC: G03B27/52 ,  C09J7/00 ,  F16J15/02

CPC classification number: C09J7/0217 ,  B32B2307/546 ,  B32B2307/56 ,  B32B2307/71 ,  B32B2307/73 ,  B32B2405/00 ,  C09J7/21 ,  C09J7/385 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/7095 ,  Y10T428/28 ,  Y10T428/2843 ,  Y10T428/2848 ,  Y10T428/2852

Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

Abstract translation: 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。

公开(公告)号：US20110135839A1

公开(公告)日：2011-06-09

申请号：US12956843

申请日：2010-11-30

Applicant: Nina Vladimirovna DZIOMKINA

Inventor： Nina Vladimirovna DZIOMKINA

IPC: C23C16/00 ,  B05C5/00 ,  B05D3/06 ,  B05D3/00

CPC classification number: G03F7/70341 ,  C23C16/30 ,  G03F7/7095

Abstract: A method of forming a lyophobic coating on a surface having oxidized groups is disclosed. The method includes bringing into contact with the surface a silane or siloxane having the formula SiX4 wherein each X is the same or different, wherein at least one X is a leaving group and at least one X is a lyophobic group.

Abstract translation: 公开了在具有氧化基团的表面上形成疏液涂层的方法。 该方法包括使表面接触具有式SiX4的硅烷或硅氧烷，其中每个X相同或不同，其中至少一个X是离去基团，至少一个X是疏液基团。

公开(公告)号：US20100279232A1

公开(公告)日：2010-11-04

申请号：US12756735

申请日：2010-04-08

Applicant: Nina Vladimirovna Dziomkina ,  Olga Vladimirovna Elisseeva

Inventor： Nina Vladimirovna Dziomkina ,  Olga Vladimirovna Elisseeva

IPC: G03F7/20 ,  G03B27/72 ,  G03B27/58

CPC classification number: G03B27/58 ,  G03F7/70341 ,  G03F7/70716

Abstract: An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Ra that is less than or equal to 0.2 μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid.

Abstract translation: 浸没式光刻设备具有使用中浸入液体接触的表面，表面具有小于或等于0.2μm的表面粗糙度Ra。 表面上的浸液可具有60°或更大的接触角。 表面可能能够保持其性质，使得表面上的浸没液体可能具有浸入浸液的长时间的接触角。

公开(公告)号：US20100060870A1

公开(公告)日：2010-03-11

申请号：US12555301

申请日：2009-09-08

Applicant: Nina Vladimirovna DZIOMKINA ,  Nicolaas TEN KATE ,  Sandra VAN DER GRAAF ,  Henricus Jozef CASTELIJNS

Inventor： Nina Vladimirovna DZIOMKINA ,  Nicolaas TEN KATE ,  Sandra VAN DER GRAAF ,  Henricus Jozef CASTELIJNS

IPC: G03B27/52 ,  C23C16/00

CPC classification number: G03B27/52 ,  C23C16/45555 ,  G03F7/70341 ,  G03F7/70916 ,  G03F7/7095

Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.

Abstract translation: 公开了一种光刻设备，其中将特定涂层施加到特定表面。 涂层由至少99wt％的以下至少一种制成：过渡金属氧化物; 不良金属氧化物，硫化物或硒化物; 具有式ATiOn的化合物，其中A是元素周期表第2族的元素; 或掺杂有周期表第3,5或7族金属的TiO 2，其中涂层小于或等于49nm厚。

公开(公告)号：US09316927B2

公开(公告)日：2016-04-19

申请号：US13648069

申请日：2012-10-09

Applicant: Raymond Wilhelmus Louis LaFarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Peter Van Delft

Inventor： Raymond Wilhelmus Louis LaFarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Peter Van Delft

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。

公开(公告)号：US20130077065A1

公开(公告)日：2013-03-28

申请号：US13623790

申请日：2012-09-20

Applicant: Raymond Wilhelmus Louis LAFARRE ,  Roelof Frederik De Graaf ,  Niek Jacobus Johannes Roset ,  Arjan Hubrecht Josef Anna Martens ,  Alexander Nikolov Zdravkov ,  Kornelis Tijmen Hoekerd ,  Nina Vladimirovna Dziomkina

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Roelof Frederik De Graaf ,  Niek Jacobus Johannes Roset ,  Arjan Hubrecht Josef Anna Martens ,  Alexander Nikolov Zdravkov ,  Kornelis Tijmen Hoekerd ,  Nina Vladimirovna Dziomkina

IPC: G03F7/20 ,  B32B3/02 ,  B08B3/04

CPC classification number: G03F7/2041 ,  B08B1/00 ,  B08B3/04 ,  B08B7/0028 ,  B08B7/0035 ,  B32B3/02 ,  B32B2432/00 ,  G03F7/70341 ,  G03F7/70908 ,  G03F7/70925 ,  Y10T428/24355 ,  Y10T428/24752

Abstract: A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.

Abstract translation: 一种用于清洁盖子以密封位于桌子的凹部中的物体与在桌子的上表面之间的间隙的方法和设备。 公开了在线和离线布置。 可以使用磨损，紫外线辐射或用清洁液冲洗来进行清洁。