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1.发明授权
公开(公告)号：US5310603A
公开(公告)日：1994-05-10
申请号：US75350
申请日：1993-06-14
CPC分类号： G21K1/062 , B32B15/08 , B82Y10/00 , G02B5/0891 , G02B5/26 , G21K2201/061 , Y10S428/913
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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2.发明授权
公开(公告)号：US5433988A
公开(公告)日：1995-07-18
申请号：US323592
申请日：1994-10-17
CPC分类号： B32B15/08 , B82Y10/00 , G02B5/0833 , G02B5/0891 , G02B5/26 , G21K1/062 , G21K2201/061 , Y10S428/913 , Y10T428/24355 , Y10T428/30
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5182763A
公开(公告)日：1993-01-26
申请号：US888275
申请日：1992-05-26
申请人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
发明人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
CPC分类号： G21K1/062 , B82Y10/00 , G02B26/10 , G02B5/0891 , G03F7/70058 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.
摘要翻译： 公开了一种用于反射接收的辐射束以产生反射光束的反射镜，具有这种反射镜的反射装置，具有这种反射镜的扫描系统和具有这种反射镜的曝光装置。 辐射束以反射镜上的位置随着入射角被输入到反射镜，其中反射镜具有有效地相对于反射光束的预定波长提供增加的相对反射率的多层膜，以及 其中所述多层膜的层具有随位置而变化的厚度，以便基本上避免所述反射光束的波长相对于所述入射角的偏移。
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公开(公告)号：US5204887A
公开(公告)日：1993-04-20
申请号：US945578
申请日：1992-09-16
CPC分类号： B82Y10/00 , G21K1/062 , G21K7/00 , G21K2201/061 , G21K2201/064
摘要： A method and device for imaging an object illuminated by an X-ray beam, through a zone plate, is disclosed. A concave mirror with a multilayered film is disposed on a path of the X-ray beam to reflect the same and collect the same onto the object.
摘要翻译： 公开了一种用于通过区域板对由X射线束照射的物体成像的方法和装置。 具有多层膜的凹面镜设置在X射线束的路径上以反射它，并将其收集到物体上。
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公开(公告)号：US5052033A
公开(公告)日：1991-09-24
申请号：US633181
申请日：1990-12-28
申请人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
发明人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译： 公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。 考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。 在反射表面上形成非反射部分以提供期望的图案。 或者，包括多层结构的图案可以形成在非反射基板上。 本发明的掩模确保高对比度的图案印刷。
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6.发明授权
公开(公告)号：US5145649A
公开(公告)日：1992-09-08
申请号：US592302
申请日：1990-10-02
CPC分类号： G03F7/70058 , B08B7/0035 , G02B27/0006 , G03F7/702 , G03F7/70841 , G03F7/70925
摘要： A method and apparatus for removing unclear matter on an optical element used with a radiation beam is disclosed. A filter is used to introduce light of a desired wavelength into a chamber in which the optical element is accommodated; a gas supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element; and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.
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7.发明授权Mask structure for x-ray exposure and x-ray exposure device and method using it 失效X射线曝光和X射线曝光装置的掩模结构及其使用方法
公开(公告)号：US5333167A
公开(公告)日：1994-07-26
申请号：US984527
申请日：1992-12-02
申请人： Takashi Iizuka , Yasuaki Fukuda
发明人： Takashi Iizuka , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F9/7053 , G21K1/06
摘要： A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.
摘要翻译： 用于X射线曝光的掩模结构包括保持框架，支撑框架，掩模支撑件和吸收体图案。 掩模结构具有用于检测掩模结构从其稳定状态的状态变化的功能。
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公开(公告)号：US09120248B2
公开(公告)日：2015-09-01
申请号：US11814580
申请日：2006-01-25
IPC分类号： B32B3/26 , B29C59/02 , B32B27/06 , B29C33/42 , B29C33/40 , B29C37/00 , B44C3/02 , B44C5/04 , B44F5/00 , B29L31/00 , B32B38/00 , B32B38/14
CPC分类号： B29C33/424 , B29C33/40 , B29C37/0053 , B29C59/022 , B29C2059/023 , B29L2031/722 , B32B38/0008 , B32B38/14 , B32B2310/14 , B32B2317/125 , B44C3/025 , B44C5/04 , B44F5/00 , Y10T428/24521 , Y10T428/24612
摘要： There are provided a shaping sheet provided on a surface thereof with a fine irregular shape which is capable of forming a fine pattern with a high-grade feel on a material to be shaped, and is excellent in releasability from the material, as well as a decorative plate shaped by the shaping sheet. The shaping sheet of the present invention includes a substrate, at least an ink layer partially formed on the substrate and a surface shaped layer which is present on and contacted with the ink layer so as to cover a whole surface including both a region where the ink layer is formed and a region where no ink layer is formed, wherein the surface shaped layer is formed by crosslinking and curing an ionizing radiation-curable resin composition, and has a convex shape on a surface thereof which is located in a portion just above the ink layer and in the vicinity of the portion. The shaping sheet is provided on a surface thereof with a fine irregular shape, which is capable of forming a fine pattern with a high-grade feel on a material to be shaped, and excellent in releasability from the material.
摘要翻译： 在其表面上设置有能够在被成形材料上形成具有高等级感觉的精细图案的精细不规则形状的成形片，并且与材料的脱模性优异， 装饰板由成型板成形。 本发明的成型片包括：基材，至少部分地形成在基材上的油墨层和存在于油墨层上并与油墨层接触的表面形状层，以覆盖包括墨水的区域的整个表面 形成层和不形成油墨层的区域，其中表面形成层通过交联固化电离辐射固化树脂组合物而形成，并且在其表面上具有凸形，所述表面位于刚好位于 油墨层和该部分附近。 成形片在其表面上设置有细小的不规则形状，能够在待成形材料上形成高级感觉的精细图案，并且具有优异的脱模性。
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公开(公告)号：US08372918B2
公开(公告)日：2013-02-12
申请号：US13147041
申请日：2010-01-29
申请人： Takashi Iizuka
发明人： Takashi Iizuka
CPC分类号： C08C19/02 , C08F220/26 , C08F220/44 , C08F222/16 , C08K5/17 , C08L13/00 , C08L15/005
摘要： A nitrile-group-containing highly saturated copolymer rubber comprising α,β-ethylenically unsaturated nitrile monomer units (a) in 5 to 60 wt %, α,β-ethylenically unsaturated dicarboxylic acid mono ester monomer units (b) in 0.1 to 20 wt %, (meth)acrylic acid alkoxyalkyl ester monomer units which have alkoxyalkyl groups with 2 to 8 carbon atoms (c) in 11 to 50 wt %, and conjugated diene monomer units (d) in 20 to 83.9 wt %, where at least part of the conjugated diene monomer units (d) are hydrogenated.
摘要翻译： 含有5〜60重量％的α，b-烯属不饱和腈单体单元（a）的含腈基高饱和共聚物橡胶，α，b-烯键式不饱和二羧酸单酯单体单元（b） 20重量％，碳原子数2〜8的烷氧基烷基（c）为11〜50重量％的（甲基）丙烯酸烷氧基烷基酯单体单元，共轭二烯单体单元（d）为20〜83.9重量％ 至少部分共轭二烯单体单元（d）被氢化。
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公开(公告)号：US20110301300A1
公开(公告)日：2011-12-08
申请号：US13147041
申请日：2010-01-29
申请人： Takashi Iizuka
发明人： Takashi Iizuka
IPC分类号： C08F220/42 , C08F8/32 , C08F220/28
CPC分类号： C08C19/02 , C08F220/26 , C08F220/44 , C08F222/16 , C08K5/17 , C08L13/00 , C08L15/005
摘要： A nitrile-group-containing highly saturated copolymer rubber comprising α,β-ethylenically unsaturated nitrile monomer units (a) in 5 to 60 wt %, α,β-ethylenically unsaturated dicarboxylic acid mono ester monomer units (b) in 0.1 to 20 wt %, (meth)acrylic acid alkoxyalkyl ester monomer units which have alkoxyalkyl groups with 2 to 8 carbon atoms (c) in 11 to 50 wt %, and conjugated diene monomer units (d) in 20 to 83.9 wt %, where at least part of the conjugated diene monomer units (d) are hydrogenated.
摘要翻译： 含有5〜60重量％的α，b-烯属不饱和腈单体单元（a）的含腈基高饱和共聚物橡胶，α，b-烯键式不饱和二羧酸单酯单体单元（b） 20重量％，碳原子数2〜8的烷氧基烷基（c）为11〜50重量％的（甲基）丙烯酸烷氧基烷基酯单体单元，共轭二烯单体单元（d）为20〜83.9重量％ 至少部分共轭二烯单体单元（d）被氢化。
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