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公开(公告)号：US20060019103A1
公开(公告)日：2006-01-26
申请号：US10540839
申请日：2004-01-26
申请人： Masanori Abe , Koyata Takahashi , Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hashimoto , Masanori Kohgo
发明人： Masanori Abe , Koyata Takahashi , Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hashimoto , Masanori Kohgo
CPC分类号： C03C17/04 , C03C3/062 , C03C3/083 , C03C3/085 , C03C3/095 , C03C8/02 , C03C15/00 , C03C17/002 , C03C17/007 , C03C17/3417 , C03C19/00 , C03C2217/78 , C23C4/10 , C23C4/11 , C23D5/04 , Y02T50/67 , Y02T50/6765
摘要： Members to be used in CVD devices, plasma treatment devices, etc. are exhausted by reaction with a corrosive gas or etching with plasma, and therefore, there were encountered problems such as staining of products due to the generation of particles and a reduction of the yield productivity. Also, glasses resistant to corrosive gases or plasma are weak in the heat resistance, and therefore, applications to be employed were limited. Members containing a heat-resisting base material having coated thereon a corrosion resistant glass containing at least one element selected from the group consisting of elements of the group 2a, group 3a and group 4a, especially an aluminosilicate or zirconia silicate based glass sprayed coating have high corrosion resistance to corrosive gases and plasma and high heat resistance and are less in the generation of particles.
摘要翻译： 用于CVD装置，等离子体处理装置等的部件通过与腐蚀性气体的反应或用等离子体蚀刻而耗尽，因此存在由于产生颗粒而导致的产品染色和减少的问题 产量生产力。 此外，耐腐蚀性气体或等离子体的玻璃的耐热性差，因此，使用的应用受到限制。 含有耐热基材的构件包含至少一种选自组2a，组3a和组4a的元素，特别是铝硅酸盐或氧化锆硅酸盐基玻璃喷涂的元素的耐蚀玻璃的耐腐蚀玻璃具有高的 对腐蚀性气体和等离子体的耐腐蚀性和高耐热性，并且在产生颗粒时较少。
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公开(公告)号：US07084084B2
公开(公告)日：2006-08-01
申请号：US10383682
申请日：2003-03-10
摘要： Highly durable silica glass comprising silica having incorporated therein aluminum and at least one element (M) selected from group 2A elements, group 3A elements and group 4A elements of the periodic table. Preferably, the sum of aluminum and element (M) is at least 30 atomic % based on the amount of total metal elements in the silica glass, and the atomic ratio of aluminum to element (M) is in the range of 0.05 to 20.The silica glass has a high purity and exhibits enhanced durability while good processability and machinability, and reduced dusting property are kept, and the glass is suitable for members of a semiconductor production apparatus or liquid crystal display production apparatus using a halogenated gas and/or its plasma.
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公开(公告)号：US20100041538A1
公开(公告)日：2010-02-18
申请号：US12440683
申请日：2007-09-11
申请人： Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hasimoto , Masahito Uchida , Nobusuke Yamada , Yoshinori Harada , Hideharu Horikoshi
发明人： Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hasimoto , Masahito Uchida , Nobusuke Yamada , Yoshinori Harada , Hideharu Horikoshi
CPC分类号： C03C4/0085 , C03B19/066 , C03B20/00 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C4/10 , C03C2201/23 , C03C2201/50 , C03C2201/54 , Y02P40/57
摘要： Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by crystobalitizing powdery silica raw material; then, fusing the crystobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
摘要翻译： 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由硅胶粉末二氧化硅原料精制而成; 然后，在非还原气氛中将经晶化的二氧化硅材料熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。
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公开(公告)号：US08211817B2
公开(公告)日：2012-07-03
申请号：US12440683
申请日：2007-09-11
申请人： Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hasimoto , Masahito Uchida , Nobusuke Yamada , Yoshinori Harada , Hideharu Horikoshi
发明人： Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hasimoto , Masahito Uchida , Nobusuke Yamada , Yoshinori Harada , Hideharu Horikoshi
IPC分类号： C03C3/06 , C03C10/16 , C03B27/012 , C03B19/01 , C03B19/00
CPC分类号： C03C4/0085 , C03B19/066 , C03B20/00 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C4/10 , C03C2201/23 , C03C2201/50 , C03C2201/54 , Y02P40/57
摘要： Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by cristobalitizing powdery silica raw material; then, fusing the cristobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
摘要翻译： 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由粉状二氧化硅原料碎片化制成; 然后将非平衡二氧化硅材料在非还原气氛中熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。
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公开(公告)号：US5980815A
公开(公告)日：1999-11-09
申请号：US989338
申请日：1997-12-11
IPC分类号： C04B35/00 , B02C19/06 , C01G19/00 , C04B35/457 , C04B35/626 , C23C14/08 , C23C14/34 , C04B33/32
CPC分类号： B02C19/06 , C01G19/00 , C04B35/457 , C04B35/626
摘要： An indium oxide-tin oxide (ITO) sintered body is prepared by mixing a tin oxide powder with an indium oxide powder, molding the resulting mixed powder to obtain a green body, and sintering the resulting green body. At least the tin oxide powder has beforehand been pulverized by colliding tin oxide particles with each other or against a collision substance in gas streams. At least 90 wt % of the pulverized tin oxide powder is preferably particles having a particle size of 0.2-10 .mu.m. A jet mill can be used for the pulverization. The ITO sintered body has a density as high as 7.08 g/cm.sup.3 or more and, during sputtering, is free from nodule formation and is inhibited from generating particles.
摘要翻译： 通过将氧化锡粉末与氧化铟粉末混合来制备氧化铟锡氧化物（ITO）烧结体，模制所得的混合粉末以获得生坯，并烧结所得的生坯体。 氧化锡粉末至少预先通过使氧化锡颗粒相互碰撞或与气流中的碰撞物质相碰撞来粉碎。 粉末状氧化锡粉末的至少90重量％优选为粒径为0.2〜10μm的粒子。 喷粉机可用于粉碎。 ITO烧结体具有高达7.08g / cm 3以上的密度，并且在溅射期间没有结节形成并且被抑制产生颗粒。
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公开(公告)号：US06261984B1
公开(公告)日：2001-07-17
申请号：US09414886
申请日：1999-10-08
IPC分类号： C04B3514
CPC分类号： C23C14/3414
摘要： A mixture of zinc sulfide and silicon dioxide as starting material powder mixed with zinc oxide in an amount of from 0.5 to 5 wt % is subjected to hot pressing sintering to obtain a sintered body. In this manner, a high density sputtering target using the sintered body can be obtained at a high yield.
摘要翻译： 将作为原料粉末的硫化锌和二氧化硅的混合物与0.5〜5重量％的氧化锌混合，进行热压烧结，得到烧结体。 以这种方式，可以高产率获得使用烧结体的高密度溅射靶。
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