公开(公告)号：US20130069449A1

公开(公告)日：2013-03-21

申请号：US13621669

申请日：2012-09-17

Applicant: Nikon Corporation

Inventor： Michel Pharand ,  Michael B. Binnard ,  Shigeru Morimoto ,  Chetan Mahadeswaraswamy ,  Rick K. Ingram ,  Christopher Edward Hatch ,  Alex Ka Tim Poon ,  Gaurav Keswani ,  Derek Coon ,  Yeong-Jun Choi

IPC: H02K15/06 ,  H02K41/02

CPC classification number: H02K41/031 ,  H02K3/24 ,  H02K9/19 ,  H02K9/22 ,  H02K2201/18

Abstract: Coil arrays are disclosed for a planar or linear motor. An exemplary coil array includes multiple coil modules. Each coil module includes at least one coil set, respective electrical circuitry to and from the coil set, at least one respective hydraulic cooling device for the coil set, and respective hydraulic conduitry to and from the cooling device. The coil modules are interchangeably mountable relative to each other in the array such that mounting the coil module to the array produces accompanying hydraulic and electrical connections between the array and coil module, and removing the coil module from the array severs the connections.

Abstract translation: 公开了用于平面或线性电动机的线圈阵列。 示例性线圈阵列包括多个线圈模块。 每个线圈组件包括至少一个线圈组，到线圈组和来自线圈组的相应电路，用于线圈组的至少一个相应的液压冷却装置，以及往返于冷却装置的相应的液压导管。 线圈模块相对于阵列中的彼此可互换地安装，使得将线圈模块安装到阵列上产生阵列和线圈模块之间的伴随的液压和电气连接，并且从阵列中去除线圈模块以切断连接。

公开(公告)号：US20150075751A1

公开(公告)日：2015-03-19

申请号：US14487341

申请日：2014-09-16

Applicant: Nikon Corporation

Inventor： Michel Pharand ,  Andrew Tomko ,  Derek Coon ,  Yoichi Arai ,  Joe Rossi

IPC: F28D1/00

CPC classification number: G03F7/70875 ,  F28D2021/0019 ,  F28F9/0275 ,  G03F7/70758 ,  G03F7/70766 ,  H01L21/67109

Abstract: A reaction assembly (20) for supporting a mover (18) includes a countermass assembly (26) and a fluid distribution network (28). The fluid distribution network (28) allows for circulating a fluid (30) to provide cooling for the portion of the mover (18). The fluid distribution network (28) is positioned substantially adjacent to the countermass assembly (26), and the fluid distribution network (28) being substantially thermally decoupled from the structure of the countermass assembly (26) to inhibit thermal deformation of the countermass assembly (26).

Abstract translation: 用于支撑移动器（18）的反作用组件（20）包括反作用组件（26）和流体分配网络（28）。 流体分配网络（28）允许循环流体（30）以为移动器（18）的该部分提供冷却。 流体分配网络（28）基本上邻近反质量组件（26）定位，并且流体分配网络（28）与反质量组件（26）的结构基本上热分离，以阻止反质量组件的热变形 26）。

公开(公告)号：US09329492B2

公开(公告)日：2016-05-03

申请号：US13929199

申请日：2013-06-27

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon

IPC: G03B27/52 ,  G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes an aperture through which a patterned image is projected, an outlet, a first chamber into which the immersion liquid is recovered through the outlet, and a second chamber into which the immersion liquid is recovered through a porous member from the first chamber. The porous member has a first surface contacting the first chamber and a second surface contacting the second chamber. A vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.

Abstract translation: 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括一个孔，图案化图像通过该孔，出口，浸入液体通过出口回收到其中的第一室，以及第二室，浸没液通过多孔构件从第一室回收到第二室中。 多孔构件具有接触第一室的第一表面和接触第二室的第二表面。 第一表面的第一部分的垂直位置不同于第一表面的第二部分的垂直位置。

公开(公告)号：US09217933B2

公开(公告)日：2015-12-22

申请号：US14262058

申请日：2014-04-25

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Daishi Tanaka

IPC: G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.

Abstract translation: 光刻投影装置包括具有基板台的载台组件，基板被支撑并且通过浸没液体从投影光学组件的最终光学元件的曝光光束暴露在基板台上。 限制构件环绕曝光光束的路径的一部分并且具有曝光光束投射的孔。 可动构件可在限制构件与衬底，衬底台或两者之间的空间中移动，使得空间的第一部分位于可动构件的第一表面和限制构件之间，第二部分 的空间位于可移动部件的第二表面和基板，基板台之间或两者之间。

公开(公告)号：US09176394B2

公开(公告)日：2015-11-03

申请号：US14082739

申请日：2013-11-18

Applicant: NIKON CORPORATION

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Derek Coon ,  Gaurav Keswani ,  Daishi Tanaka

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: An immersion lithography apparatus that includes a substrate holder on which a substrate is held, a projection system having a final optical element and that projects an exposure beam onto the substrate through an immersion liquid, and a liquid confinement member having an aperture through which the exposure beam is projected, a lower surface including a non-fluid removal area surrounding the aperture, and a liquid recovery outlet from which the immersion liquid is recovered, also includes a movable member. The movable member is movable relative to the liquid confinement member in a substantially horizontal direction, and has an opening through which the exposure beam is projected. The movable member has upper and lower surfaces that surround the opening, and is movable while a portion of the upper surface faces the non-fluid removal area in the lower surface of the liquid confinement member.

Abstract translation: 一种浸没式光刻设备，其包括其上保持有基板的基板保持器，具有最终光学元件的投影系统，并且通过浸没液体将曝光光束投影到所述基板上;以及液体限制部件， 射束，包括围绕孔的非流体去除区域的下表面和回收浸液的液体回收出口也包括可移动构件。 可移动部件在大致水平的方向上相对于液体限制部件是可移动的，并且具有暴露光束投射的开口。 可移动部件具有围绕开口的上表面和下表面，并且在上表面的一部分面向液体限制部件的下表面中的非流体去除区域时可移动。

公开(公告)号：US08743343B2

公开(公告)日：2014-06-03

申请号：US13754111

申请日：2013-01-30

Applicant: Nikon Corporation

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Gaurav Keswani ,  Derek Coon ,  Daishi Tanaka

IPC: G03B27/32 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.

Abstract translation: 平版印刷投影设备包括具有最终光学元件的投影光学组件，舞台组件，其包括衬底台，支撑衬底，由衬底台支撑的衬底用来自突起的最终光学元件的曝光光束曝光 通过浸没液体的光学组件，围绕曝光束的路径的一部分的限制构件，以及可移动构件，其可在限制构件和衬底，衬底台或两者之间的空间中移动，空间为 由可动构件分成限制构件和可动构件之间的第一部分和可移动构件与衬底之间的第二部分，衬底台或两者。 可移动部件具有回收出口，第二部分中的浸没液体从该回收口移除。