公开(公告)号：US11809079B2

公开(公告)日：2023-11-07

申请号：US17744873

申请日：2022-05-16

Applicant: ASAHI KASEI KABUSHIKI KAISHA

Inventor： Tomohiro Yorisue ,  Yoshito Ido ,  Taihei Inoue ,  Harumi Matsuda

IPC: G03F7/038 ,  G03F7/38 ,  G03F7/40 ,  H01L21/02 ,  C08G73/10 ,  G03F7/031 ,  H01L21/311 ,  C08L79/08 ,  G03F7/037 ,  H01L23/532 ,  G03F7/20

CPC classification number: G03F7/0387 ,  C08G73/1071 ,  C08L79/08 ,  G03F7/031 ,  G03F7/037 ,  G03F7/0382 ,  G03F7/0388 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/311 ,  H01L23/5329 ,  H01L23/53238 ,  G03F7/2002 ,  G03F7/38 ,  G03F7/40 ,  C08L79/08 ,  C08K5/3725 ,  C08L79/08

Abstract: A semiconductor device having a copper wiring and an insulating layer provided on the copper wiring, where after storage in air with a humidity of 5% for 168 hours at 150° C., the area of void portion of the copper wiring is 10% or less at the copper wiring surface in contact with the insulating layer. The insulating layer contains at least one polyimide that has (i) a structure derived from 4,4′-oxydiphthalic acid dianhydride and a structure derived from 4,4′-diaminodiphenyl ether; or (ii) a structure derived from 3,3′4,4′-biphenyltetracarboxylic acid dianhydride and a structure derived from 4,4′-diaminodiphenyl ether; or (iii) a structure derived from 4,4′-oxydiphthalic acid dianhydride and a structure derived from 2,2′-dimethyl-4,4′-diaminobiphenyl.

公开(公告)号：US11656551B2

公开(公告)日：2023-05-23

申请号：US16644343

申请日：2018-08-31

Applicant: TOYOBO CO., LTD.

Inventor： Wataru Kawashima ,  Jun Hasuike

IPC: G03F7/037 ,  B41N1/12 ,  C08G69/14 ,  G03F7/11

CPC classification number: G03F7/037 ,  B41N1/12 ,  C08G69/14 ,  G03F7/11

Abstract: A photosensitive resin composition for a flexographic printing original plate is disclosed which exhibits reduced adhesion of dust, dirt, and paper powder, resistance to UV ink and allows storage of the printing original plate for a long period of time. A water-developable photosensitive resin composition for flexographic printing, contains at least a polyamide and/or a polyamide block copolymer (a), a cross-linking agent having one or more unsaturated group(s) (b), a photo-polymerization initiator (c), and a fatty acid ester (d), wherein the fatty acid ester (d) has two or more hydroxyl groups and 24 or 25 carbon atoms in a molecule, wherein the fatty acid ester (d) is a fatty acid ester of a compound selected from fatty acids having a number of carbon atoms of 12 to 22, and wherein a content of the fatty acid ester (d) in the photosensitive resin composition is 0.2 to 6% by weight.

公开(公告)号：US20190023917A1

公开(公告)日：2019-01-24

申请号：US16061205

申请日：2016-12-21

Applicant: Carbon, Inc.

Inventor： Jessica D. Drazba ,  Kai Chen ,  Jason P. Rolland

IPC: C09D11/101 ,  C09D11/102 ,  C09D11/037 ,  C08G18/10 ,  C08G18/63 ,  C08G18/77 ,  B33Y70/00

CPC classification number: C09D11/101 ,  B29C64/124 ,  B29C64/135 ,  B29K2075/00 ,  B29K2083/00 ,  B29K2096/04 ,  B29K2105/0002 ,  B29K2105/0085 ,  B33Y10/00 ,  B33Y70/00 ,  C08G18/10 ,  C08G18/638 ,  C08G18/778 ,  C09D11/037 ,  C09D11/102 ,  G03F7/027 ,  G03F7/037 ,  G03F7/0755 ,  G03F7/0757

Abstract: A polymerizable liquid useful for the production of a three-dimensional object comprised of silicone, or a copolymer thereof, which includes at least one constituent selected from the group consisting of (i) a blocked or reactive blocked siloxane-containing prepolymer, (ii) a blocked or reactive blocked siloxane-containing polyisocyanate, and (iii) a blocked or reactive blocked siloxane-containing polyisocyanate chain extender. Methods of using the same in additive manufacturing processes such as continuous liquid interface production are also described.

公开(公告)号：US20180024434A1

公开(公告)日：2018-01-25

申请号：US15616237

申请日：2017-06-07

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Katsuya TAKEMURA ,  Hiroyuki URANO ,  Masashi IIO ,  Masayoshi SAGEHASHI ,  Koji HASEGAWA

IPC: G03F7/038 ,  C08G73/12 ,  C08G73/10 ,  G03F7/004 ,  G03F7/40 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C07C69/80 ,  G03F7/031

CPC classification number: G03F7/0387 ,  C07C69/76 ,  C07C69/80 ,  C08G73/1007 ,  C08G73/1042 ,  C08G73/121 ,  C08G73/123 ,  C08G73/127 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/031 ,  G03F7/037 ,  G03F7/038 ,  G03F7/0385 ,  G03F7/0388 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), Y1nRf)k   (2) wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; Rf represents a linear, branched, or cyclic alkyl group having 1 to 20 carbon atoms or an aromatic group in which a part or all of hydrogen atoms is/are substituted with a fluorine atom(s); “k” represents 1, 2, or 3; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition, and usable as a base resin of a negative photosensitive resin composition.

公开(公告)号：US20170299965A1

公开(公告)日：2017-10-19

申请号：US15517093

申请日：2015-10-01

Applicant: TORAY INDUSTRIES, INC.

Inventor： Keika HASHIMOTO ,  Kazuto MIYOSHI ,  Masao TOMIKAWA

IPC: G03F7/40 ,  H01L27/32 ,  G03F7/037 ,  C09D179/08 ,  G03F7/023 ,  G03F7/004 ,  H01L51/52 ,  G03F7/038

CPC classification number: G03F7/40 ,  C08L101/02 ,  C09D179/08 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/037 ,  G03F7/0387 ,  H01L21/027 ,  H01L27/3246 ,  H01L27/3258 ,  H01L29/786 ,  H01L51/529

Abstract: A resin composition which is configured such that if the resin composition is formed into a resin composition film that has a thickness of 3.0 μm after a heat treatment at a temperature within the range of 200-350° C., the resin composition film forms a heat-resistant resin film that has a light transmittance of 50% or more at a wavelength of 365-436 nm before the heat treatment, while having a light transmittance of 10% or less at a wavelength of 365-436 nm after the heat treatment. Provided is a resin composition having a function of absorbing ultraviolet light and visible light in a short wavelength range, which is suitable for the formation of a planarization film, an insulating layer and a partition wall that are used for organic light emitting devices or display devices.

公开(公告)号：US20170298186A1

公开(公告)日：2017-10-19

申请号：US15457493

申请日：2017-03-13

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Katsuya TAKEMURA ,  Hiroyuki URANO ,  Masashi IIO ,  Masayoshi SAGEHASHI ,  Koji HASEGAWA

IPC: C08G73/10 ,  G03F7/38 ,  G03F7/32 ,  G03F7/20 ,  G03F7/16 ,  G03F7/039 ,  C07C69/92 ,  G03F7/038 ,  G03F7/031 ,  G03F7/023 ,  G03F7/004 ,  G03F7/40

CPC classification number: C08G73/1039 ,  C07C69/76 ,  C07C69/92 ,  C08G73/1007 ,  C08G73/1042 ,  C08G73/105 ,  C08G73/106 ,  C08G73/1071 ,  C08G73/123 ,  C08G73/126 ,  C09D179/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/031 ,  G03F7/037 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; “k” represents 1 or 2; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition and usable as a base resin of a photosensitive resin composition.

公开(公告)号：US09753274B2

公开(公告)日：2017-09-05

申请号：US14892759

申请日：2015-01-08

Applicant: JSR CORPORATION

Inventor： Yoshinori Kinoshita ,  Toshiharu Araki ,  Kazunari Kudou

IPC: G02B26/00 ,  G02F1/03 ,  G02F1/29 ,  G02F1/133 ,  G03F7/038 ,  G03F7/075 ,  G03F7/032 ,  G03F7/033 ,  G03F7/037

CPC classification number: G02B26/005 ,  G03F7/032 ,  G03F7/033 ,  G03F7/037 ,  G03F7/038 ,  G03F7/0387 ,  G03F7/0757

Abstract: The present invention relates to a display element, a photosensitive composition and an electrowetting display. The display element includes: a first electrode layer stack; a second electrode layer stack; a housing space formed between the first and second electrode layer stacks; and a partition wall compartmentalizing the housing space, wherein the housing space contains at least a polar liquid and a non-polar liquid that are immiscible with each other, a surface layer in contact with the partition wall exists on the surface of at least one of the first and second electrode layer stacks that is in contact with the housing space, and an absolute value of the difference in linear expansion coefficient between the partition wall and the surface layer is 150 ppm/K or less.

公开(公告)号：US20170240705A1

公开(公告)日：2017-08-24

申请号：US15589114

申请日：2017-05-08

Applicant: MITSUI CHEMICALS, INC.

Inventor： Kenichi FUKUKAWA ,  Masaki OKAZAKI ,  Yoshihiro SAKATA ,  Tatsuhiro URAKAMI ,  Atsushi OKUBO

IPC: C08G73/10 ,  C08J5/18 ,  H05K1/03 ,  H01B3/30 ,  H05K3/00 ,  G03F7/11 ,  G03F7/32

CPC classification number: C08G73/1042 ,  B32B15/08 ,  B32B15/088 ,  B32B27/281 ,  B32B2307/206 ,  B32B2307/412 ,  B32B2457/08 ,  B32B2457/20 ,  B32B2551/00 ,  C08G73/10 ,  C08G73/1082 ,  C08J5/18 ,  C08J2379/08 ,  C08L79/08 ,  C09D179/08 ,  G03F7/037 ,  G03F7/11 ,  G03F7/20 ,  G03F7/322 ,  H01B3/306 ,  H05K1/0296 ,  H05K1/0346 ,  H05K1/0353 ,  H05K1/0393 ,  H05K3/0017 ,  H05K3/281 ,  H05K2201/0154

Abstract: Provided are a block polyamide acid imide having an appropriate solubility in aqueous alkaline solutions, and block polyimides that are obtained using same and have high transparency and a low coefficient of linear thermal expansion (low CTE). The block polyimide comprises blocks configured from repeating structural units represented by defined formula (1A) and blocks configured from repeating structural units represented by defined formula (1B).

公开(公告)号：US09499002B2

公开(公告)日：2016-11-22

申请号：US14765270

申请日：2014-01-20

Applicant: TORAY Industries, Inc.

Inventor： Hiroyuki Kawahara ,  Tsutomu Abura

IPC: B41C1/05 ,  B41N1/12 ,  G03F7/037 ,  B29B13/00 ,  B29C35/08 ,  B29K31/00 ,  B29L31/00

CPC classification number: B41N1/12 ,  B29B13/00 ,  B29C35/0805 ,  B29C2035/0838 ,  B29K2031/04 ,  B29L2031/767 ,  B41C1/05 ,  G03F7/037

Abstract: It is an object of the present invention to provide a resin printing plate precursor for laser engraving that is able to form a relief by laser engraving, the relief having excellent image reproducibility, and moreover has toughness and improved printing durability. The present invention is a resin printing plate precursor for laser engraving comprising a substrate and a resin layer on the substrate, the resin layer containing: (A) a modified partially saponified polyvinyl acetate having reactive groups in its side chain; (B) a polyamide having basic nitrogen; (C) a compound having a 5- to 7-membered ring and a polymerizable ethylenic double bond; and (D) a photopolymerization initiator.

公开(公告)号：US09465151B2

公开(公告)日：2016-10-11

申请号：US14314733

申请日：2014-06-25

Applicant: BOE TECHNOLOGY GROUP CO., LTD. ,  BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.

Inventor： Xiaona Liu ,  Yongzhi Song

IPC: G02B5/23 ,  G02F1/1335 ,  G02B5/22 ,  G03F7/00 ,  C08J7/18

CPC classification number: G02B5/223 ,  G02F1/133514 ,  G02F2201/086 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/035 ,  G03F7/037 ,  G03F7/038 ,  G03F7/06

Abstract: The invention discloses a photosensitive resin composition and a color filter. The photosensitive resin composition comprises, by weight of the photosensitive resin composition, 0.6%-2% silver halide, 0.06%-0.7% oxidant, 5%-15% the second dispersion resin, 5%-10% light-polymerizable compound, 25%-57% pigment dispersion, 0.05%-0.06% light polymerization initiator and 28.5%-60% solvent. When placed under a strong ultraviolet light irradiation condition, the color filter exhibits black and barriers the ultraviolet light; and when placed in a visible light range, the color filter recovers the original color.

Abstract translation: 本发明公开了一种感光性树脂组合物和滤色器。 感光性树脂组合物以感光性树脂组合物的重量计含有0.6％-2％卤化银，0.06％-0.7％氧化剂，5％-15％第二分散树脂，5％-10％可光聚合化合物，25 ％-57％的颜料分散体，0.05％-0.06％的光聚合引发剂和28.5％-60％的溶剂。 当放置在强紫外线照射条件下时，滤色器显示黑色并阻挡紫外线; 并且当放置在可见光范围时，滤色器恢复原始颜色。