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公开(公告)号：US09632435B2
公开(公告)日：2017-04-25
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US10551752B2
公开(公告)日：2020-02-04
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03F7/20
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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3.发明申请公开(公告)号：US20180284627A1
公开(公告)日：2018-10-04
申请号：US15932215
申请日：2018-02-16
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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4.发明授权公开(公告)号：US09897928B2
公开(公告)日：2018-02-20
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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5.发明申请公开(公告)号：US20130045447A1
公开(公告)日：2013-02-21
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。
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公开(公告)号：US20100302518A1
公开(公告)日：2010-12-02
申请号：US12768902
申请日：2010-04-28
申请人： Jan VAN EIJK , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Johannes Petrus Martinus Bernardus VERMEULEN , Koen Jacobus Johannes Maria ZAAL , Marinus Jan REMIE
发明人： Jan VAN EIJK , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Johannes Petrus Martinus Bernardus VERMEULEN , Koen Jacobus Johannes Maria ZAAL , Marinus Jan REMIE
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70758 , G03F7/70858
摘要： The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.
摘要翻译： 本发明涉及一种布置成将图案从图案形成装置转移到基板上的光刻设备，包括用于冷却光刻设备的一部分的冷却系统，该冷却系统包括液滴喷射器以形成液滴并使液滴朝向冷却 光刻设备的一部分的表面，以通过蒸发液滴来冷却该部件。
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公开(公告)号：US20110222033A1
公开(公告)日：2011-09-15
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20110222032A1
公开(公告)日：2011-09-15
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
发明人： Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
摘要翻译： 公开了一种光刻设备，其包括被配置为在基板支撑区域上支撑基板的基板台和与基板支撑区域相邻的表面上的加热器和/或温度传感器。
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