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公开(公告)号：US06925347B1
公开(公告)日：2005-08-02
申请号：US10223174
申请日：2002-08-19
申请人： Michael L. Miller , Thomas J. Sonderman , Alexander J. Pasadyn , Richard J. Markle , Brian K. Cusson , Patrick M. Cowan , Timothy L. Jackson , Naomi M. Jenkins
发明人： Michael L. Miller , Thomas J. Sonderman , Alexander J. Pasadyn , Richard J. Markle , Brian K. Cusson , Patrick M. Cowan , Timothy L. Jackson , Naomi M. Jenkins
IPC分类号： G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/45031 , Y02P90/22
摘要： A method and apparatus is provided for a process control based on an estimated process result. The method comprises processing a workpiece using a processing tool, receiving trace data associated with the processing of the workpiece from the processing tool and estimating at least one process result of the workpiece based on at least a portion of the received trace data. The method further comprises adjusting processing of a next workpiece based on the estimated at least one process result.
摘要翻译： 基于估计的处理结果提供了用于过程控制的方法和装置。 该方法包括使用处理工具处理工件，从处理工具接收与工件的处理相关联的跟踪数据，并基于所接收的跟踪数据的至少一部分估计工件的至少一个处理结果。 该方法还包括基于估计的至少一个处理结果来调整下一个工件的处理。
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公开(公告)号：US07031793B1
公开(公告)日：2006-04-18
申请号：US10286305
申请日：2002-11-01
CPC分类号： G05B19/042
摘要： A method and an apparatus are provided for conflict resolution among a plurality of controllers. The method includes receiving a first control instruction from a first process controller to process a workpiece, receiving a second control instruction from a second process controller to process the workpiece and adjusting at least one of the first control instruction and the second control instruction to process the workpiece to achieve a desired process goal.
摘要翻译： 为多个控制器之间的冲突解决提供了一种方法和装置。 该方法包括从第一过程控制器接收第一控制指令以处理工件，从第二过程控制器接收第二控制指令以处理工件并调整第一控制指令和第二控制指令中的至少一个以处理 工件达到所期望的工艺目标。
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公开(公告)号：US06991945B1
公开(公告)日：2006-01-31
申请号：US10231911
申请日：2002-08-30
申请人： Howard E. Castle , Matthew A. Purdy , Gregory A. Cherry , Richard J. Markle , Eric O. Green , Michael L. Miller , Brian K. Cusson
发明人： Howard E. Castle , Matthew A. Purdy , Gregory A. Cherry , Richard J. Markle , Eric O. Green , Michael L. Miller , Brian K. Cusson
IPC分类号： H01L21/66
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method and apparatus is provided for fault detection spanning multiple processes. The method comprises receiving operational data associated with a first process, receiving operational data associated with a second process, which is downstream to the first process and performing fault detection analysis based on the operational data associated with the first process and second process using a common fault detection unit.
摘要翻译： 提供了跨越多个过程的故障检测的方法和装置。 该方法包括接收与第一过程相关联的操作数据，接收与第一进程相关的操作数据，该第二进程是第一进程的下游，并且基于与第一进程相关联的操作数据和使用公共故障的第二进程来执行故障检测分析 检测单元
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4.发明授权Method and apparatus for modifying design constraints based on observed performance 失效基于观察性能修改设计约束的方法和装置公开(公告)号：US06907369B1
公开(公告)日：2005-06-14
申请号：US10425227
申请日：2003-05-02
IPC分类号： G05B19/418 , G06F17/50 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32018 , G05B2219/32101 , G05B2219/45026 , G06F17/5068 , Y02P90/22
摘要： A method for modifying design constraints based on observed performance includes measuring a characteristic of a plurality of devices manufactured in a process flow. A design constraint associated with the characteristic is defined. A performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint is generated. The design constraint is modified based on the performance metric. A manufacturing system includes a metrology tool and a design rule monitor. The metrology tool is configured to measure a characteristic of a plurality of devices manufactured in a process flow. The design rule monitor is configured to receive a design constraint associated with the characteristic, generate a performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint, and modify the design constraint based on the performance metric.
摘要翻译： 基于观察到的性能来修改设计约束的方法包括测量在处理流程中制造的多个设备的特性。 定义与特性相关的设计约束。 产生与测量特性和设计约束相关的设备性能的性能指标。 基于性能指标修改设计约束。 制造系统包括计量工具和设计规则监视器。 计量工具被配置为测量在处理流程中制造的多个装置的特性。 设计规则监视器被配置为接收与特性相关联的设计约束，根据测量的特性和设计约束生成与设备的性能相关的性能度量，并且基于性能度量来修改设计约束。
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公开(公告)号：US07292959B1
公开(公告)日：2007-11-06
申请号：US11342759
申请日：2006-01-30
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/42001 , G05B2219/45031 , Y02P90/22
摘要： The present invention provides a method and apparatus for controlling processing tools and related control units. The method includes accessing information indicative of at least one excursion of at least one processing tool detected by a first control unit associated with the at least one processing tool. The method also includes determining at least one action to be taken by at least one second control unit associated with the at least one processing tool based on the information indicative of said at least one excursion.
摘要翻译： 本发明提供一种用于控制加工工具和相关控制单元的方法和装置。 该方法包括访问指示由与至少一个处理工具相关联的第一控制单元检测到的至少一个处理工具的至少一个偏移的信息。 该方法还包括基于指示所述至少一个偏移的信息来确定由与至少一个处理工具相关联的至少一个第二控制单元采取的至少一个动作。
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6.发明授权公开(公告)号：US07254453B2
公开(公告)日：2007-08-07
申请号：US10301051
申请日：2002-11-21
CPC分类号： G05B19/41865 , G05B2219/33104 , G05B2219/45031 , Y02P90/14 , Y02P90/20
摘要： A method and an apparatus for implementing a multi-variate process control system. A workpiece is processed using a primary process control function during a first time period. A secondary process control function is performed during at least a portion of the first time period for processing of the workpiece. The secondary process control function is capable of modifying at least one secondary control parameter.
摘要翻译： 一种用于实现多变量过程控制系统的方法和装置。 在第一时间段期间使用主过程控制功能处理工件。 在用于处理工件的第一时间段的至少一部分期间执行二次过程控制功能。 辅助过程控制功能能够修改至少一个辅助控制参数。
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7.发明授权Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same 有权用于控制蚀刻工艺和跨晶片均匀性的等离子体状态监测以及执行相同的系统公开(公告)号：US07402257B1
公开(公告)日：2008-07-22
申请号：US10209585
申请日：2002-07-30
IPC分类号： G01R31/00
CPC分类号： H01L22/20
摘要： The present invention is generally directed to plasma state monitoring to control etching processes and across-wafer uniformity, and a system for performing same. In one illustrative embodiment, the method comprises generating a plasma within an etching tool, monitoring at least one characteristic of the generated plasma, and controlling at least one parameter of a plasma etching process performed in the tool based upon the monitored at least one characteristic of the plasma. In another illustrative embodiment, the method comprises generating a plasma within an etch tool, performing a plasma etching process within the etch tool, determining at least one characteristic of the plasma, and controlling at least one parameter of the etching process based upon a comparison of the determined at least one characteristic of the plasma and a target value for the determined at least one characteristic of the plasma.
摘要翻译： 本发明一般涉及用于控制蚀刻工艺和跨晶片均匀性的等离子体状态监测，以及用于执行其的系统。 在一个说明性实施例中，该方法包括在蚀刻工具内产生等离子体，监测产生的等离子体的至少一个特征，以及基于所监测的至少一个特征来控制在工具中执行的等离子体蚀刻工艺的至少一个参数 等离子体。 在另一示例性实施例中，该方法包括在蚀刻工具内产生等离子体，在蚀刻工具内执行等离子体蚀刻工艺，确定等离子体的至少一种特性，以及基于比较来控制蚀刻工艺的至少一个参数 所确定的等离子体的至少一个特性和所确定的等离子体的至少一个特性的目标值。
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公开(公告)号：US06960774B2
公开(公告)日：2005-11-01
申请号：US10700175
申请日：2003-11-03
申请人： Elfido Coss, Jr. , Patrick M. Cowan , Richard J. Markle , Tom Tse
发明人： Elfido Coss, Jr. , Patrick M. Cowan , Richard J. Markle , Tom Tse
IPC分类号： H01J37/302 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/3023 , H01J37/304
摘要： The present invention is generally directed to fault detection and control methodologies for ion implant processes, and a system for performing same. In one illustrative embodiment, the method comprises performing a tuning process for an ion implant tool, the tuning process resulting in at least one tool parameter for the ion implant tool, selecting or creating a fault detection model for an ion implant process to be performed in the ion implant tool based upon the tool parameter resulting from the tuning process, and monitoring an ion implant process performed in the ion implant tool using the selected or created fault detection model. In another illustrative embodiment, the method comprises performing a tuning process for an ion implant tool, the tuning process resulting in at least one tool parameter for the ion implant tool, and determining if the tool parameter resulting from the tuning process is acceptable based on historical metrology data for implant regions formed in at least one substrate subjected to an ion implant process performed in the ion implant tool.
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公开(公告)号：US06594589B1
公开(公告)日：2003-07-15
申请号：US09863822
申请日：2001-05-23
IPC分类号： G01B344
CPC分类号： G05B19/4184 , G05B2219/31357 , G05B2219/45031 , Y02P80/15 , Y02P90/14
摘要： A method for monitoring health of a tool includes receiving at least one tool parameter related to the processing of a workpiece in a tool; receiving a model selection trigger; selecting a tool health model based on the model selection trigger; generating at least one predicted tool parameter based on the selected tool health model; and generating a tool health rating for the tool based on a comparison between the measured tool parameter and the predicted tool parameter. A tool health monitor includes a library of tool health models, a model selector, and a fault detection and classification unit. The model selector is adapted to receive a model selection trigger and select a tool health model based on the model selection trigger. The fault detection and classification unit is adapted to receive at least one tool parameter related to the processing of a workpiece in a tool, generate at least one predicted tool parameter based on the selected tool health model, and generate a tool health rating for the tool based on a comparison between the received tool parameter and the predicted tool parameter.
摘要翻译： 用于监测工具健康的方法包括：接收与工具中的工件的处理有关的至少一个工具参数; 接收模型选择触发; 基于模型选择触发选择工具健康模型; 基于所选择的工具健康模型生成至少一个预测的工具参数; 并且基于所测量的工具参数和所预测的工具参数之间的比较，为所述工具生成工具健康评级。 工具健康监测器包括工具健康模型库，模型选择器和故障检测和分类单元。 模型选择器适于接收模型选择触发，并根据模型选择触发选择工具健康模型。 所述故障检测和分类单元适于接收与工具中的工件的处理有关的至少一个刀具参数，基于所选择的刀具健康模型生成至少一个预测刀具参数，并为所述刀具生成刀具健康等级 基于所接收的刀具参数与预测刀具参数之间的比较。
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公开(公告)号：US06988225B1
公开(公告)日：2006-01-17
申请号：US10285003
申请日：2002-10-31
IPC分类号： G06F11/00
CPC分类号： G05B23/0262
摘要： A method and an apparatus are provided for verifying a fault detection result in a system. The apparatus includes an interface and a control unit. The interface is adapted to receive data associated with a process operation and adapted to receive information provided by a process controller associated with the process operation. The control unit, which is communicatively coupled to the interface, is adapted to perform a fault detection analysis based on the data associated with the process operation and verify a result of the fault detection analysis based on the information provided by the process controller.
摘要翻译： 提供了一种用于验证系统中的故障检测结果的方法和装置。 该装置包括接口和控制单元。 接口适于接收与过程操作相关联的数据，并且适于接收由过程操作相关联的过程控制器提供的信息。 通信地耦合到接口的控制单元适于基于与处理操作相关联的数据执行故障检测分析，并且基于由过程控制器提供的信息来验证故障检测分析的结果。
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