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公开(公告)号：US20070285644A1
公开(公告)日：2007-12-13
申请号：US11575042
申请日：2005-09-13
申请人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
发明人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.
摘要翻译： 用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。 照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。 该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配 目的。
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公开(公告)号：US08873151B2
公开(公告)日：2014-10-28
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
摘要翻译： 微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。 冷凝器具有包含多个连续透镜的透镜组。 这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。 透镜组的至少一个透镜具有凹面。 照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。
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3.发明授权Projection exposure apparatus, projection exposure method and projection objective 有权投影曝光装置，投影曝光方法和投影物镜公开(公告)号：US07834981B2
公开(公告)日：2010-11-16
申请号：US11747630
申请日：2007-05-11
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
摘要翻译： 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽＆Dgr;λ>10μm的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。
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4.发明申请Method of manufacturing projection objectives and set of projection objectives manufactured by that method 审中-公开通过该方法制造投影物镜和投影物镜组的方法公开(公告)号：US20070013882A1
公开(公告)日：2007-01-18
申请号：US11447996
申请日：2006-06-07
申请人： Aurelian Dodoc , Wilhelm Ulrich , Heiko Feldmann
发明人： Aurelian Dodoc , Wilhelm Ulrich , Heiko Feldmann
IPC分类号： G03B21/00
CPC分类号： G02B27/0012 , G03B21/006 , G03F7/70225 , G03F7/70233 , G03F7/70241 , G03F7/705
摘要： In a method of manufacturing projection objectives including defining an initial design for a projection objective and optimizing the design using a merit function, a set of related projection objectives including a first projection objective and at least one second projection objective is defined. Further, a plurality of merit function components, each of which reflects a particular quality parameter, is defined. One of these merit function components defines a common module requirement requiring that the first projection objective and the second projection objective each include at least one common optical module that is constructed to be substantially identical for the first and the second projection objective. The method results in a set of projection objectives having at least one common optical module. Employing the method in the manufacturing of complex projection objectives, such as projection objectives for microlithography, facilitates the manufacturing process and allows substantial cost savings.
摘要翻译： 在制造投影物镜的方法中，包括定义投影物镜的初始设计并使用优值函数优化设计，定义了包括第一投影物镜和至少一个第二投影物镜的一组相关投影物镜。 此外，定义了反映特定质量参数的多个优点函数分量。 这些优点功能部件中的一个定义了共同的模块要求，其要求第一投影物镜和第二投影物镜每个包括至少一个共同的光学模块，其被构造为对于第一和第二投影物镜基本相同。 该方法产生一组具有至少一个公共光学模块的投影物镜。 采用该方法制造复杂的投影物镜，例如用于微光刻的投影物镜，便于制造过程，并且可以节省大量成本。
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公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译： 本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台 。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位 到所述透镜系统的光轴。
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6.发明申请公开(公告)号：US20080273248A1
公开(公告)日：2008-11-06
申请号：US11420103
申请日：2006-05-24
IPC分类号： G02B3/12
CPC分类号： G02B13/143 , G03F7/70341
摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.
摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。
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公开(公告)号：US20080192359A1
公开(公告)日：2008-08-14
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
IPC分类号： G02B27/18
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).
摘要翻译： 微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。 冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。 这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。 透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。 照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。
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8.发明申请PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND PROJECTION OBJECTIVE 有权投影曝光装置，投影曝光方法和投影目标公开(公告)号：US20080117400A1
公开(公告)日：2008-05-22
申请号：US11747630
申请日：2007-05-11
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
摘要翻译： 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽为10mPa的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。
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公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。
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公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。
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