MOLD STRUCTURE
    1.
    发明申请
    MOLD STRUCTURE 失效
    模具结构

    公开(公告)号:US20080142680A1

    公开(公告)日:2008-06-19

    申请号:US11946198

    申请日:2007-11-28

    IPC分类号: G03F7/00

    摘要: There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

    摘要翻译: 提供了一种包含基板的模具结构和在基板的一个表面上以预定间隔形成为同心圆形的多个凸部,其中凸部相对于基板的径向的横截面形状 同心圆使得每个凸部相对于高度方向的中间宽度M相对于同心圆的径向方向大于每个凸部的顶部的宽度T。

    Mold structure
    2.
    发明授权
    Mold structure 失效
    模具结构

    公开(公告)号:US07850441B2

    公开(公告)日:2010-12-14

    申请号:US11946198

    申请日:2007-11-28

    IPC分类号: B29D17/00

    摘要: There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

    摘要翻译: 提供了一种包含基板的模具结构和在基板的一个表面上以预定间隔形成为同心圆形的多个凸部,其中凸部相对于基板的径向的横截面形状 同心圆使得每个凸部相对于高度方向的中间宽度M相对于同心圆的径向方向大于每个凸部的顶部的宽度T。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE
    3.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE 失效
    电子束写入方法,精细图案书写系统及其制作方法

    公开(公告)号:US20090189094A1

    公开(公告)日:2009-07-30

    申请号:US12359418

    申请日:2009-01-26

    IPC分类号: A61N5/00 H01J3/14 G01N13/10

    摘要: A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

    摘要翻译: 在施加有抗蚀剂的基板上形成包括由伺服元件构成的伺服图案的精细图案,以及用于分离相邻数据轨道的凹槽图案,并通过扫描基板上的电子束而放置在旋转台上。 在沿一个方向旋转衬底的同时,扫描电子束,以便通过XY偏转电子束并在半径方向上来回振动,在衬底的一次旋转期间逐个地完全填充对应于多个轨道的伺服单元 。 每个凹槽图案被设置为以预定角度划分的多个凹槽元件的阵列,并且与伺服元件写入之后的多个轨道对应的凹槽元件通过大量在 在相同旋转期间的圆周方向。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE
    4.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE 审中-公开
    电子束写入方法,精细图案书写系统及其制作方法

    公开(公告)号:US20090184265A1

    公开(公告)日:2009-07-23

    申请号:US12354011

    申请日:2009-01-15

    IPC分类号: G21K5/10

    摘要: A fine pattern, to be formed on a discrete track medium, which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is X-Y deflected to scan servo elements corresponding to a plurality of tracks during one rotation of the substrate. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

    摘要翻译: 在施加有抗蚀剂的基板上形成由分立轨道介质形成的精细图案,该图案包括各自由伺服元件构成的伺服图案和用于分离相邻数据轨道的凹槽图案,并且放置在旋转台上 通过扫描基板上的电子束。 当在一个方向上旋转衬底时,电子束被X偏转以在衬底的一次旋转期间扫描对应于多个轨道的伺服元件。 每个凹槽图案被设置为以预定角度划分的多个凹槽元件的阵列,并且与伺服元件写入之后的多个轨道对应的凹槽元件通过大量在 在相同旋转期间的圆周方向。

    Electron beam lithography method
    5.
    发明申请
    Electron beam lithography method 失效
    电子束光刻法

    公开(公告)号:US20060001993A1

    公开(公告)日:2006-01-05

    申请号:US11169575

    申请日:2005-06-30

    IPC分类号: G11B5/86

    摘要: Deflecting means, for deflecting an electron beam in a radial direction and the circumferential direction, and blanking means, for shielding irradiation of the electron beam at portions other than drawing portions, are provided. While the disk is rotated unidirectionally, the electron beam is repeatedly deflected in a figure 8 pattern, in which the electron beam is deflected toward the next deflection initiation point in the radial direction at track edge portions, such that the deflected directions toward the inner periphery of the disk and toward the outer periphery of the disk intersect each other. Parallel scanning is performed alternately toward the outer periphery and the inner periphery of the disk. Elements of a transfer pattern, having lengths which are integer multiples of a reference value, are drawn by performing scanning a number of times equal to the integer that the reference value is multiplied by.

    摘要翻译: 提供用于使电子束沿径向和圆周方向偏转的偏转装置,以及用于屏蔽除了拉伸部分之外的部分处的电子束照射的消隐装置。 当盘被单向旋转时,电子束以图8图案重复偏转,其中电子束在轨道边缘部分沿径向方向偏转到下一个偏转起始点,使得朝向内周的偏转方向 并且朝向盘的外周彼此相交。 交替地向盘的外周和内周进行并行扫描。 通过执行等于参考值乘以的整数的次数来绘制具有作为参考值的整数倍的长度的传送图案的元素。

    Method of depicting a pattern with electron beam and disc-like substrate and magnetic recording medium
    6.
    发明授权
    Method of depicting a pattern with electron beam and disc-like substrate and magnetic recording medium 失效
    用电子束和盘状基底和磁记录介质描绘图案的方法

    公开(公告)号:US06967815B2

    公开(公告)日:2005-11-22

    申请号:US10682987

    申请日:2003-10-14

    摘要: A desired pattern of elements, including an element having a slant side intersecting a recording track, is depicted on a resist layer on a disc-like substrate. The element is depicted by causing an electron beam whose beam diameter is smaller than the minimum width of the element to scan the resist layer so that the trajectory of the beam center of the electron beam on the resist layer draws a periodic waveform traveling along an axis parallel to the recording track. The periodic waveform is drawn from a starting point which is on a valley or a peak of the waveform. Angles θ3, θ1 and θ2 satisfy the relation θ1

    摘要翻译: 在盘状基板上的抗蚀剂层上示出了包括具有与记录轨道相交的倾斜侧的元件的元件的期望图案。 通过使电子束的光束直径小于扫描抗蚀剂层的最小宽度的电子束来描绘元件,使得抗蚀剂层上的电子束的光束中心的轨迹沿着轴线移动 平行于录音轨道。 周期性波形是从波峰的起始点或波峰的峰值绘出的。 角度θ3,θ1和θ2满足关系θ1<θ3<θ3。

    Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
    8.
    发明授权
    Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium 失效
    电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法

    公开(公告)号:US07973297B2

    公开(公告)日:2011-07-05

    申请号:US12364838

    申请日:2009-02-03

    IPC分类号: H01J3/14 G11B5/02

    摘要: When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.

    摘要翻译: 当通过在转动旋转台的同时扫描基板上的电子束来在施加有抗蚀剂的基板上写入硬盘图案时,基于每个半径方向的预定的编码器脉冲相对于每个区域的每个径向位置开始写入 在根据旋转台的旋转角度产生的位置之间发生的位置之间发生的预定的编码器脉冲之后发生的预定的编码器脉冲,其沿着在每个区域的圆周方向上的写入开始位置首先到达写入位置的径向位置的旋转方向的旋转方向上发生, 旋转台相对于每个径向位置在周向方向上旋转并在写入开始位置之前,并且在从预定编码器脉冲起的预定时间之后旋转。

    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM
    9.
    发明申请
    ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM 失效
    电子束写入方法,精细图案写入系统,制造未加载图案的基板的方法以及制造磁盘介质的方法

    公开(公告)号:US20090242788A1

    公开(公告)日:2009-10-01

    申请号:US12410786

    申请日:2009-03-25

    IPC分类号: H01J3/14 A61N5/00 G12B21/00

    摘要: When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direction orthogonal to the vibration direction to scan the electron beam so as to completely fill the shapes of the elements, a proximity-effect correction is performed according to the arrangement density of the elements in which the amount of dose is adjusted by setting the deflection speed faster for the writing of an element in a densely arranged region than for the writing of an identical element in a sparsely arranged region.

    摘要翻译: 当通过在基板的径向方向上或在与径向方向正交的方向上显微地振动电子束时在基板上写入精细图案的元件的形状,并使电子束在与振动正交的方向上偏转 扫描电子束的方向以完全填充元件的形状,根据通过将偏转速度设定为更快地调整剂量的元素的配置密度来进行邻近效应校正,以便写入 密集布置区域中的元件比在稀疏布置区域中写入相同元件的元件。

    Electron beam lithography method
    10.
    发明授权
    Electron beam lithography method 失效
    电子束光刻法

    公开(公告)号:US07026098B2

    公开(公告)日:2006-04-11

    申请号:US10700626

    申请日:2003-11-05

    IPC分类号: G03C5/00 G11B5/82

    摘要: An electron beam lithography method for performing lithography of elements included in a pattern by scanning a disk having resist coated thereon, placed on a rotating stage which is movable in a radial direction of the disk, with an electron beam while rotating the rotating stage. The electron beam has a beam diameter smaller than a minimum width of an element shape. The electron beam is reciprocally oscillated in a circumferential direction X approximately orthogonal to a radial direction Y of the disk and deflected in the radial direction Y, thereby filling in the element shape. Lithography of the elements is sequentially performed by rotating the disk unidirectionally, and thus a desired micropattern is drawn in the entire region of the disk. A lithographic length L of the element in the circumferential direction X may be defined by amplitude of the reciprocal oscillation of the electron beam.

    摘要翻译: 一种电子束光刻方法,用于通过扫描其上涂覆有抗蚀剂的光盘来放置包括在图案中的元件,所述光刻胶放置在旋转台上,该旋转台可沿着盘的径向移动,同时旋转旋转台。 电子束的光束直径小于元件形状的最小宽度。 电子束在大致正交于圆盘的径向Y的圆周方向X上往复振荡,并沿径向Y偏转,从而填充元件形状。 通过单向旋转盘顺序地执行元件的平版印刷,因此在盘的整个区域中绘制期望的微图案。 元件在圆周方向X上的平版印刷长度L可以由电子束的往复振动的振幅来限定。