公开(公告)号：US20180312725A1

公开(公告)日：2018-11-01

申请号：US15769934

申请日：2016-10-21

Applicant: NITTA HAAS INCORPORATED

Inventor： Noriaki SUGITA ,  Shuhei MATSUDA ,  Takayuki MATSUSHITA ,  Mika TAZURU

IPC: C09G1/02 ,  H01L21/306

CPC classification number: C09G1/02 ,  B24B37/00 ,  B24B37/044 ,  H01L21/02024 ,  H01L21/304 ,  H01L21/30625

Abstract: A polishing composition capable of suppressing surface defects and reducing haze is provided. The polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; a polyalcohol; and an alkali compound. Preferably, the polishing composition further includes a non-ionic surfactant.

公开(公告)号：US20180305580A1

公开(公告)日：2018-10-25

申请号：US15769889

申请日：2016-10-20

Applicant: NITTA HAAS INCORPORATED

Inventor： Noriaki SUGITA ,  Mika TAZURU ,  Takayuki MATSUSHITA ,  Shuhei MATSUDA

IPC: C09G1/02 ,  C09G1/16

Abstract: A polishing composition that can suppress surface defects and reduce haze is provided. A polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; and an alkali compound, where an average particle size of particles in the polishing composition measured by dynamic light scattering is not more than 55 nm. Preferably, the polishing composition further includes a non-ionic surfactant. Preferably, the polishing composition further includes a polyalcohol.