公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

公开(公告)号：US5343291A

公开(公告)日：1994-08-30

申请号：US851109

申请日：1992-03-16

申请人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

发明人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.

摘要翻译： 用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

公开(公告)号：US5114236A

公开(公告)日：1992-05-19

申请号：US562656

申请日：1990-08-03

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Mitsutoshi Ohwada

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： A position detecting method for detecting the position of a substrate by use of a grating pattern provided on the substrate includes irradiating the grating pattern with first and second radiation beams having different wavelengths to produce first and second diffraction beams of different wavelengths; and receiving the first and second diffraction beams by use of a sensor to determine the position of the substrate on the basis of the position of incidence of each of the first and second diffraction beams on the sensor.

公开(公告)号：US08497995B2

公开(公告)日：2013-07-30

申请号：US12669825

申请日：2008-08-14

申请人： Kazuyuki Ota ,  Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazunori Okudomi ,  Hiroyuki Shinbata ,  Kenji Saitoh ,  Masakazu Matsugu

发明人： Kazuyuki Ota ,  Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazunori Okudomi ,  Hiroyuki Shinbata ,  Kenji Saitoh ,  Masakazu Matsugu

IPC分类号： G01B11/24

CPC分类号： G01B11/24 ,  G01B11/30

摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.

摘要翻译： 测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，以及测量单元，其在测量对象为 用照明光照射。 此外，提取单元从测量的反射光中提取关于测量目标的表面形状和形成在表面上的微结构的信息。

公开(公告)号：US08456621B2

公开(公告)日：2013-06-04

申请号：US13595013

申请日：2012-08-27

申请人： Kazuyuki Ota ,  Masakazu Matsugu ,  Kenji Saitoh

发明人： Kazuyuki Ota ,  Masakazu Matsugu ,  Kenji Saitoh

IPC分类号： G01N21/00

CPC分类号： G01B11/25

摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.

摘要翻译： 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。 为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。

公开(公告)号：US08274646B2

公开(公告)日：2012-09-25

申请号：US12816069

申请日：2010-06-15

申请人： Kazuyuki Ota ,  Masakazu Matsugu ,  Kenji Saitoh

发明人： Kazuyuki Ota ,  Masakazu Matsugu ,  Kenji Saitoh

IPC分类号： G01N21/00

CPC分类号： G01B11/25

摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.

摘要翻译： 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。 为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。

公开(公告)号：US5325176A

公开(公告)日：1994-06-28

申请号：US875601

申请日：1992-04-28

申请人： Shigeyuki Suda ,  Kenji Saitoh ,  Masakazu Matsugu ,  Naoto Abe ,  Minoru Yoshii ,  Ryo Kuroda

发明人： Shigeyuki Suda ,  Kenji Saitoh ,  Masakazu Matsugu ,  Naoto Abe ,  Minoru Yoshii ,  Ryo Kuroda

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7076

摘要： A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.

摘要翻译： 公开了一种可用于第一物体和第二物体的装置，其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。 该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分，用于在从第一物体引导之后接收位置检测光束并入射到第二物体上，光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中，以由所述光束检测部分接收，所述衍射光栅有效地将所述位置检测光束衍射至少两次，并且其中所述光束检测部分设置在位置 有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。

公开(公告)号：US5235408A

公开(公告)日：1993-08-10

申请号：US888434

申请日：1992-05-28

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda

IPC分类号： G03F9/00

CPC分类号： G03F9/7049

摘要： A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.

摘要翻译： 一种用于检测掩模和晶片之间的位置关系的装置，包括用于将光投射到掩模的光源，用于检测由掩模和晶片偏转的第一光在预定平面上的位置的第一光电检测系统， 其中，所述第一光的第一受光系统上的入射位置可根据所述掩模和所述晶片之间的位置关系而改变;第二光电检测系统，用于检测由所述掩模偏转的第二光在预定平面上的位置的位置; 其特征在于，所述第二光检测系统中的所述入射位置，所述第二光的入射位置可以通过所述掩模和所述光源之间的相对倾斜度而变化;以及位置检测系统，用于基于所述掩模和所述光源检测所述掩模和所述晶片的相对位置 由第一和第二光电检测系统进行检测，其中位置检测系统的检测可以不受 面罩与光源之间的相对倾斜度。

公开(公告)号：US20110037984A1

公开(公告)日：2011-02-17

申请号：US12812008

申请日：2009-01-28

申请人： Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazuyuki Ota ,  Kenji Saitoh ,  Masakazu Matsugu

发明人： Hiroshi Yoshikawa ,  Yusuke Mitarai ,  Masafumi Takimoto ,  Kazuyuki Ota ,  Kenji Saitoh ,  Masakazu Matsugu

IPC分类号： G01N21/55

CPC分类号： G01N21/57 ,  G01N21/4738 ,  G01N2021/4735

摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.

摘要翻译： 一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于 所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

公开(公告)号：US5481363A

公开(公告)日：1996-01-02

申请号：US242066

申请日：1994-05-13

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Jun Hattori ,  Sakae Houryu

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Jun Hattori ,  Sakae Houryu

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7076

摘要： A method of detecting a relative positional deviation of a first object having a first grating mark with an optical power and a second object having a second grating mark with an optical power, is disclosed, wherein a projected radiation beam is diffracted by the first and second grating marks in sequence and, on the basis of a position of convergence on a light receiving surface of plural diffraction beams produced by the diffraction through the first and second grating marks and including a signal beam having been diffracted at a predetermined order by each of the first and second grating marks, the relative positional deviation is determined, a detection zone is defined on the light receiving surface, the signal beam is converged upon the detection zone, and a predetermined diffraction beam of the plural diffraction beams which, for a relative positional deviation of the first and second objects, shows displacement different from that of the signal beam is substantially prevented from being converged upon the detection zone.

摘要翻译： 公开了一种检测具有光功率的第一光栅标记的第一物体和具有光功率的第二光栅标记的第二物体的相对位置偏差的方法，其中投射的辐射束被第一和第二衍射 基于通过第一和第二光栅标记的衍射产生的多个衍射光束的光接收表面上的会聚位置，并且包括以预定顺序衍射的信号光束 第一和第二光栅标记，确定相对位置偏差，在光接收表面上限定检测区域，信号光束会聚在检测区域上，并且将多个衍射光束的预定衍射光束相对于相对位置 显示第一和第二物体的偏差显示出与信号光束不同的位移 om会聚在检测区域。