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1.
公开(公告)号:US10205091B2
公开(公告)日:2019-02-12
申请号:US15424515
申请日:2017-02-03
Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
Inventor: Jiamin Chen , Yuya Sakuraba , Jun Liu , Hiroaki Sukegawa , Kazuhiro Hono
Abstract: To provide a key monocrystalline magnetoresistance element necessary for accomplishing mass production and cost reduction for applying a monocrystalline giant magnetoresistance element using a Heusler alloy to practical devices. A monocrystalline magnetoresistance element of the present invention includes a silicon substrate 11, a base layer 12 having a B2 structure laminated on the silicon substrate 11, a first non-magnetic layer 13 laminated on the base layer 12 having a B2 structure, and a giant magnetoresistance effect layer 17 having at least one laminate layer including a lower ferromagnetic layer 14, an upper ferromagnetic layer 16, and a second non-magnetic layer 15 disposed between the lower ferromagnetic layer 14 and the upper ferromagnetic layer 16.
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2.
公开(公告)号:US10749105B2
公开(公告)日:2020-08-18
申请号:US15939903
申请日:2018-03-29
Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
Inventor: Jiamin Chen , Yuya Sakuraba , Jun Liu , Hiroaki Sukegawa , Kazuhiro Hono
Abstract: To provide a key monocrystalline magnetoresistance element necessary for accomplishing mass production and cost reduction for applying a monocrystalline giant magnetoresistance element using a Heusler alloy to practical devices. A monocrystalline magnetoresistance element of the present invention includes a silicon substrate 11, a base layer 12 having a B2 structure laminated on the silicon substrate 11, a first non-magnetic layer 13 laminated on the base layer 12 having a B2 structure, and a giant magnetoresistance effect layer 17 having at least one laminate layer including a lower ferromagnetic layer 14, an upper ferromagnetic layer 16, and a second non-magnetic layer 15 disposed between the lower ferromagnetic layer 14 and the upper ferromagnetic layer 16.
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