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    Dynamic wireless networks and interactive wireless information communication and delivery systems for calculating distance to an object
    5.
    发明授权
    Dynamic wireless networks and interactive wireless information communication and delivery systems for calculating distance to an object 有权
    动态无线网络和用于计算距离物体的交互式无线信息通信和传送系统

    公开(公告)号：US08594638B2

    公开(公告)日：2013-11-26

    申请号：US13310761

    申请日：2011-12-04

    申请人： Rick Sturdivant ,  Joaquin Felipe Brown ,  David E. Brown ,  Chris Turner ,  Aaron Dewitt

    发明人： Rick Sturdivant ,  Joaquin Felipe Brown ,  David E. Brown ,  Chris Turner ,  Aaron Dewitt

    IPC分类号： H04M3/42 ,  H04W24/00

    CPC分类号： H04W4/023 ,  H04B17/27 ,  H04B17/318 ,  H04W64/00

    摘要： A method is disclosed for calculating a distance to objects or a nearest object to a wireless enabled device. The method includes the steps of broadcasting a signal by the wireless enabled device to data tags, receiving by the data tags the signal by the wireless enabled device, and obtaining by each of the data tags a signal strength indicator of the wireless enabled device based on the signal from the wireless enabled device. Each of the data tags in a range transmits a signal to the wireless enabled device including the signal strength indicator of the wireless enabled device. Each signal strength indicator of the wireless enabled device is communicated to a positioning and communication system.

    摘要翻译： 公开了一种用于计算到与无线使能设备的物体或最近物体的距离的方法。 该方法包括以下步骤：将无线使能设备的信号广播到数据标签，由数据标签接收无线使能设备的信号，以及通过每个数据标签获得基于无线功能的设备的信号强度指示符，基于 来自无线使能设备的信号。 范围中的每个数据标签将信号发送到包括无线使能设备的信号强度指示符的无线使能设备。 无线使能设备的每个信号强度指示符被传送到定位和通信系统。

    DYNAMIC WIRELESS NETWORKS AND INTERACTIVE WIRELESS INFORMATION COMMUNICATION AND DELIVERY SYSTEMS FOR CALCULATING DISTANCE TO AN OBJECT
    6.
    发明申请
    DYNAMIC WIRELESS NETWORKS AND INTERACTIVE WIRELESS INFORMATION COMMUNICATION AND DELIVERY SYSTEMS FOR CALCULATING DISTANCE TO AN OBJECT 有权
    动态无线网络和交互式无线信息通信和传送系统，用于计算对象的距离

    公开(公告)号：US20130040588A1

    公开(公告)日：2013-02-14

    申请号：US13310761

    申请日：2011-12-04

    申请人： Rick Sturdivant ,  Joaquin Felipe Brown ,  David E. Brown ,  Chris Turner ,  Aaron Dewitt

    发明人： Rick Sturdivant ,  Joaquin Felipe Brown ,  David E. Brown ,  Chris Turner ,  Aaron Dewitt

    IPC分类号： H04B17/00 ,  H04W24/00

    CPC分类号： H04W4/023 ,  H04B17/27 ,  H04B17/318 ,  H04W64/00

    摘要： A method is disclosed for calculating a distance to objects or a nearest object to a wireless enabled device. The method includes the steps of broadcasting a signal by the wireless enabled device to data tags, receiving by the data tags the signal by the wireless enabled device, and obtaining by each of the data tags a signal strength indicator of the wireless enabled device based on the signal from the wireless enabled device. Each of the data tags in a range transmits a signal to the wireless enabled device including the signal strength indicator of the wireless enabled device. Each signal strength indicator of the wireless enabled device is communicated to a positioning and communication system.

    摘要翻译： 公开了一种用于计算到与无线使能设备的物体或最近物体的距离的方法。 该方法包括以下步骤：将无线使能设备的信号广播到数据标签，由数据标签接收无线使能设备的信号，以及通过每个数据标签获得基于无线功能的设备的信号强度指示符，基于 来自无线使能设备的信号。 范围中的每个数据标签将信号发送到包括无线使能设备的信号强度指示符的无线使能设备。 无线使能设备的每个信号强度指示符被传送到定位和通信系统。

    METHOD OF PRODUCING A RELIEF IMAGE FOR PRINTING
    7.
    发明申请
    METHOD OF PRODUCING A RELIEF IMAGE FOR PRINTING 有权
    制作印刷图像的方法

    公开(公告)号：US20120127443A1

    公开(公告)日：2012-05-24

    申请号：US13314219

    申请日：2011-12-08

    申请人： M. Zaki Ali ,  David E. Brown ,  Elsie A. Fohrenkamm ,  Michael B. Heller

    发明人： M. Zaki Ali ,  David E. Brown ,  Elsie A. Fohrenkamm ,  Michael B. Heller

    IPC分类号： G03B27/42

    CPC分类号： G03F7/0035 ,  G03F7/2016 ,  Y10S430/145

    摘要： The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.

    摘要翻译： 本发明涉及一种制作浮雕图像的方法。 使用包括载体片和可成像材料的膜来形成对固化辐射不透明的掩模图像。 在一个实施例中，掩模图像形成在载体片上，而在另一个实施例中，掩模图像形成在接收片上。 然后将掩模图像转印到感光材料，例如柔版印刷版前体。 所得的组件暴露于固化辐射，导致感光材料的暴露和未曝光的区域。 载体片或接收片可以在暴露于固化辐射之前或之后从掩模图像中去除。 最后，感光材料和掩模图像组件用合适的显影剂显影以形成浮雕图像。

    Method of producing a relief image for printing
    8.
    发明授权
    Method of producing a relief image for printing 有权
    制作用于印刷的浮雕图像的方法

    公开(公告)号：US08142987B2

    公开(公告)日：2012-03-27

    申请号：US11081018

    申请日：2005-03-15

    申请人： M. Zaki Ali ,  David E. Brown ,  Elsie A. Fohrenkamm ,  Michael B. Heller

    发明人： M. Zaki Ali ,  David E. Brown ,  Elsie A. Fohrenkamm ,  Michael B. Heller

    IPC分类号： G03F7/34

    CPC分类号： G03F7/0035 ,  G03F7/2016 ,  Y10S430/145

    摘要： The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.

    摘要翻译： 本发明涉及一种制作浮雕图像的方法。 使用包括载体片和可成像材料的膜来形成对固化辐射不透明的掩模图像。 在一个实施例中，掩模图像形成在载体片上，而在另一个实施例中，掩模图像形成在接收片上。 然后将掩模图像转印到感光材料，例如柔版印刷版前体。 所得的组件暴露于固化辐射，导致感光材料的暴露和未曝光的区域。 载体片或接收片可以在暴露于固化辐射之前或之后从掩模图像中去除。 最后，感光材料和掩模图像组件用合适的显影剂显影以形成浮雕图像。

    Method for forming semiconductor devices with active silicon height variation
    9.
    发明授权
    Method for forming semiconductor devices with active silicon height variation 有权
    用于形成具有活性硅高度变化的半导体器件的方法

    公开(公告)号：US08003459B2

    公开(公告)日：2011-08-23

    申请号：US12691477

    申请日：2010-01-21

    申请人： David E. Brown ,  Hans Van Meer ,  Sey-Ping Sun

    发明人： David E. Brown ,  Hans Van Meer ,  Sey-Ping Sun

    IPC分类号： H01L21/8238

    CPC分类号： H01L29/0684 ,  H01L21/84 ,  H01L27/1203

    摘要： A method for forming different active thicknesses on the same silicon layer includes masking the silicon layer and exposing selected regions of the silicon layer. The thickness of the silicon layer at the exposed regions is changed, either by adding silicon or subtracting silicon from the layer at the exposed regions. Once the mask is removed, the silicon layer has regions of different active thicknesses, respectively suitable for use in different types of devices, such as diodes and transistors.

    摘要翻译： 在同一硅层上形成不同有源厚度的方法包括掩蔽硅层并暴露硅层的选定区域。 通过在曝光区域从层中添加硅或从中减去硅来改变暴露区域处的硅层的厚度。 一旦去除掩模，硅层就具有不同有源厚度的区域，分别适用于不同类型的器件，例如二极管和晶体管。

    Method of controlling embedded material/gate proximity
    10.
    发明授权
    Method of controlling embedded material/gate proximity 有权
    控制嵌入材料/栅极接近度的方法

    公开(公告)号：US07838308B2

    公开(公告)日：2010-11-23

    申请号：US12119196

    申请日：2008-05-12

    申请人： Rohit Pal ,  David E. Brown ,  Alok Vaid ,  Kevin Lensing

    发明人： Rohit Pal ,  David E. Brown ,  Alok Vaid ,  Kevin Lensing

    IPC分类号： H01L21/00

    CPC分类号： H01L29/7848 ,  H01L22/12 ,  H01L22/20 ,  H01L29/66636 ,  H01L29/78

    摘要： A method that includes forming a gate of a semiconductor device on a substrate and forming a recess for an embedded silicon-straining material in source and drain regions for the gate. In this method, a proximity value, which is defined as a distance between the gate and a closest edge of the recess, is controlled by controlling formation of an oxide layer provided beneath the gate. The method can also include feedforward control of process steps in the formation of the recess based upon values measured during the formation of the recess. The method can also apply feedback control to adjust a subsequent recess formation process performed on a subsequent semiconductor device based on the comparison between a measured proximity value and a target proximity value to decrease a difference between a proximity value of the subsequent semiconductor device and the target proximity value.

    摘要翻译： 一种方法，包括在衬底上形成半导体器件的栅极，并在栅极的源极和漏极区域中形成嵌入的硅应变材料的凹部。 在该方法中，通过控制形成在栅极下方的氧化物层来控制被定义为栅极和凹部的最近边缘之间的距离的接近值。 该方法还可以包括基于在形成凹部期间测量的值来形成凹部中的工艺步骤的前馈控制。 该方法还可以基于测量的接近度值和目标接近值之间的比较来应用反馈控制来调整对随后的半导体器件执行的随后的凹陷形成处理，以减小随后的半导体器件的接近值与目标之间的差异 接近值。