公开(公告)号：US08888925B2

公开(公告)日：2014-11-18

申请号：US13408563

申请日：2012-02-29

申请人： Masanobu Sato ,  Hiroyuki Yashiki ,  Mai Yamakawa ,  Takayoshi Tanaka ,  Ayumi Higuchi ,  Rei Takeaki

发明人： Masanobu Sato ,  Hiroyuki Yashiki ,  Mai Yamakawa ,  Takayoshi Tanaka ,  Ayumi Higuchi ,  Rei Takeaki

IPC分类号： B08B3/04 ,  H01L21/67

CPC分类号： B08B3/024 ,  B05B17/0676 ,  B08B3/02 ,  H01L21/67051

摘要： A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.

摘要翻译： 用于排出用于处理衬底的处理液的液滴的喷嘴具有主体，其包括供给口，排出口，连接供给口和排出口的处理液流路，以及多个排出口， 液体排出。 处理液体流动通道包括多个分支流动通道，其在供给口和排出口之间分支并在供给口和排出口之间聚集在一起。 多个排出口形成分别对应于多个分支流动通道的多个列; 并且对准并连接到相应的分支流动通道。 压电元件对流过多个分支流动通道的处理液施加振动。

公开(公告)号：US09355872B2

公开(公告)日：2016-05-31

申请号：US13427452

申请日：2012-03-22

申请人： Takayoshi Tanaka ,  Mai Yamakawa ,  Takahiro Yamaguchi

发明人： Takayoshi Tanaka ,  Mai Yamakawa ,  Takahiro Yamaguchi

IPC分类号： B08B3/04 ,  B08B7/00 ,  H01L21/67 ,  H01L21/02

CPC分类号： H01L21/67028 ,  H01L21/02052 ,  H01L21/67051 ,  H01L21/67057

摘要： A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a liquid droplet nozzle which generates droplets of a treatment liquid which are sprayed on a spouting region on an upper surface of the substrate held by the substrate holding unit; and a protective liquid nozzle which spouts a protective liquid obliquely onto the upper surface of the substrate held by the substrate holding unit for protection of the substrate to cause the protective liquid to flow toward the spouting region on the upper surface of the substrate, whereby the spouting region is covered with a film of the protective liquid and, in this state, the treatment liquid droplets are caused to impinge on the spouting region.

摘要翻译： 基板处理装置包括：水平保持基板的基板保持单元; 液滴喷嘴，其产生喷射在由所述基板保持单元保持的所述基板的上表面上的喷射区域上的处理液体的液滴; 以及保护液喷嘴，其将保护液体倾斜地喷射到由基板保持单元保持的基板的上表面上，用于保护基板，以使保护液体朝向基板的上表面上的喷射区域流动，由此， 喷射区域被保护液体的膜覆盖，并且在该状态下，使处理液滴撞击在喷射区域上。