-
公开(公告)号:US09632435B2
公开(公告)日:2017-04-25
申请号:US13046211
申请日:2011-03-11
申请人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
CPC分类号: G03F7/70875 , G03F7/7085
摘要: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
-
公开(公告)号:US10551752B2
公开(公告)日:2020-02-04
申请号:US13046283
申请日:2011-03-11
申请人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号: G03F7/20
摘要: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
-
公开(公告)号:US20110222033A1
公开(公告)日:2011-09-15
申请号:US13046283
申请日:2011-03-11
申请人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人: Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号: G03B27/52
CPC分类号: G03F7/70875 , G03F7/7085
摘要: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
-
-