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34 条记录 (耗时 0.031 秒)

    MOLD STRUCTURE, IMPRINTING METHOD USING THE SAME, MAGNETIC RECORDING MEDIUM AND PRODUCTION METHOD THEREOF
    6.
    发明申请
    MOLD STRUCTURE, IMPRINTING METHOD USING THE SAME, MAGNETIC RECORDING MEDIUM AND PRODUCTION METHOD THEREOF 审中-公开
    模具结构，使用其的印刷方法，磁记录介质及其生产方法

    公开(公告)号：US20080241601A1

    公开(公告)日：2008-10-02

    申请号：US12059102

    申请日：2008-03-31

    申请人： Kenichi MORIWAKI ,  Toshihiro Usa ,  Masakazu Nishikawa

    发明人： Kenichi MORIWAKI ,  Toshihiro Usa ,  Masakazu Nishikawa

    IPC分类号： G11B5/84 ,  G11B5/62 ,  B44C1/22

    CPC分类号： G03F7/0002 ,  B29C33/424 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855

    摘要： The present invention provides a mold structure including: a concavo-convex pattern formed on its surface, wherein the mold structure is used for transferring the concavo-convex pattern onto an imprint resist layer formed on a surface of a substrate having a thickness of 0.3 mm to 2.0 mm by placing the concavo-convex pattern against the imprint resist layer, and wherein a thickness Dm (mm) of the mold structure, a thickness Ds (mm) of the substrate and a curl amount C (mm) of the mold structure satisfy the relationship 0.01≦10,000×(Dm3/Ds3)1/2×C2≦250.

    摘要翻译： 本发明提供一种模具结构，其包括：在其表面上形成的凹凸图案，其中所述模具结构用于将所述凹凸图案转印到形成在厚度为0.3mm的基板的表面上的压印抗蚀剂层上 通过将凹凸图案放置在抗蚀刻抗蚀剂层上，并且其中模具结构的厚度Dm（mm），基底的厚度Ds（mm）和模具结构的卷曲量C（mm） 满足0.01 <= 10,000×（DM 3/3 / D 3以下）的关系×1/2×C 2 < 250。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE
    7.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE 失效
    电子束写入方法，精细图案书写系统及其制作方法

    公开(公告)号：US20090189094A1

    公开(公告)日：2009-07-30

    申请号：US12359418

    申请日：2009-01-26

    申请人： Kazunori KOMATSU ,  Toshihiro Usa

    发明人： Kazunori KOMATSU ,  Toshihiro Usa

    IPC分类号： A61N5/00 ,  H01J3/14 ,  G01N13/10

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855 ,  G11B7/261 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/31735

    摘要： A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

    摘要翻译： 在施加有抗蚀剂的基板上形成包括由伺服元件构成的伺服图案的精细图案，以及用于分离相邻数据轨道的凹槽图案，并通过扫描基板上的电子束而放置在旋转台上。 在沿一个方向旋转衬底的同时，扫描电子束，以便通过XY偏转电子束并在半径方向上来回振动，在衬底的一次旋转期间逐个地完全填充对应于多个轨道的伺服单元 。 每个凹槽图案被设置为以预定角度划分的多个凹槽元件的阵列，并且与伺服元件写入之后的多个轨道对应的凹槽元件通过大量在 在相同旋转期间的圆周方向。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE
    8.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE 审中-公开
    电子束写入方法，精细图案书写系统及其制作方法

    公开(公告)号：US20090184265A1

    公开(公告)日：2009-07-23

    申请号：US12354011

    申请日：2009-01-15

    申请人： Kazunori KOMATSU ,  Toshihiro Usa

    发明人： Kazunori KOMATSU ,  Toshihiro Usa

    IPC分类号： G21K5/10

    CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/59638 ,  G11B5/59655 ,  G11B5/59688 ,  G11B5/743 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/30483

    摘要： A fine pattern, to be formed on a discrete track medium, which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is X-Y deflected to scan servo elements corresponding to a plurality of tracks during one rotation of the substrate. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

    摘要翻译： 在施加有抗蚀剂的基板上形成由分立轨道介质形成的精细图案，该图案包括各自由伺服元件构成的伺服图案和用于分离相邻数据轨道的凹槽图案，并且放置在旋转台上 通过扫描基板上的电子束。 当在一个方向上旋转衬底时，电子束被X偏转以在衬底的一次旋转期间扫描对应于多个轨道的伺服元件。 每个凹槽图案被设置为以预定角度划分的多个凹槽元件的阵列，并且与伺服元件写入之后的多个轨道对应的凹槽元件通过大量在 在相同旋转期间的圆周方向。

    MOLD STRUCTURE
    9.
    发明申请
    MOLD STRUCTURE 失效
    模具结构

    公开(公告)号：US20080142680A1

    公开(公告)日：2008-06-19

    申请号：US11946198

    申请日：2007-11-28

    申请人： Toshihiro Usa ,  Kenji Ichikawa ,  Kazunori Komatsu

    发明人： Toshihiro Usa ,  Kenji Ichikawa ,  Kazunori Komatsu

    IPC分类号： G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/743 ,  G11B5/855 ,  Y10S425/81

    摘要： There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

    摘要翻译： 提供了一种包含基板的模具结构和在基板的一个表面上以预定间隔形成为同心圆形的多个凸部，其中凸部相对于基板的径向的横截面形状 同心圆使得每个凸部相对于高度方向的中间宽度M相对于同心圆的径向方向大于每个凸部的顶部的宽度T。

    Electron beam lithography method
    10.
    发明申请
    Electron beam lithography method 失效
    电子束光刻法

    公开(公告)号：US20060001993A1

    公开(公告)日：2006-01-05

    申请号：US11169575

    申请日：2005-06-30

    申请人： Toshihiro Usa ,  Kazunori Komatsu

    发明人： Toshihiro Usa ,  Kazunori Komatsu

    IPC分类号： G11B5/86

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  Y10S430/143

    摘要： Deflecting means, for deflecting an electron beam in a radial direction and the circumferential direction, and blanking means, for shielding irradiation of the electron beam at portions other than drawing portions, are provided. While the disk is rotated unidirectionally, the electron beam is repeatedly deflected in a figure 8 pattern, in which the electron beam is deflected toward the next deflection initiation point in the radial direction at track edge portions, such that the deflected directions toward the inner periphery of the disk and toward the outer periphery of the disk intersect each other. Parallel scanning is performed alternately toward the outer periphery and the inner periphery of the disk. Elements of a transfer pattern, having lengths which are integer multiples of a reference value, are drawn by performing scanning a number of times equal to the integer that the reference value is multiplied by.

    摘要翻译： 提供用于使电子束沿径向和圆周方向偏转的偏转装置，以及用于屏蔽除了拉伸部分之外的部分处的电子束照射的消隐装置。 当盘被单向旋转时，电子束以图8图案重复偏转，其中电子束在轨道边缘部分沿径向方向偏转到下一个偏转起始点，使得朝向内周的偏转方向 并且朝向盘的外周彼此相交。 交替地向盘的外周和内周进行并行扫描。 通过执行等于参考值乘以的整数的次数来绘制具有作为参考值的整数倍的长度的传送图案的元素。