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    Microlithographic Projection Exposure Apparatus
    1.
    发明申请
    Microlithographic Projection Exposure Apparatus 审中-公开
    微光刻投影曝光装置

    公开(公告)号：US20070285644A1

    公开(公告)日：2007-12-13

    申请号：US11575042

    申请日：2005-09-13

    申请人： Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

    发明人： Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G03F7/70066

    摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.

    摘要翻译： 用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。 照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。 该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配 目的。

    Illumination system for a microlithography projection exposure apparatus
    2.
    发明申请
    Illumination system for a microlithography projection exposure apparatus 审中-公开
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US20060126049A1

    公开(公告)日：2006-06-15

    申请号：US11271844

    申请日：2005-11-14

    申请人： Markus Deguenther ,  Johannes Wangler ,  Markus Brotsack ,  Ella Mizkewitsch

    发明人： Markus Deguenther ,  Johannes Wangler ,  Markus Brotsack ,  Ella Mizkewitsch

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70075 ,  G03F7/70091

    摘要： An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.

    摘要翻译： 用于微光刻投影曝光装置的照明系统设计成用具有可预定程度的一致性sigma的照明辐射照射照明场，可以在相干范围内的相干程度范围内调整相干度 相干度显着小于σ= 0.2。 照明系统可以具有用于在光混合装置的入射面中产生可预定的光分布的第一光学系统，以及用于均匀化入射辐射的光混合装置。 在每种情况下，可以在对应于不同程度的相干范围的多个配置之间改变第一光学系统和光混合装置。 相干度的重叠程度重叠，其尺寸使得所产生的总相干度范围大于相干范围的个体程度。

    Illumination system for a microlithography projection exposure installation
    9.
    发明授权
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US07714983B2

    公开(公告)日：2010-05-11

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。