公开(公告)号：US08534936B2

公开(公告)日：2013-09-17

申请号：US13178037

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/00 ,  G03B27/52 ,  B05C11/02 ,  B05C13/02

CPC分类号： G03F7/708 ,  H01L21/6715

摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.

摘要翻译： 涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。 每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。 每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。 分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。 第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

公开(公告)号：US08419299B2

公开(公告)日：2013-04-16

申请号：US13219955

申请日：2011-08-29

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/16 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/67184

摘要： In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.

摘要翻译： 在一个实施例中，涂覆和显影装置设置有处理块，其包括设置在承载块侧的液体处理块和设置在界面块侧上的加热处理块。 液体处理块包括第一单元块，第二单元块以及覆盖在第一单元块和第二单元块的堆叠之下或下面的一个或多个显影单元块。 第一单元块包括设置在其输送通道两侧的防反射膜形成模块和抗蚀剂膜形成模块。 第二单元块包括设置在其输送通道两侧的上成膜模块和硬化模块。

公开(公告)号：US08480319B2

公开(公告)日：2013-07-09

申请号：US13221072

申请日：2011-08-30

申请人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

摘要翻译： 通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从侧面 载波块到接口块的一侧。 一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块 层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。 每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

公开(公告)号：US20120013859A1

公开(公告)日：2012-01-19

申请号：US13177997

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

IPC分类号： G03B27/52

CPC分类号： G03F7/16 ,  H01L21/6715

摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

摘要翻译： 在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。 该装置具有至少两个适于异常的操作模式M1和M2。 在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。 在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

公开(公告)号：US08888387B2

公开(公告)日：2014-11-18

申请号：US13177976

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/00 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01L21/6715 ,  H01L21/67178 ,  H01L21/67288 ,  H01L21/67745

摘要： In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.

摘要翻译： 在一个实施例中，涂层和显影装置包括处理块，其包括早期处理单元块的垂直堆叠; 垂直堆叠的后级处理单元块，其横向邻近于相应的早期处理单元块设置; 堆叠在早期处理单元块上的显影单元块的垂直堆叠; 辅助处理单元块的垂直堆叠，其横向邻近于相应的显影单元块设置; 第一传送单元，每个传送单元布置在横向相邻的早期处理单元和后期处理单元之间; 第二转印单元，其各自设置在横向相邻的显影单元块和辅助处理单元块之间; 以及用于在第一转印单元之间和第二转印单元之间转印衬底的辅助转印机构。

公开(公告)号：US08506186B2

公开(公告)日：2013-08-13

申请号：US13225985

申请日：2011-09-06

申请人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  G03F7/162 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.

摘要翻译： 一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块 单位块组。 液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于 发展。 第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。 第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

公开(公告)号：US20120009528A1

公开(公告)日：2012-01-12

申请号：US13177976

申请日：2011-07-07

申请人： Nobuaki MATSUOKA ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki MATSUOKA ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： H01L21/6715 ,  H01L21/67178 ,  H01L21/67288 ,  H01L21/67745

摘要： In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.

摘要翻译： 在一个实施例中，涂层和显影装置包括处理块，其包括早期处理单元块的垂直堆叠; 垂直堆叠的后级处理单元块，其横向相邻于所述早期处理单元块中的相应处理单元块; 堆叠在早期处理单元块上的显影单元块的垂直堆叠; 辅助处理单元块的垂直堆叠，其横向邻近于相应的显影单元块设置; 第一传送单元，每个传送单元布置在横向相邻的早期处理单元和后期处理单元之间; 第二转印单元，其各自设置在横向相邻的显影单元块和辅助处理单元块之间; 以及用于在第一转印单元之间和第二转印单元之间转印衬底的辅助转印机构。

公开(公告)号：US20120008936A1

公开(公告)日：2012-01-12

申请号：US13178037

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： G03F7/708 ,  H01L21/6715

摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.

摘要翻译： 涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。 每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。 每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。 分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。 第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

公开(公告)号：US20120057862A1

公开(公告)日：2012-03-08

申请号：US13221072

申请日：2011-08-30

申请人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

摘要翻译： 通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从 载波块到接口块的一侧。 一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块 层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。 每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

公开(公告)号：US08985880B2

公开(公告)日：2015-03-24

申请号：US13177997

申请日：2011-07-07

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

IPC分类号： G03D5/00 ,  G03B27/32 ,  H01L21/67

CPC分类号： G03F7/16 ,  H01L21/6715

摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

摘要翻译： 在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。 该装置具有至少两个适于异常的操作模式M1和M2。 在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。 在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。