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公开(公告)号：US20130271754A1
公开(公告)日：2013-10-17
申请号：US13993814
申请日：2011-11-09
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/95623
摘要： This invention implements reduction in the amount of background-scattered light from a semiconductor wafer surface and highly sensitive inspection, without increasing the number of detectors. A surface inspection apparatus that detects defects on the surface of an object (semiconductor wafer surface) to be inspected, by irradiating the surface of the object with a beam of light such as laser light and detecting the light reflected or scattered from the surface; wherein a widely apertured lens with an optical Fourier transform function is disposed between the object to be inspected and a detector, a filter variable in position as well in aperture diameter is provided on a Fourier transform plane, and background-scattered light from the semiconductor wafer surface is effectively blocked, whereby only a signal from a defect such as a foreign substance is detected.
摘要翻译： 本发明实现了半导体晶片表面的背景散射光的量的减少和高灵敏度的检查，而不增加检测器的数量。 一种表面检查装置，其通过用诸如激光的光束照射物体的表面来检测从表面反射或散射的光来检测待检查的物体（半导体晶片表面）的表面上的缺陷; 其中具有光学傅里叶变换功能的广泛有孔的透镜设置在待检查对象与检测器之间，在傅里叶变换平面上设置了孔径直径可变的滤光器以及来自半导体晶片的背景散射光 表面被有效地阻挡，从而仅检测到诸如异物的缺陷的信号。
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公开(公告)号：US08902417B2
公开(公告)日：2014-12-02
申请号：US13993814
申请日：2011-11-09
IPC分类号： G01N21/00 , G01N21/956 , G01N21/95
CPC分类号： G01N21/9501 , G01N21/95623
摘要： This invention implements reduction in the amount of background-scattered light from a semiconductor wafer surface and highly sensitive inspection, without increasing the number of detectors. A surface inspection apparatus that detects defects on the surface of an object (semiconductor wafer surface) to be inspected, by irradiating the surface of the object with a beam of light such as laser light and detecting the light reflected or scattered from the surface; wherein a widely apertured lens with an optical Fourier transform function is disposed between the object to be inspected and a detector, a filter variable in position as well in aperture diameter is provided on a Fourier transform plane, and background-scattered light from the semiconductor wafer surface is effectively blocked, whereby only a signal from a defect such as a foreign substance is detected.
摘要翻译： 本发明实现了半导体晶片表面的背景散射光的量的减少和高灵敏度的检查，而不增加检测器的数量。 一种表面检查装置，其通过用诸如激光的光束照射物体的表面来检测从表面反射或散射的光来检测待检查的物体（半导体晶片表面）的表面上的缺陷; 其中具有光学傅里叶变换功能的广泛有孔的透镜设置在待检查对象与检测器之间，在傅里叶变换平面上设置了孔径直径可变的滤光器以及来自半导体晶片的背景散射光 表面被有效地阻挡，从而仅检测到诸如异物的缺陷的信号。
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公开(公告)号：US20140198321A1
公开(公告)日：2014-07-17
申请号：US14240669
申请日：2012-07-27
申请人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
发明人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01N21/4738 , G01N21/55 , G01N21/9501 , G01N2201/12
摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
摘要翻译： 在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。 特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。 本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。
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公开(公告)号：US20110032515A1
公开(公告)日：2011-02-10
申请号：US12907895
申请日：2010-10-19
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
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公开(公告)号：US20120262709A1
公开(公告)日：2012-10-18
申请号：US13529363
申请日：2012-06-21
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。
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公开(公告)号：US20110310382A1
公开(公告)日：2011-12-22
申请号：US13221935
申请日：2011-08-31
申请人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio UTO , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。
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公开(公告)号：US20100088042A1
公开(公告)日：2010-04-08
申请号：US12630307
申请日：2009-12-03
申请人： Minori NOGUCHI , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori NOGUCHI , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuyai Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the specimen, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks diffraction light resulting from patterns formed on the specimen, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the specimen, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
摘要翻译： 用于检测试样缺陷的装置和方法包括：照射光学单元，其将聚焦在激光束上的激光倾斜投射在试样的表面上;照射单元，其安装试样并可移动的检测光学单元， 图像传感器，由从样本反射的光形成的光的图像，并且通过滤光器，该滤光器阻挡由形成在样本上的图案产生的衍射光;处理从检测光学单元的图像传感器输出的信号提取的信号处理器 样本的缺陷以及显示由信号处理器提取的缺陷的信息的显示单元。 过滤器可调。
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公开(公告)号：US07586594B2
公开(公告)日：2009-09-08
申请号：US11770217
申请日：2007-06-28
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.
摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。
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公开(公告)号：US06998630B2
公开(公告)日：2006-02-14
申请号：US10933977
申请日：2004-09-03
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/4738 , G01N21/8806 , G01N21/93 , G01N21/94 , G01N21/9501 , G01N2015/1486 , G01N2015/1493
摘要： Conventionally, a particle/defect inspection apparatus outputs a total number of detected particles/defects as the result of detection. For taking countermeasures to failures in manufacturing processes, the particles/defects detected by the inspection apparatus are analyzed. Since the inspection apparatus outputs a large number of detected particles/defects, an immense time is required for analyzing the detected particles/defects, resulting in a delay in taking countermeasures to a failure in the manufacturing processes. In the present invention, an apparatus for optically inspecting particles or defects relates a particle or defect size to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.
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公开(公告)号：US20060030060A1
公开(公告)日：2006-02-09
申请号：US11244080
申请日：2005-10-06
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus for detecting defects on a specimen including am illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.
摘要翻译： 一种用于检测试样上的缺陷的装置，包括：am照明光学单元，其将激光倾斜地突出到在一个方向上比沿着与所述一个方向横切的方向在一个方向上长的区域;安装所述样本的台单元 检测光学单元，其利用图像传感器检测在所述图像传感器上形成有从所述一个方向的两个方向和横向方向反射的光形成的光，并且在所述图像传感器上形成两个方向的反射光 当所述表移动时，信号处理器处理从所述检测光学单元的所述图像传感器输出的信号，以提取所述样本的缺陷。 一种显示由所述信号处理器提取的缺陷信息的显示单元。
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