公开(公告)号：US5343291A

公开(公告)日：1994-08-30

申请号：US851109

申请日：1992-03-16

申请人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

发明人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.

摘要翻译： 用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

公开(公告)号：US5369486A

公开(公告)日：1994-11-29

申请号：US947383

申请日：1992-09-21

申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.

摘要翻译： 位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。 照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。 第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。 第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。 第一和第二方向与光栅线方向不同。 检测系统检测干扰光并从其产生第一和第二拍拍信号。 处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

公开(公告)号：US5396335A

公开(公告)日：1995-03-07

申请号：US800271

申请日：1991-12-02

申请人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

发明人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

摘要翻译： 一种检测掩模和晶片之间的位置偏差的方法，其中具有预定强度分布的辐射束被投射到掩模的对准图案，由此产生信号光束，并且其中掩模和晶片的位置偏差 是基于信号光束确定的。 改进在于基于信号光束检测辐射束对掩模的入射位置与预定位置的偏差; 相对地定位辐射束和掩模，以便基本上校正检测到的偏差; 以及通过使用相对定位的辐射束来确定掩模和晶片的位置偏差。

公开(公告)号：US5313272A

公开(公告)日：1994-05-17

申请号：US923500

申请日：1992-08-03

申请人： Noriyuki Nose ,  Kenji Saitoh ,  Hiroshi Osawa ,  Masanobu Hasegawa

发明人： Noriyuki Nose ,  Kenji Saitoh ,  Hiroshi Osawa ,  Masanobu Hasegawa

IPC分类号： G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC分类号： G03F7/70633

摘要： A method and apparatus for measuring the deviation between elements on an object includes the steps of and devices for performing the steps of forming at least a first physicooptical element on the object: forming at least a second physicooptical element on the object, the first and second physicooptical elements having lens functions; projecting light beams onto the first and second physicooptical elements on the object and detecting the incident positions of light beams travelling from the first and second physicooptical elements, having been subjected to the lens functions of the first and second physicooptical elements, on a predetermined surface; and detecting the deviation between the first and second physicooptical elements on the object from the relationship between the detected incident positions of the light beams.

摘要翻译： 用于测量物体上的元件之间的偏差的方法和装置包括以下步骤和用于执行在物体上形成至少第一物理光学元件的步骤的装置：在物体上形成至少第二物理元件，第一和第二 具有透镜功能的物理光学元件; 将光束投影到物体上的第一和第二物理光学元件上，并且检测从已经经受第一和第二物理光学元件的透镜功能的第一和第二物理光学元件行进的光束的入射位置在预定表面上; 以及根据检测到的光束的入射位置之间的关系来检测物体上的第一和第二物理光学元件之间的偏差。

公开(公告)号：US5495336A

公开(公告)日：1996-02-27

申请号：US441982

申请日：1995-05-16

申请人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

发明人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A method of detecting the positional relationship between a first object and a second object is disclosed which includes projecting a first light through a convex lens mark of the first object and a concave lens pattern of the second object onto a first plane and projecting a second light through a concave lens mark of the first object and a convex lens pattern of the second object onto the first plane, wherein a first spacing between positions of incidence of the first light and the second light on the first plane increases with displacement of the second object relative to the first object in a predetermined direction. The method also includes projecting a third light through a concave lens mark of the first object and a convex lens pattern of the second object onto a second plane and projecting a fourth light through a convex lens mark of the first object and a concave lens pattern of the second object onto the second plane, wherein a second spacing between positions of incidence of the third light and the fourth light on the second plane decreases with displacement of the second object relative to the first object in the predetermined direction. The method also includes determining a reference for the detection of a position of the first object relative to a position of the second object on the basis of the first spacing and the second spacing as they become substantially equal to each other.

摘要翻译： 本发明公开了一种检测第一物体与第二物体之间的位置关系的方法，其中包括将第一物体的凸透镜标记的第一光和第二物体的凹透镜图案投射到第一平面上，并将第二光 通过第一物体的凹透镜标记和第二物体的凸透镜图案到第一平面上，其中第一光的入射位置和第一平面上的第二光的位置之间的第一间隔随着第二物体的位移而增加 相对于第一物体在预定方向上。 该方法还包括通过第一物体的凹透镜标记和第二物体的凸透镜图案将第三光投射到第二平面上，并将第四光通过第一物体的凸透镜标记投射并且将第四光投射到第二物体的凹透镜图案 所述第二物体在所述第二平面上，其中所述第三光的入射位置与所述第二平面上的所述第四光的位置之间的第二间隔随着所述第二物体相对于所述第一物体沿所述预定方向的位移而减小。 该方法还包括基于第一间隔和第二间隔基于彼此基本相等而确定用于检测第一物体相对于第二物体的位置的位置的参考。

公开(公告)号：US5834767A

公开(公告)日：1998-11-10

申请号：US790798

申请日：1997-01-30

申请人： Masanobu Hasegawa ,  Minoru Yoshii ,  Kyoichi Miyazaki

发明人： Masanobu Hasegawa ,  Minoru Yoshii ,  Kyoichi Miyazaki

IPC分类号： G01B11/00 ,  G01B11/26 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7026

摘要： A detecting system for detecting a surface position of an object, includes a light source, a first grating having a light collecting function, wherein the first grating is illuminated with light from the light source, a second grating having a light collecting function, a first optical system for imaging the first grating onto the object in a direction oblique to the surface of the object, a second optical system for re-imaging the image of the first grating, on the surface of the object, onto the second grating, wherein a moire fringe is produced by the second grating and the re-imaged image of the first grating, and a photodetector for detecting a position of a converged point of convergent light as produced by the moire fringe, wherein the surface position information of the object is determined on the basis of information related to the converged point position as detected by the photodetector.

摘要翻译： 一种用于检测物体的表面位置的检测系统，包括光源，具有聚光功能的第一光栅，其中第一光栅被来自光源的光照射，具有光收集功能的第二光栅，第一光栅 光学系统，用于将物体上的第一光栅成像到物体表面上的方向上;第二光学系统，用于将物体表面上的第一光栅的图像重新成像到第二光栅上，其中， 莫尔条纹由第二光栅和第一光栅的再成像图像产生，以及光电检测器，用于检测由莫尔条纹产生的会聚光的会聚点的位置，其中确定物体的表面位置信息 基于与由光检测器检测到的会聚点位置有关的信息。

公开(公告)号：US5750294A

公开(公告)日：1998-05-12

申请号：US685464

申请日：1996-07-24

申请人： Masanobu Hasegawa ,  Minoru Yoshii ,  Seiji Takeuchi

发明人： Masanobu Hasegawa ,  Minoru Yoshii ,  Seiji Takeuchi

IPC分类号： G03B27/72 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

CPC分类号： G03F7/70558 ,  G03F7/70241 ,  G03F7/70591 ,  G03F7/70641

摘要： Disclosed is a method of determining a best focus position or best exposure amount of a projection lens in an arrangement wherein a reticle is placed on a plane perpendicular to an optical axis of the projection lens, wherein a pattern having periodicity in a predetermined direction is provided on a surface of the reticle, wherein the pattern is transferred to a photosensitive substrate by the projection lens to form a printed pattern thereon. The method includes providing the pattern by using a plurality of zigzag openings of a constant line width, extending in a direction perpendicular to the predetermined direction and being arrayed with a constant periodicity along that direction, transferring the pattern to the photosensitive substrate sequentially with different focus positions to form plural printed patterns thereon, imaging the printed patterns upon an image pickup surface of photoelectrically converting means; calculating, from an imagewise signal produced by the photoelectrically converting means, information related to one frequency component of zigzag lines, constituting an outline of an image of the zigzag opening, and determining the best focus position on the basis of the information.

摘要翻译： 公开了一种确定投影透镜的最佳聚焦位置或最佳曝光量的方法，其中将掩模版放置在垂直于投影透镜的光轴的平面上，其中提供了沿预定方向具有周期性的图案 在掩模版的表面上，其中通过投影透镜将图案转印到感光基板上，以在其上形成印刷图案。 该方法包括通过使用在垂直于预定方向的方向上延伸的恒定线宽度的多个之字形开口来提供图案，并沿着该方向以恒定的周期排列，以不同的焦点依次传送图案到感光基片 在其上形成多个印刷图案的位置，将印刷图案成像在光电转换装置的图像拾取表面上; 根据由光电转换装置产生的成像信号，计算与Z字形线的一个频率分量有关的信息，构成Z字形开口的图像的轮廓，并根据该信息确定最佳对焦位置。

公开(公告)号：US06636311B1

公开(公告)日：2003-10-21

申请号：US09450682

申请日：1999-11-30

申请人： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

发明人： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

IPC分类号： G01B1100

CPC分类号： G03F9/7061 ,  B82Y10/00 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7092

摘要： An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

摘要翻译： 一种用于对准第一和第二物体的对准方法，在用于将第一物体的图案转印到第二物体上的涂布抗蚀剂的曝光装置中，包括产生与对准标记形成区域相关的取向偏移值的处理 第二个目的是在其上形成抗蚀剂涂层之后，以及在曝光装置中，基于产生的偏移值，将第一物体与第二物体对准被涂覆有抗蚀剂的处理。

公开(公告)号：US5777744A

公开(公告)日：1998-07-07

申请号：US648417

申请日：1996-05-15

申请人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

发明人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70558 ,  G03F7/70641 ,  G03F7/70675

摘要： A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.

摘要翻译： 一种用于检测通过曝光光形成的周期性图案的形成状态的状态检测系统，包括用于将输入光投射到周期性图案上的投光装置，以及 确定装置，用于接收来自周期性图案的信号光并用于检测输入光的变化，以基于输入光的变化确定周期性图案的形成状态。

公开(公告)号：US20050195405A1

公开(公告)日：2005-09-08

申请号：US11115366

申请日：2005-04-27

申请人： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

发明人： Hideki Ina ,  Minoru Yoshii ,  Masanobu Hasegawa ,  Takashi Satoh

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F7/70633 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7088

摘要： A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

摘要翻译： 位置检测系统包括用于提供相干光的光源装置，用于将来自光源装置的相干光变换成非相干光的非相干变换装置，用于将来自不相干变换装置的非相干光分成分为 光，其中所述分割光束中的一个产生中间图像，并且来自所述中间图像的光被引导以在对象的表面上照射目标，而另一个分割光束被指向由光学共轭的表面反射 并且其中来自所述目标的光和由所述共轭表面反射的光被重新组合，用于根据由所述光学系统重新组合的光产生对应于所述目标的成像信号的图像拾取装置， 其中与所述目标相对于沿着所述表面的方向的位置相关的位置信息 可以基于图像信号产生ct，以及用于调整由图像拾取装置拾取的靠近目标的部分的图像的图像对比度的图像对比度调整装置。