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公开(公告)号：US07608805B2
公开(公告)日：2009-10-27
申请号：US11036417
申请日：2005-01-14
IPC分类号： H05B1/02
CPC分类号： B23K3/0323 , B23K3/033 , G05D23/1917 , G05D23/2401
摘要： A control system and method of controlling a battery powered heating device such as a soldering or desoldering tool that includes a control circuit to control the delivery of power to a cartridge heating tip and to cycle the power to the cartridge heating tip during times of no use so as to minimize the amount of power expended to maintain the device in a ready or usable state.
摘要翻译： 一种控制系统和控制电池供电加热装置的方法，例如焊接或脱焊工具，其包括控制电路，以控制向盒加热尖端传递电力，并且在不使用的时间期间将电力循环到盒加热尖端 以便最小化维持设备处于就绪或可用状态的功率消耗。
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公开(公告)号：US20060157466A1
公开(公告)日：2006-07-20
申请号：US11036417
申请日：2005-01-14
CPC分类号： B23K3/0323 , B23K3/033 , G05D23/1917 , G05D23/2401
摘要： A control system and method of controlling a battery powered heating device such as a soldering or desoldering tool that includes a control circuit to control the delivery of power to a cartridge heating tip and to cycle the power to the cartridge heating tip during times of no use so as to minimize the amount of power expended to maintain the device in a ready or usable state.
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3.发明授权公开(公告)号：US09034661B2
公开(公告)日：2015-05-19
申请号：US12709020
申请日：2010-02-19
IPC分类号： G01N33/544 , G01N33/543 , G01N33/53 , C08L83/04 , C08L83/06
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译： 公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面 电影。 可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。
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公开(公告)号：US08129100B2
公开(公告)日：2012-03-06
申请号：US12418090
申请日：2009-04-03
申请人： Katsuya Takemura , Jun Hatakeyama , Kazumi Noda , Mutsuo Nakashima , Masaki Ohashi , Toshinobu Ishihara
发明人： Katsuya Takemura , Jun Hatakeyama , Kazumi Noda , Mutsuo Nakashima , Masaki Ohashi , Toshinobu Ishihara
CPC分类号： G03F7/0035 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/40
摘要： Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a positive resist pattern, treating the positive resist pattern to be alkali soluble and solvent resistant, coating a negative resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a negative resist pattern. The last development step includes the reversal transfer step of dissolving away the positive resist pattern which has been converted to be soluble in developer.
摘要翻译： 通过涂覆化学放大的正性抗蚀剂组合物形成双重图案，所述正性抗蚀剂组合物包含含酸不稳定基团的树脂和光致酸发生剂和预烘烤以在可加工的基材上形成抗蚀剂膜，将抗蚀剂膜暴露于高能量辐射，PEB和显影 用碱性显影剂形成正的抗蚀剂图案，将正性抗蚀剂图案处理为碱溶性和耐溶剂性，涂覆负性抗蚀剂组合物和预烘烤以形成反转膜，并将反转膜暴露于高能辐射PEB， 并用碱性显影剂显影以形成负的抗蚀剂图案。 最后的显影步骤包括将已被转化为可溶于显影剂的正性抗蚀图案溶解的反转移步骤。
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公开(公告)号：US20110123935A1
公开(公告)日：2011-05-26
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译： 提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。 也就是说，制造中空结构体的方法，在基材的中空结构体的制造方法中堆叠结构材料的制造方法，该方法包括在基板上形成结构材料层的工序， 在结构材料层上形成图案，通过用水溶性或碱溶性聚合物之间掩埋图案形成牺牲材料层作为待掩埋在图案之间的牺牲材料的步骤，进一步层压 结构材料层并在层压的结构材料层上形成图案，并且完成所有层压之后最后去除牺牲材料的步骤。
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公开(公告)号：US07622228B2
公开(公告)日：2009-11-24
申请号：US11613780
申请日：2006-12-20
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译： 半色调相移掩模板在透明基板上具有移相膜。 移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性 耐化学品，特别是碱性化学品。
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公开(公告)号：US07598004B2
公开(公告)日：2009-10-06
申请号：US11093297
申请日：2005-03-30
申请人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
CPC分类号： G03F1/32 , C23C14/06 , C23C14/3414 , C23C14/3464
摘要： For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
摘要翻译： 为了制造包括透明基板和具有受控相位和透射率的一层或多层的半透明膜的半色调相移掩模坯料，同时至少一层包括Si，Mo和Zr的半透明膜， 包含Zr和Mo的摩尔比在0.05和5之间的至少Zr和Mo是有用的。
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公开(公告)号：USD550731S1
公开(公告)日：2007-09-11
申请号：US29272075
申请日：2007-01-31
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公开(公告)号：US06919161B2
公开(公告)日：2005-07-19
申请号：US10611261
申请日：2003-07-02
IPC分类号： C08F230/08 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C08F230/08 , G03F7/0045 , G03F7/0392 , G03F7/0758
摘要： Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R1 is a single bond or alkylene, R2 is hydrogen or alkyl, R3, R4 and R5 are alkyl, haloalkyl, aryl or silicon-containing group, R6 is hydrogen, methyl, cyano or —C(═O)OR8 wherein R8 is hydrogen, alkyl or acid labile group, R7 is alkyl, —NR9R10 or —OR11 wherein R9, R10 and R11 are hydrogen or alkyl, a and b are positive numbers satisfying 0
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公开(公告)号：US06818148B1
公开(公告)日：2004-11-16
申请号：US09401490
申请日：1999-09-22
申请人： Satoshi Watanabe , Toyohisa Sakurada , Yoshitaka Yanagi , Shigehiro Nagura , Toshinobu Ishihara
发明人： Satoshi Watanabe , Toyohisa Sakurada , Yoshitaka Yanagi , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C09K1300
CPC分类号： G03F7/0048
摘要： A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.
摘要翻译： 提供了一种抗蚀剂组合物，其包括含氟化学表面活性剂，其功能是随着含氟表面活性剂的量的增加，抗蚀剂组合物的涂层与水或碱性显影剂水溶液的接触角降低。 抗蚀剂组合物形成具有厚度均匀性，无缺陷的涂层，并且当涂覆在基材上时可用基础显影剂水溶液润湿，并且具有良好的储存稳定性，因为在溶液形式储存期间颗粒不增加。
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