公开(公告)号：US4842986A

公开(公告)日：1989-06-27

申请号：US889707

申请日：1986-07-28

申请人： Nobuaki Matsuda ,  Tadayoshi Kokubo ,  Toshiaki Aoai ,  Akira Umehara ,  Yoshimasa Aotani

发明人： Nobuaki Matsuda ,  Tadayoshi Kokubo ,  Toshiaki Aoai ,  Akira Umehara ,  Yoshimasa Aotani

IPC分类号： G03C7/10 ,  C08G77/46 ,  G03C1/72 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC分类号： G03C1/72 ,  G03F7/0758 ,  Y10T403/3926 ,  Y10T403/3933 ,  Y10T403/556 ,  Y10T403/60

摘要： A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

摘要翻译： 公开了一种正性抗蚀剂材料，其包含具有至少一个甲硅烷基醚基团且能够在远紫外线，X射线，电子束或离子束照射时直接解离Si-O-C键的化合物。 抗蚀剂材料对高能量辐射具有高灵敏度，优异的抗干蚀刻性，并且可以用碱性水溶液显影。

公开(公告)号：US5340688A

公开(公告)日：1994-08-23

申请号：US15578

申请日：1993-02-10

申请人： Yasumasa Kawabe ,  Toshiaki Aoai ,  Tadayoshi Kokubo

发明人： Yasumasa Kawabe ,  Toshiaki Aoai ,  Tadayoshi Kokubo

IPC分类号： G03F7/022 ,  H01L21/027 ,  G03F7/021 ,  G03F7/30

CPC分类号： G03F7/022

摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.

摘要翻译： 公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

公开(公告)号：US5707777A

公开(公告)日：1998-01-13

申请号：US466136

申请日：1995-06-06

申请人： Toshiaki Aoai ,  Tadayoshi Kokubo

发明人： Toshiaki Aoai ,  Tadayoshi Kokubo

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03F7/038

CPC分类号： G03F7/0755 ,  G03F7/0045 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/122

摘要： A positive-working light-sensitive composition which comprises: (a) 0.5 to 80% by weight of a compound which has at least one group capable of being decomposed by an acid and whose solubility in an alkaline developer is increased by an acid; (b) 0.01 to 20% by weight of a disulfone compound represented by the following formula (I); R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be the same or different and represent a substituted or unsubstituted alkyl, alkenyl or aryl group; and (c) 5 to 99.49% by weight of a resin insoluble in water and soluble in an alkaline water, wherein the compound of the component (a) has a molecular weight of not more than 2,000 and a boiling point of not less than 150.degree. C. and wherein a film of the composition having a thickness of 1 .mu.m has an optical density determined at 248 nm of not more than 1.4 before exposure to light and the optical density of the composition determined at 248 nm is reduced by exposure to light of 248 nm.

摘要翻译： 一种正性感光性组合物，其包含：（a）0.5〜80重量％的具有至少一个能够被酸分解并且在碱性显影剂中的溶解度由酸增加的化合物; （b）0.01〜20重量％的由下式（I）表示的二砜化合物; R1-SO2-SO2-R2（Ⅰ）其中R1和R2可以相同或不同，表示取代或未取代的烷基， 烯基或芳基; 和（c）5〜99.49重量％的不溶于水且可溶于碱性水的树脂，其中组分（a）的化合物的分子量不大于2,000，沸点不小于150 并且其中具有1μm厚度的组合物的膜在暴露于光之前在248nm处确定为不大于1.4的光密度，并且通过暴露于248nm下测定的组合物的光密度降低 248nm的光。

公开(公告)号：US5110709A

公开(公告)日：1992-05-05

申请号：US680733

申请日：1991-04-05

申请人： Toshiaki Aoai ,  Tadayoshi Kokubo

发明人： Toshiaki Aoai ,  Tadayoshi Kokubo

IPC分类号： G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039

摘要： A positive working light-sensitive composition which comprises:(a) 10 to 95% by weight of a compound which has at least one acid-decomposable group and whose solubility in an alkaline developer increases by the action of an acid,(b) 0.01 to 20% by weight of a disulfone compound represented by the formula (I):R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be same or different and represent substituted or unsubstituted alkyl groups, substituted or unsubstituted alkenyl groups or substituted or unsubstituted aryl groups, and(c) 3 to 85% by weight of a water-insoluble but alkaline water-soluble resin, wherein the optical density at 248 nm of 1 .mu.m thick coating of the composition is not more than 1.4 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.The light-sensitive composition is highly responsive to light of Deep-UV regions and excellent in image resolution.

摘要翻译： 一种正性工作感光性组合物，其包含：（a）10至95重量％的具有至少一个酸可分解基团并且其在碱性显影剂中的溶解度随着酸的作用而增加的化合物，（b）0.01 至20重量％的由式（I）表示的二砜化合物：R 1 -SO 2 -SO 2 -R 2（I）其中R 1和R 2可以相同或不同，表示取代或未取代的烷基，取代或未取代的烯基或 取代或未取代的芳基，和（c）3-85重量％的不溶于水的碱性水溶性树脂，其中组合物的1μm厚涂层的248nm处的光密度不大于1.4， 曝光于248nm的涂层的248nm处的光密度小于曝光前的涂层的光密度。 感光组合物对深UV区域的光敏感性高，图像分辨率优异。

公开(公告)号：US5576143A

公开(公告)日：1996-11-19

申请号：US985262

申请日：1992-12-03

申请人： Toshiaki Aoai ,  Tadayoshi Kokubo

发明人： Toshiaki Aoai ,  Tadayoshi Kokubo

IPC分类号： G03F7/004 ,  G03C1/492

CPC分类号： G03F7/0045 ,  Y10S430/156

摘要： A positive type or negative type light-sensitive composition providing high sensitivity and high resolution in the manufacture of a semiconductor device, and contains:(a) a compound which has at least one group capable of decomposing by acid and a solubility that is increased in an alkaline developing solution,(b) a compound which generates acid by an irradiation with actinic rays or radiation,(c) a compound which generates a base at 50.degree. C. or higher, and(d) a resin which is insoluble in water and soluble in an alkaline aqueous solution.

摘要翻译： 在半导体器件的制造中提供高灵敏度和高分辨率的正型或负型光敏组合物，其包含：（a）具有至少一个能够被酸分解的基团和溶解度增加的化合物 碱性显影液，（b）通过光化射线或辐射照射产生酸的化合物，（c）在50℃以上产生碱的化合物，和（d）不溶于水的树脂 并溶于碱性水溶液。

公开(公告)号：US5318875A

公开(公告)日：1994-06-07

申请号：US15921

申请日：1993-02-10

申请人： Yasumasa Kawabe ,  Toshiaki Aoai ,  Tadayoshi Kokubo ,  Shiro Tan

发明人： Yasumasa Kawabe ,  Toshiaki Aoai ,  Tadayoshi Kokubo ,  Shiro Tan

IPC分类号： C07C45/46 ,  G03F7/022 ,  G03F7/023 ,  G03C1/61

CPC分类号： G03F7/0226 ,  C07C45/46 ,  G03F7/022

摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.

摘要翻译： 正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27， 可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基， 芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为 羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素 原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

公开(公告)号：US5248582A

公开(公告)日：1993-09-28

申请号：US987562

申请日：1992-12-08

申请人： Kazuya Uenishi ,  Shinji Sakaguchi ,  Tadayoshi Kokubo

发明人： Kazuya Uenishi ,  Shinji Sakaguchi ,  Tadayoshi Kokubo

IPC分类号： G03F7/022

CPC分类号： G03F7/022

摘要： A positive type photoresist composition which comprises an alkali soluble novolak resin and at least one light-sensitive material represented by the following general formulae (I) to (IV) to provide a resist pattern with high resolution, high reproduction fidelity, desirable sectional shape, wide latitude of development, high heat resistance and high storage stability: ##STR1## (wherein X represents --CO--, or --SO.sub.2 --; p represents an integer from 2 to 4; R's may be the same or different, each being --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, ##STR2## provided that R always contains at least one of ##STR3## ; R.sub.1 represents ##STR4## a substituted or unsubstituted di- to tetra-valent alkyl group, or a substituted or unsubstituted di- to tetra-valent aromatic group; and l, m and n Represent O or an integer of from 1 to 3, provided that at least one of them is not zero).

摘要翻译： 一种正型光致抗蚀剂组合物，其包含碱溶性酚醛清漆树脂和由以下通式（I）至（IV）表示的至少一种感光材料，以提供具有高分辨率，高再现保真度，期望的截面形状的抗蚀剂图案， 宽范围的发展，高耐热性和高储存稳定性：其中X表示-CO-或-SO 2 - ;其中X表示-CO-或-SO 2 - ; p表示2至4的整数; R可以相同或不同，各自为-H，-OH，取代或未取代的烷基，取代或未取代的烷氧基，取代或未取代的芳基，取代或未取代的 芳烷基，取代或未取代的酰基，取代或未取代的酰氧基，条件是R总是包含至少一个; R 1表示取代或未取代的二价至四价的烷基 ，或替代或未授权 抽出二价至四价芳基; 和l，m和n表示O或1至3的整数，条件是它们中的至少一个不为零）。

公开(公告)号：US5153096A

公开(公告)日：1992-10-06

申请号：US670513

申请日：1991-03-18

申请人： Kazuya Uenishi ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

发明人： Kazuya Uenishi ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

IPC分类号： G03C1/72 ,  G03F7/022 ,  H01L21/027

CPC分类号： G03F7/022

摘要： A positive type photoresist composition comprising at least one light-sensitive material, as defined herein, and an alkali-soluble novolak resin, has a high resolving power, particularly when used in semiconductor devices, accurately reproduces mask dimensions over a wide photomask line width range, from a resist pattern in a cross-sectional form having a high aspect ratio in a pattern having a line width of no greater than 1 .mu.m, has a wide developing latitude and excellent heat resistance.

摘要翻译： 包含如本文所定义的至少一种感光材料和碱溶性酚醛清漆树脂的正型光致抗蚀剂组合物具有高分辨能力，特别是当用于半导体器件时，在宽的光掩模线宽度范围内精确地再现掩模尺寸 从具有不大于1μm的线宽的图案的具有高纵横比的横截面形式的抗蚀剂图案具有宽的显影宽度和优异的耐热性。

公开(公告)号：US4592991A

公开(公告)日：1986-06-03

申请号：US684402

申请日：1984-12-20

申请人： Tetsuo Yoshida ,  Tadayoshi Kokubo ,  Keiichi Adachi ,  Tadashi Ikeda ,  Hidetoshi Kobayashi

发明人： Tetsuo Yoshida ,  Tadayoshi Kokubo ,  Keiichi Adachi ,  Tadashi Ikeda ,  Hidetoshi Kobayashi

IPC分类号： G03C1/42 ,  G03C1/06 ,  G03C1/815 ,  G03C5/16 ,  G03C1/02 ,  G03C7/26

CPC分类号： G03C1/815 ,  Y10S430/134

摘要： A silver halide photographic printing paper is described, comprising a support and a photographic layer containing a silver halide developing agent, wherein a dispersion of an oil-soluble brightening agent in a high boiling point organic solvent having a specific inductive capacity of 7.5 or less is contained in the photographic layer. This printing paper yields a background of high whiteness even when processed under rapid processing conditions.

摘要翻译： 描述了一种卤化银照相印刷纸，其包括载体和含有卤化银显影剂的照相层，其中油溶性增亮剂在具有7.5或更小的介电常数的高沸点有机溶剂中的分散体是 包含在照相层中。 即使在快速加工条件下加工，该印刷纸也产生高白度的背景。

公开(公告)号：US5576139A

公开(公告)日：1996-11-19

申请号：US783346

申请日：1991-10-28

申请人： Kazuya Uenishi ,  Shiro Tan ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

发明人： Kazuya Uenishi ,  Shiro Tan ,  Yasumasa Kawabe ,  Tadayoshi Kokubo

IPC分类号： C08G8/08 ,  C08L61/04 ,  C08L61/06 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027

CPC分类号： C08G8/08 ,  G03F7/022 ,  G03F7/0236

摘要： A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.

摘要翻译： 提供了一种新型的正型光致抗蚀剂组合物，其包含通过在二氧化硅 - 氧化镁固体催化剂和含有1,2-萘醌的固体催化剂存在下缩合取代或未取代的酚和醛而获得的碱溶性酚醛清漆树脂， 重氮基-5-（和/或-4-）磺酸盐为主要成分。