HIGH GAIN COATINGS AND METHODS
    1.
    发明申请
    HIGH GAIN COATINGS AND METHODS 审中-公开
    高增益涂料和方法

    公开(公告)号:US20120019134A1

    公开(公告)日:2012-01-26

    申请号:US13187228

    申请日:2011-07-20

    IPC分类号: H01K1/32 H01J9/20

    CPC分类号: H01K3/005 H01K1/325

    摘要: A halogen incandescent burner comprising a quartz body comprising a light emitting chamber, a filament positioned within the light emitting chamber, and a multilayer optical coating on at least a portion of the chamber. The coating may include a plurality of layers of a low refractive index material and a high refractive index material having a total thickness of at least nine microns, wherein the gain of the burner is at least 1.7. The high refractive index material may comprise tantala and the low refractive index material may comprise silica.

    摘要翻译: 一种卤素白炽灯,其包括石英体,所述石英体包括发光室,位于所述发光室内的细丝,以及在所述室的至少一部分上的多层光学涂层。 涂层可以包括多层低折射率材料和总厚度至少为9微米的高折射率材料,其中燃烧器的增益至少为1.7。 高折射率材料可以包括钽酸盐,并且低折射率材料可以包括二氧化硅。

    Thin film coating system and method
    2.
    发明申请
    Thin film coating system and method 有权
    薄膜涂层系统及方法

    公开(公告)号:US20090145745A1

    公开(公告)日:2009-06-11

    申请号:US12289398

    申请日:2008-10-27

    IPC分类号: C23C14/34

    摘要: A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.

    摘要翻译: 一种用于在衬底上沉积薄膜的方法和系统。 在该系统中,靶材料沉积并在衬底表面上反应以形成基本上不吸收的薄膜。 每单位时间形成的非吸收性薄膜的体积可以通过将表面的面积增加×倍而增加,并且将目标材料的沉积速率提高大于该因子的倒数的因子 “x”,从而增加每单位时间内非吸收薄膜体积的形成速率。

    Thin film coating system and method
    3.
    发明授权
    Thin film coating system and method 有权
    薄膜涂层系统及方法

    公开(公告)号:US08133361B2

    公开(公告)日:2012-03-13

    申请号:US12289398

    申请日:2008-10-27

    IPC分类号: C23C14/34 C23C14/35

    摘要: A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.

    摘要翻译: 一种用于在衬底上沉积薄膜的方法和系统。 在该系统中,靶材料沉积并在衬底表面上反应以形成基本上不吸收的薄膜。 每单位时间形成的非吸收性薄膜的体积可以通过将表面的面积增加×倍而增加,并且将目标材料的沉积速率提高大于该因子的倒数的因子 “x”,从而增加每单位时间内非吸收薄膜体积的形成速率。

    IR COATINGS AND METHODS
    4.
    发明申请
    IR COATINGS AND METHODS 审中-公开
    红外线涂料和方法

    公开(公告)号:US20120019135A1

    公开(公告)日:2012-01-26

    申请号:US13187267

    申请日:2011-07-20

    IPC分类号: H01K1/32 H01J9/20

    CPC分类号: H01K1/325 H01K3/005

    摘要: A lamp burner having a quartz body comprising a light emitting chamber intermediate a pair of end portions. A filament may be positioned within the light emitting chamber and a multilayer optical coating provided on at least a portion of the body. The coating may comprise a plurality of layers of a first material comprising silica, a plurality of layers of a second material comprising rutile titanium dioxide, and a plurality of layers of a third material having an index of refraction intermediate the indices of refraction of the layers of first material and the layers of second material.

    摘要翻译: 一种具有石英体的灯燃烧器,其包括位于一对端部之间的发光室。 灯丝可以定位在发光室内,并且设置在主体的至少一部分上的多层光学涂层。 涂层可以包括多层第一材料,其包括二氧化硅,多层第二材料层,包括金红石型二氧化钛,以及多层第三材料,其折射率在层之间的折射率中间 的第一材料和第二材料的层。

    Apparatus and process for high rate deposition of rutile titanium dioxide
    5.
    发明申请
    Apparatus and process for high rate deposition of rutile titanium dioxide 审中-公开
    金红石二氧化钛高速沉积的装置和工艺

    公开(公告)号:US20050092599A1

    公开(公告)日:2005-05-05

    申请号:US10959504

    申请日:2004-10-07

    CPC分类号: C23C14/083 C23C14/0078

    摘要: An apparatus and process for forming thin films of titanium dioxide in the rutile phase by reactive sputter deposition. In one aspect, a sputtering target and auxiliary plasma generator are positioned in a coating station in a sputtering chamber so that the titanium deposited on a substrate passing through the coating chamber is oxidized by exposure to the auxiliary plasma generated by the plasma generator commingled with the sputter plasma. The plasma may include monatomic oxygen to assist in the formation of rutile titanium dioxide. The target, or a pair of targets may also be operated from pulsed d.c. or a.c. power supplies.

    摘要翻译: 用于通过反应溅射沉积在金红石相中形成二氧化钛薄膜的装置和方法。 在一个方面,溅射靶和辅助等离子体发生器定位在溅射室中的涂覆站中,使得沉积在穿过涂覆室的基板上的钛被暴露于由等离子体发生器产生的辅助等离子体产生氧化 溅射等离子体。 等离子体可以包括单原子氧以帮助形成金红石型二氧化钛。 目标或一对目标也可以从脉冲直流运行。 或a.c. 电源。