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    Substrate processing system and substrate processing program
    1.
    发明授权
    Substrate processing system and substrate processing program 有权
    基板加工系统和基板加工程序

    公开(公告)号：US09303976B2

    公开(公告)日：2016-04-05

    申请号：US13456458

    申请日：2012-04-26

    申请人： Masahiro Uekita ,  Hiroshi Koizumi ,  Tomomichi Naka ,  Naoaki Sakurai ,  Eijiro Koike

    发明人： Masahiro Uekita ,  Hiroshi Koizumi ,  Tomomichi Naka ,  Naoaki Sakurai ,  Eijiro Koike

    IPC分类号： G06F19/00 ,  G06F15/00 ,  G01B11/06 ,  G01N21/64 ,  G01N21/66

    CPC分类号： G01B11/06 ,  G01N21/64 ,  G01N21/66 ,  G01N2021/6421 ,  H01L2933/0041

    摘要： According to one embodiment, a substrate processing system includes a measuring unit, a data processing unit, and a processing unit. The measuring unit is configured to measure information relating to a thickness dimension of a substrate. The substrate includes a light emitting unit and a wavelength conversion unit. The wavelength conversion unit includes a phosphor. The data processing unit is configured to determine processing information relating to a thickness direction of the wavelength conversion unit based on the measured information relating to the thickness dimension of the substrate and based on information relating to a characteristic of light emitted from the light emitting unit. The processing unit is configured to perform processing of the wavelength conversion unit based on the determined processing information.

    摘要翻译： 根据一个实施例，基板处理系统包括测量单元，数据处理单元和处理单元。 测量单元被配置为测量与衬底的厚度尺寸有关的信息。 基板包括发光单元和波长转换单元。 波长转换单元包括荧光体。 数据处理单元被配置为基于与基板的厚度尺寸相关的测量信息，并且基于与从发光单元发射的光的特性相关的信息来确定与波长转换单元的厚度方向有关的处理信息。 处理单元被配置为基于所确定的处理信息来执行波长转换单元的处理。

    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING PROGRAM
    2.
    发明申请
    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING PROGRAM 有权
    基板处理系统和基板处理程序

    公开(公告)号：US20120277896A1

    公开(公告)日：2012-11-01

    申请号：US13456458

    申请日：2012-04-26

    申请人： Masahiro Uekita ,  Hiroshi Koizumi ,  Tomomichi Naka ,  Naoaki Sakurai ,  Eijiro Koike

    发明人： Masahiro Uekita ,  Hiroshi Koizumi ,  Tomomichi Naka ,  Naoaki Sakurai ,  Eijiro Koike

    IPC分类号： G06F19/00 ,  G06F15/00 ,  G01B11/06

    CPC分类号： G01B11/06 ,  G01N21/64 ,  G01N21/66 ,  G01N2021/6421 ,  H01L2933/0041

    摘要： According to one embodiment, a substrate processing system includes a measuring unit, a data processing unit, and a processing unit. The measuring unit is configured to measure information relating to a thickness dimension of a substrate. The substrate includes a light emitting unit and a wavelength conversion unit. The wavelength conversion unit includes a phosphor. The data processing unit is configured to determine processing information relating to a thickness direction of the wavelength conversion unit based on the measured information relating to the thickness dimension of the substrate and based on information relating to a characteristic of light emitted from the light emitting unit. The processing unit is configured to perform processing of the wavelength conversion unit based on the determined processing information.

    摘要翻译： 根据一个实施例，基板处理系统包括测量单元，数据处理单元和处理单元。 测量单元被配置为测量与衬底的厚度尺寸有关的信息。 基板包括发光单元和波长转换单元。 波长转换单元包括荧光体。 数据处理单元被配置为基于与基板的厚度尺寸相关的测量信息，并且基于与从发光单元发射的光的特性相关的信息来确定与波长转换单元的厚度方向有关的处理信息。 处理单元被配置为基于所确定的处理信息来执行波长转换单元的处理。

    Diffraction optical element, molding die for the optical element and manufacturing method thereof
    5.
    发明授权
    Diffraction optical element, molding die for the optical element and manufacturing method thereof 有权
    衍射光学元件，用于光学元件的成型模具及其制造方法

    公开(公告)号：US07911921B2

    公开(公告)日：2011-03-22

    申请号：US12175557

    申请日：2008-07-18

    申请人： Hideki Ide ,  Masahiro Uekita ,  Eijiro Koike

    发明人： Hideki Ide ,  Masahiro Uekita ,  Eijiro Koike

    IPC分类号： G11B7/00

    CPC分类号： G02B5/1866 ,  G02B5/1847 ,  G02B27/0018

    摘要： A diffraction optical element is provided to reduce harmful lights and also suppress deterioration in the optical characteristics of the element. The diffraction optical element 22 is formed with a plurality of diffraction gratings 17′, 18′, 19′ and 20′. From these diffraction gratings, there are selected the diffraction gratings 18′, 19′ and 20′ whose groove apex angles are less than a predetermined angle. The diffraction gratings 18′, 19′ and 20′ has chamfer surfaces 18c′, 19c′ and 20c′ formed on the lower side of respective slanted surfaces 18a′, 19a′ and 20a′. The chamfer surfaces 18c′, 19c′ and 20c′ are slanted to the slanted surfaces 18a′, 19a′ and 20a′, respectively.

    摘要翻译： 提供衍射光学元件以减少有害光并且还抑制元件的光学特性的劣化。 衍射光学元件22形成有多个衍射光栅17'，18'，19'和20'。 从这些衍射光栅中，选择其凹槽顶角小于预定角度的衍射光栅18'，19'和20'。 衍射光栅18'，19'和20'具有形成在相应倾斜表面18a'，19a'和20a'的下侧上的倒角表面18c'，19c'和20c'。 倒角表面18c'，19c'和20c'分别倾斜到倾斜表面18a'，19a'和20a'。

    DIFFRACTION OPTICAL ELEMENT, MOLDING DIE FOR THE OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF
    6.
    发明申请
    DIFFRACTION OPTICAL ELEMENT, MOLDING DIE FOR THE OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF 有权
    衍射光学元件，光学元件成型模具及其制造方法

    公开(公告)号：US20090022036A1

    公开(公告)日：2009-01-22

    申请号：US12175557

    申请日：2008-07-18

    申请人： Hideki Ide ,  Masahiro Uekita ,  Eijiro Koike

    发明人： Hideki Ide ,  Masahiro Uekita ,  Eijiro Koike

    IPC分类号： G11B7/00

    CPC分类号： G02B5/1866 ,  G02B5/1847 ,  G02B27/0018

    摘要： A diffraction optical element is provided to reduce harmful lights and also suppress deterioration in the optical characteristics of the element. The diffraction optical element 22 is formed with a plurality of diffraction gratings 17′, 18′, 19′ and 20′. From these diffraction gratings, there are selected the diffraction gratings 18′, 19′ and 20′ whose groove apex angles are less than a predetermined angle. The diffraction gratings 18′, 19′ and 20′ has chamfer surfaces 18c′, 19c′ and 20c′ formed on the lower side of respective slanted surfaces 18a′, 19a′ and 20a′. The chamfer surfaces 18c′, 19c′ and 20c′ are slanted to the slanted surfaces 18a′, 19a′ and 20a′, respectively.

    摘要翻译： 提供衍射光学元件以减少有害光并且还抑制元件的光学特性的劣化。 衍射光学元件22形成有多个衍射光栅17'，18'，19'和20'。 从这些衍射光栅中，选择其凹槽顶角小于预定角度的衍射光栅18'，19'和20'。 衍射光栅18'，19'和20'具有形成在相应倾斜表面18a'，19a'和20a'的下侧上的倒角表面18c'，19c'和20c'。 倒角表面18c'，19c'和20c'分别倾斜到倾斜表面18a'，19a'和20a'。

    Method for manufacturing a nozzle plate and a droplet dispensing head
    7.
    发明授权
    Method for manufacturing a nozzle plate and a droplet dispensing head 有权
    喷嘴板和液滴分配头的制造方法

    公开(公告)号：US08869400B2

    公开(公告)日：2014-10-28

    申请号：US11859109

    申请日：2007-09-21

    申请人： Masahiro Uekita

    发明人： Masahiro Uekita

    IPC分类号： B41J2/16 ,  B41J2/145 ,  B41J2/14

    CPC分类号： B41J2/1433 ,  B41J2/162 ,  B41J2/1625 ,  B41J2/1632 ,  B41J2/164 ,  Y10T29/42 ,  Y10T29/49083 ,  Y10T29/49126 ,  Y10T29/49401

    摘要： A nozzle plate includes: a flow channel opening in a first surface of the nozzle plate; a liquid chamber communicating with the flow channel; and a nozzle hole communicating with the liquid chamber and opening in a second surface of the nozzle plate. The liquid chamber has a flat portion which is substantially parallel to the second surface. The nozzle hole communicates with the liquid chamber in the flat portion. A method for producing a nozzle plate includes: forming a liquid chamber which opens in a first surface of a plate-like body; forming a flat portion in a bottom of the liquid chamber; and forming a nozzle hole which communicates with the flat portion and opens in a second surface of the plate-like body.

    摘要翻译： 喷嘴板包括：在喷嘴板的第一表面中的流动通道; 与流路连通的液体室; 以及与所述液体室连通并在所述喷嘴板的第二表面中开口的喷嘴孔。 液体室具有基本平行于第二表面的平坦部分。 喷嘴孔与平坦部分中的液体室连通。 一种用于制造喷嘴板的方法包括：形成在板状体的第一表面中开口的液体室; 在所述液体室的底部形成平坦部分; 并且形成与所述平坦部连通并在所述板状体的第二面开口的喷嘴孔。