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1.发明授权
公开(公告)号：US5433988A
公开(公告)日：1995-07-18
申请号：US323592
申请日：1994-10-17
CPC分类号： B32B15/08 , B82Y10/00 , G02B5/0833 , G02B5/0891 , G02B5/26 , G21K1/062 , G21K2201/061 , Y10S428/913 , Y10T428/24355 , Y10T428/30
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5182763A
公开(公告)日：1993-01-26
申请号：US888275
申请日：1992-05-26
申请人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
发明人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
CPC分类号： G21K1/062 , B82Y10/00 , G02B26/10 , G02B5/0891 , G03F7/70058 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.
摘要翻译： 公开了一种用于反射接收的辐射束以产生反射光束的反射镜，具有这种反射镜的反射装置，具有这种反射镜的扫描系统和具有这种反射镜的曝光装置。 辐射束以反射镜上的位置随着入射角被输入到反射镜，其中反射镜具有有效地相对于反射光束的预定波长提供增加的相对反射率的多层膜，以及 其中所述多层膜的层具有随位置而变化的厚度，以便基本上避免所述反射光束的波长相对于所述入射角的偏移。
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3.发明授权
公开(公告)号：US5310603A
公开(公告)日：1994-05-10
申请号：US75350
申请日：1993-06-14
CPC分类号： G21K1/062 , B32B15/08 , B82Y10/00 , G02B5/0891 , G02B5/26 , G21K2201/061 , Y10S428/913
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5204887A
公开(公告)日：1993-04-20
申请号：US945578
申请日：1992-09-16
CPC分类号： B82Y10/00 , G21K1/062 , G21K7/00 , G21K2201/061 , G21K2201/064
摘要： A method and device for imaging an object illuminated by an X-ray beam, through a zone plate, is disclosed. A concave mirror with a multilayered film is disposed on a path of the X-ray beam to reflect the same and collect the same onto the object.
摘要翻译： 公开了一种用于通过区域板对由X射线束照射的物体成像的方法和装置。 具有多层膜的凹面镜设置在X射线束的路径上以反射它，并将其收集到物体上。
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公开(公告)号：US5052033A
公开(公告)日：1991-09-24
申请号：US633181
申请日：1990-12-28
申请人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
发明人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译： 公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。 考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。 在反射表面上形成非反射部分以提供期望的图案。 或者，包括多层结构的图案可以形成在非反射基板上。 本发明的掩模确保高对比度的图案印刷。
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6.发明授权Mask structure for x-ray exposure and x-ray exposure device and method using it 失效X射线曝光和X射线曝光装置的掩模结构及其使用方法
公开(公告)号：US5333167A
公开(公告)日：1994-07-26
申请号：US984527
申请日：1992-12-02
申请人： Takashi Iizuka , Yasuaki Fukuda
发明人： Takashi Iizuka , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F9/7053 , G21K1/06
摘要： A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.
摘要翻译： 用于X射线曝光的掩模结构包括保持框架，支撑框架，掩模支撑件和吸收体图案。 掩模结构具有用于检测掩模结构从其稳定状态的状态变化的功能。
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7.发明授权
公开(公告)号：US5145649A
公开(公告)日：1992-09-08
申请号：US592302
申请日：1990-10-02
CPC分类号： G03F7/70058 , B08B7/0035 , G02B27/0006 , G03F7/702 , G03F7/70841 , G03F7/70925
摘要： A method and apparatus for removing unclear matter on an optical element used with a radiation beam is disclosed. A filter is used to introduce light of a desired wavelength into a chamber in which the optical element is accommodated; a gas supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element; and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.
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公开(公告)号：US5159621A
公开(公告)日：1992-10-27
申请号：US739259
申请日：1991-08-01
申请人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
发明人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
CPC分类号： G21K5/04 , H01J2235/18
摘要： An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, includes an X-ray transmitting film, and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film. The gasket material has a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges in a gas-tight manner.
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公开(公告)号：US5123036A
公开(公告)日：1992-06-16
申请号：US735691
申请日：1991-07-22
CPC分类号： G03F7/702 , G21K1/06 , G21K2201/064
摘要： An X-ray exposure apparatus for exposing a resist on a substrate to a pattern of an original includes a radiation source for providing X-rays; and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral potion the reflection surface has a curvature of a radius larger than that at the top of the reflection surface.
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公开(公告)号：US5606586A
公开(公告)日：1997-02-25
申请号：US678784
申请日：1996-07-11
CPC分类号： G03F7/70075 , G03F7/2039 , G03F7/702 , B29C2035/0844
摘要： An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.
摘要翻译： 使用来自同步加速器辐射源的X射线的曝光方法包括确定曝光区域中的X射线强度分布与曝光量分布之间的关系; 以及通过使用关系控制曝光区域中的各个位置的剂量量来进行曝光操作，其中通过改变用于控制曝光操作的活动快门的驱动轮廓来控制剂量，并且其中的关系为 作为曝光区域中的位置信息的函数的X射线强度与曝光量之间的比例系数。
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