公开(公告)号：US06524764B1

公开(公告)日：2003-02-25

申请号：US09744734

申请日：2001-01-29

申请人： Masao Tomikawa ,  Mitsuhito Suwa ,  Yoji Fujita

发明人： Masao Tomikawa ,  Mitsuhito Suwa ,  Yoji Fujita

IPC分类号： G03F7023

CPC分类号： G03F7/0233 ,  C08G73/10 ,  G03F7/022

摘要： The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units represented by the following general formula (1) and, furthermore, in that it satisfies the following conditions (a) and/or (b). The invention provides an alkali-developable photosensitive composition. (a) There is included an ester of a naphthoquinone diazide sulphonic acid and a phenol compound of dipole moment 0.1 to 1.6 debye (b) There is included a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid and/or an ester of a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid (In general formula (1), R1 represents a bivalent to octavalent organic group with at least two carbon atoms, R2 represents a bivalent to hexavalent organic group with at least two carbon atoms, and R3 represents hydrogen or an organic group with from one to ten carbons. n is an integer in the range 10 to 100,000, m is an integer in the range 0 to 2, and p and q are integers in the range 0 to 4, but p and q are not simultaneously 0.) (In the formula, R23, R24, R26 and R27 each represents a hydrogen atom or a C1-8 alkyl group, alkoxy group, carboxyl group or ester group. At least one R25 is hydroxyl group, while the rest represent hydrogen atoms and C1-8 alkyl groups. aa, bb, cc and dd represent integers in the range 0 to 3. However, aa+bb≦5, bb+dd≦5 and aa+bb>0. ee represents an integer in the range 1 to 3.)

摘要翻译： 本发明涉及一种正型感光性树脂前体组合物，其特征在于，其含有以下述通式（1）表示的结构单元作为主要成分的聚合物，此外，其具有满足以下条件（ a）和/或（b）。 本发明提供一种碱显影性感光性组合物，（a）含有萘醌二叠氮磺酸的酯和偶极矩0.1〜1.6德烯的酚化合物（b）含有通式（8）表示的酚化合物 ）和萘醌二叠氮磺酸和/或由通式（8）表示的酚化合物和萘醌二叠氮磺酸的酯（通式（1）中，R 1表示具有至少两个碳的二价至八价有机基团 原子，R2表示具有至少两个碳原子的二价至六价有机基团，并且R 3表示氢或具有1至10个碳的有机基团，n为10至100,000的整数，m为范围内的整数 0〜2，p和q为0〜4的整数，p和q不同时为0）（式中，R 23，R 24，R 26和R 27分别表示氢原子或C 1-8烷基 基团，烷氧基，羧基或醚基 ter组。 至少一个R 25是羟基，而其余的表示氢原子和C 1-8烷基。 aa，bb，cc和dd表示0至3范围内的整数。然而，aa + bb <= 5，bb + dd <= 5和aa + bb> 0。 ee表示1〜3的整数）

公开(公告)号：US06887643B2

公开(公告)日：2005-05-03

申请号：US10623680

申请日：2003-07-22

申请人： Yoji Fujita ,  Mitsuhito Suwa ,  Masao Tomikawa

发明人： Yoji Fujita ,  Mitsuhito Suwa ,  Masao Tomikawa

IPC分类号： C08G73/10 ,  G03F7/004 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0048 ,  Y10S430/108

摘要： A photosensitive resin precursor composition exhibiting an excellent film thickness uniformity contains: a heat resistant resin precursor polymer; a radiation sensitive compound; and a solvent expressed by formula (1): R1 represents an alkyl group having a carbon number in the range of 1 to 3. R2, R3, R4, and R5 each represent hydrogen or an alkyl group having a carbon number in the range of 1 to 3, and l represents an integer in the range of 0 to 3.

摘要翻译： 表现出优异的膜厚均匀性的感光性树脂前体组合物包含：耐热树脂前体聚合物; 辐射敏感化合物; 和由式（1）表示的溶剂：R 1表示碳数在1至3的范围内的烷基。R 2，R 3 R 4，R 4和R 5各自表示氢或碳数为1〜3的烷基，l表示 范围为0到3。

公开(公告)号：US06933087B2

公开(公告)日：2005-08-23

申请号：US10258660

申请日：2002-02-21

申请人： Mitsuhito Suwa ,  Kazuto Miyoshi ,  Masao Tomikawa

发明人： Mitsuhito Suwa ,  Kazuto Miyoshi ,  Masao Tomikawa

IPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0226 ,  G03F7/0233 ,  Y10S430/107

摘要： A positive photosensitive resin precursor composition which can be can be developed in an alkaline developer is provided. The positive photosensitive resin precursor composition comprises (a), one of (b1) and (b2), and (c): (a) a polyamic acid ester and/or a polyamic acid polymer, both of which are soluble in an alkaline aqueous solution; (b1) a phenolic-hydroxyl-group-containing thermally crosslinkable compound comprising an organic-group-R1-substituted methylol group represented by formula (1) (wherein R1 is not a hydrogen atom), CH2—OR1)  (1); (b2) a thermally crosslinkable compound containing a ureal organic group substituted by an organic group R1 and represented by formula (2) (c) an esterified quinone diazide compound.

摘要翻译： 提供可以在碱性显影剂中显影的正型感光性树脂前体组合物。 正型感光性树脂前体组合物包含（a），（b1）和（b2）中的一种，（c）：（a）聚酰胺酸酯和/或聚酰胺酸聚合物，它们都可溶于碱性水溶液 解; （b1）含有酚羟基的热交联性化合物，其包含由式（1）表示的有机基-R 1 - 取代羟甲基（其中R 1， 不是氢原子），<？in-line-formula description =“In-line Formulas”end =“lead”？> CH （1）; <？in-line-formula description =“In-line Formulas”end =“tail”？>（b2）一种热交联性化合物，其含有被 由式（2）（c）表示的有机基团R 1是酯化醌二叠氮化合物。

公开(公告)号：US06593043B2

公开(公告)日：2003-07-15

申请号：US09985059

申请日：2001-11-01

申请人： Mitsuhito Suwa ,  Kazuto Miyoshi ,  Masao Tomikawa

发明人： Mitsuhito Suwa ,  Kazuto Miyoshi ,  Masao Tomikawa

IPC分类号： G03F7023

CPC分类号： G03F7/0226 ,  G03F7/0233 ,  H01L27/32

摘要： A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.

公开(公告)号：US07507518B2

公开(公告)日：2009-03-24

申请号：US10885100

申请日：2004-07-07

申请人： Yoji Fujita ,  Tomoyuki Yuba ,  Mitsuhito Suwa

发明人： Yoji Fujita ,  Tomoyuki Yuba ,  Mitsuhito Suwa

IPC分类号： G03F7/021 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0045 ,  G03F7/0751

摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.

摘要翻译： 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

公开(公告)号：US20050014876A1

公开(公告)日：2005-01-20

申请号：US10885100

申请日：2004-07-07

申请人： Yoji Fujita ,  Tomoyuki Yuba ,  Mitsuhito Suwa

发明人： Yoji Fujita ,  Tomoyuki Yuba ,  Mitsuhito Suwa

IPC分类号： G03F7/022 ,  G03F7/004 ,  G03F7/023 ,  G03F7/075 ,  C08L1/00

CPC分类号： G03F7/0233 ,  G03F7/0045 ,  G03F7/0751

摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.

摘要翻译： 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R 1表示具有至少两个碳原子的价数为2至8的有机基团; R 2表示具有至少两个碳原子的价数为2至6的有机基团; R 3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

公开(公告)号：US08901225B2

公开(公告)日：2014-12-02

申请号：US13513464

申请日：2010-10-26

申请人： Yumiko Okuda ,  Toru Okazawa ,  Masao Kamogawa ,  Mitsuhito Suwa

发明人： Yumiko Okuda ,  Toru Okazawa ,  Masao Kamogawa ,  Mitsuhito Suwa

IPC分类号： G03F7/004 ,  C08F2/48 ,  C08J3/28 ,  G03C1/00 ,  G03F7/09 ,  G03F7/031 ,  G03F7/037

CPC分类号： G03F7/037 ,  G03F7/031 ,  G03F7/091

摘要： A photosensitive resin composition which can impart insulating properties and light-shielding properties against light having a wavelength lying in an ultra-violet range, a visible range and a near-infrared range to a substrate more readily when applied onto the substrate, wherein the substrate has such properties that the permeability to light having a wavelength of 400 to 900 nm inclusive is less than 3.0% and the maximum value of the permeability to light having a wavelength of longer than 900 nm and not longer than 1300 nm is 3.0% or more. The photosensitive resin composition is characterized by comprising (a) an alkali soluble resin, (b) a specific tungsten oxide and/or a specific composite tungsten oxide, (c) a photopolymerizable compound having at least two polymerizable groups, (d) an oxime-type photopolymerization initiator, and (e) a solvent.

摘要翻译： 一种光敏树脂组合物，其能够在施加到基板上时更容易地赋予波长在紫外范围，可见光范围和近红外范围内的光的绝缘性能和遮光性，其中基材 具有波长为400〜900nm以上的光的透过率小于3.0％，波长在900nm以上1300nm以下的光的透过率的最大值为3.0％以上的特性 。 光敏树脂组合物的特征在于包含（a）碱溶性树脂，（b）特定的氧化钨和/或特定的复合氧化钨，（c）具有至少两个可聚合基团的光聚合化合物，（d）肟 型光聚合引发剂，和（e）溶剂。

公开(公告)号：US07476476B2

公开(公告)日：2009-01-13

申请号：US10558873

申请日：2004-05-27

申请人： Mitsuhito Suwa

发明人： Mitsuhito Suwa

IPC分类号： G03F7/037 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14 ,  C08L79/08 ,  C08G73/10

CPC分类号： G03F7/037 ,  C08G73/101 ,  Y10S430/107 ,  Y10S430/11

摘要： This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.

摘要翻译： 本发明涉及一种可在碱性显影剂中显影的负性感光性树脂组合物。 该感光性树脂组合物包含：（a）在聚合物主链的末端具有至少一个选自羧基，酚羟基，磺酸基和硫醇基的基团的聚酰亚胺; （b）具有包含不饱和双键和/或三键的可聚合官能团的化合物; 和（c）光聚合引发剂。

公开(公告)号：US07374856B2

公开(公告)日：2008-05-20

申请号：US11272791

申请日：2005-11-15

申请人： Mitsuhito Suwa ,  Takenori Fujiwara ,  Masahide Senoo ,  Hirokazu Iimori

发明人： Mitsuhito Suwa ,  Takenori Fujiwara ,  Masahide Senoo ,  Hirokazu Iimori

IPC分类号： G03F7/023

CPC分类号： G03F7/0757 ,  C08K5/42 ,  G03F7/022 ,  C08L83/04

摘要： A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 μm of film thickness at a wavelength of 400 nm of 95% or more.

摘要翻译： 可以使用具有高光敏性和具有高耐热性，高透明性和低介电常数等性能的正型感光性硅氧烷组合物来形成用于TFT基板，层间电介质或光波导的芯或包层的平坦化膜。 正型光敏性硅氧烷组合物包括硅氧烷聚合物，醌二叠氮化合物和溶剂，并且由该组合物形成的固化膜在400nm波长处具有3μm的膜厚的透光率为95％以上。

公开(公告)号：US20060159839A1

公开(公告)日：2006-07-20

申请号：US10558873

申请日：2004-05-27

申请人： Mitsuhito Suwa

发明人： Mitsuhito Suwa

IPC分类号： B05D5/06

CPC分类号： G03F7/037 ,  C08G73/101 ,  Y10S430/107 ,  Y10S430/11

摘要： This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.

摘要翻译： 本发明涉及一种可在碱性显影剂中显影的负性感光性树脂组合物。 该感光性树脂组合物包含：（a）在聚合物主链的末端具有至少一个选自羧基，酚羟基，磺酸基和硫醇基的基团的聚酰亚胺; （b）具有包含不饱和双键和/或三键的可聚合官能团的化合物; 和（c）光聚合引发剂。