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公开(公告)号：US08980374B2
公开(公告)日：2015-03-17
申请号：US12363348
申请日：2009-01-30
CPC分类号： C23C16/545 , B05D1/28 , B05D3/067 , B05D7/04 , B05D7/54 , B05D2252/02 , C23C14/562
摘要： A functional film having a particular organic film and a particular inorganic film is produced. The functional film is consistently produced and exhibits the intended performance. The functional film production method includes forming an organic film on a surface of a substrate, handling the substrate having the organic film formed thereon so that no member comes in contact with an organic film surface in vacuum until formation of an inorganic film, and forming the inorganic film by vacuum deposition on the organic film surface.
摘要翻译： 制备具有特定有机膜和特定无机膜的功能膜。 功能薄膜始终如一地产生并表现出预期的性能。 功能性膜制造方法包括在基板的表面上形成有机膜，处理其上形成有机膜的基板，使得在真空中没有成分与有机膜表面直接接触形成无机膜，并形成 无机膜通过真空沉积在有机膜表面上。
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公开(公告)号：US20090196998A1
公开(公告)日：2009-08-06
申请号：US12363435
申请日：2009-01-30
IPC分类号： B05D3/00
CPC分类号： C23C16/545 , B05D1/28 , B05D3/067 , B05D7/04 , B05D7/52 , B05D2252/02 , B65H2406/31 , C23C14/562
摘要： The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.
摘要翻译： 功能膜的制造方法包括在基板的表面上形成有机膜的工序和通过真空蒸镀在有机膜的表面上形成无机膜的工序来制造功能膜。 在形成无机膜之前，在有机膜不具有其功能的部分，构件在真空室中接触有机膜的表面。
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公开(公告)号：US08133533B2
公开(公告)日：2012-03-13
申请号：US12363435
申请日：2009-01-30
IPC分类号： B05D3/12
CPC分类号： C23C16/545 , B05D1/28 , B05D3/067 , B05D7/04 , B05D7/52 , B05D2252/02 , B65H2406/31 , C23C14/562
摘要： The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.
摘要翻译： 功能膜的制造方法包括在基板的表面上形成有机膜的工序和通过真空蒸镀在有机膜的表面上形成无机膜的工序来制造功能膜。 在形成无机膜之前，在有机膜不具有其功能的部分，构件在真空室中接触有机膜的表面。
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公开(公告)号：US08092600B2
公开(公告)日：2012-01-10
申请号：US11933658
申请日：2007-11-01
申请人： Jun Fujinawa , Norihiro Kadota
发明人： Jun Fujinawa , Norihiro Kadota
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： C23C16/545 , C23C16/45578 , C23C16/507 , H01J37/321 , H01J37/3244 , H01J37/3277
摘要： The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming an induction electric field by a coil, opposed to the processing position, a power supply for supplying high frequency power to the coil, an elongated gas introducing unit and a separating unit for separating a region where the forming unit is arranged and a region where the introducing unit is arranged from each other in an airtight fashion, having an elongated dielectric window arranged between the processing position and the forming unit. The forming unit, the introducing unit and the dielectric window are arranged in such a way that there longitudinal directions are matched with a width direction of the substrate being conveyed, and orthogonal to the conveying direction.
摘要翻译： 等离子体装置包括：输送单元，用于在位于处理位置的输送方向上输送基板;细长电场形成单元，用于通过与处理位置相对的线圈形成感应电场;电源，用于供应 线圈的高频功率，细长气体导入单元和分离单元，用于将形成单元布置的区域和导入单元以气密方式彼此排列的区域分离，所述区域具有布置在 处理位置和成形单元。 形成单元，引入单元和电介质窗口被布置成使得纵向方向与被输送的基板的宽度方向并且与输送方向正交地配合。
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公开(公告)号：US20080102222A1
公开(公告)日：2008-05-01
申请号：US11933658
申请日：2007-11-01
申请人： Jun Fujinawa , Norihiro Kadota
发明人： Jun Fujinawa , Norihiro Kadota
CPC分类号： C23C16/545 , C23C16/45578 , C23C16/507 , H01J37/321 , H01J37/3244 , H01J37/3277
摘要： The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming an induction electric field by a coil, opposed to the processing position, a power supply for supplying high frequency power to the coil, an elongated gas introducing unit and a separating unit for separating a region where the forming unit is arranged and a region where the introducing unit is arranged from each other in an airtight fashion, having an elongated dielectric window arranged between the processing position and the forming unit. The forming unit, the introducing unit and the dielectric window are arranged in such a way that there longitudinal directions are matched with a width direction of the substrate being conveyed, and orthogonal to the conveying direction.
摘要翻译： 等离子体装置包括：输送单元，用于在位于处理位置的输送方向上输送基板;细长电场形成单元，用于通过与处理位置相对的线圈形成感应电场;电源，用于供应 线圈的高频功率，细长气体导入单元和分离单元，用于将形成单元布置的区域和导入单元以气密方式彼此排列的区域分离，所述区域具有布置在 处理位置和成形单元。 形成单元，引入单元和电介质窗口被布置成使得纵向方向与被输送的基板的宽度方向并且与输送方向正交地配合。
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公开(公告)号：US07202007B2
公开(公告)日：2007-04-10
申请号：US10456472
申请日：2003-06-09
申请人： Norio Shibata , Junji Nakada , Jun Fujinawa
发明人： Norio Shibata , Junji Nakada , Jun Fujinawa
CPC分类号： H01L21/76838 , C23C14/0005 , C23C14/086 , H01L21/28506 , H01L27/3211 , H01L51/0004 , H01L51/0013 , H01L51/005 , H01L51/0051 , H01L51/0059 , H01L51/0078 , H01L51/0081 , H01L51/0084 , H01L51/0097 , H01L51/56
摘要： This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.
摘要翻译： 该方法形成图案化膜。 该方法制备具有根据要形成的膜图案形成有凹凸的转印面的转印部件，对形成在转印部件的转印面上的至少脊的表面进行剥离处理，然后形成薄膜 通过在形成在转印部件的转印表面上的至少脊的表面上形成真空膜的技术，将形成在转印部件的至少脊的表面上的薄膜转印到基板上，从而形成图案化膜 在基板上。
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公开(公告)号：US20050064642A1
公开(公告)日：2005-03-24
申请号：US10981601
申请日：2004-11-05
申请人： Jun Fujinawa , Junji Nakada
发明人： Jun Fujinawa , Junji Nakada
IPC分类号： G02B1/11 , H01L21/8238 , H01L31/0232 , H01L31/0336
摘要： The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.
摘要翻译： 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。
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公开(公告)号：US06863965B2
公开(公告)日：2005-03-08
申请号：US10151173
申请日：2002-05-21
申请人： Jun Fujinawa , Junji Nakada
发明人： Jun Fujinawa , Junji Nakada
CPC分类号： C23C14/10 , C08J7/06 , C23C14/0694 , G02B1/113 , Y10T428/24967 , Y10T428/24975 , Y10T428/265 , Y10T428/31507 , Y10T428/31667 , Y10T428/31931 , Y10T428/31935 , Y10T428/31938
摘要： This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.
摘要翻译： 该光学部件包括由塑料制成的成膜基板，形成在成膜基板的上侧的氟化镁膜和在氟化镁膜上形成的第一氧化硅膜。 氟化镁膜可以形成在成膜基板的表面上。 或者，光学部件还可以包括在成膜基板的表面上以及成膜基板和氟化镁膜之间形成的第二氧化硅膜。 可以实现膜粘合性，机械强度，耐药性，耐环境性等优异的光学元件以及光学特性，并且生产率，成膜操作性，成本等优异 。
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公开(公告)号：US20070224812A1
公开(公告)日：2007-09-27
申请号：US11798708
申请日：2007-05-16
申请人： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
发明人： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
IPC分类号： H01L21/44
CPC分类号： C03C17/42 , B44C1/1733 , C03C17/3405 , H01L51/0013 , H01L51/56
摘要： A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
摘要翻译： 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。
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公开(公告)号：US07033855B2
公开(公告)日：2006-04-25
申请号：US10981601
申请日：2004-11-05
申请人： Jun Fujinawa , Junji Nakada
发明人： Jun Fujinawa , Junji Nakada
IPC分类号： H01L21/00
摘要： The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.
摘要翻译： 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。
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