公开(公告)号：US6097472A

公开(公告)日：2000-08-01

申请号：US61072

申请日：1998-04-16

申请人： Nobuyoshi Tanaka ,  Kenji Saito ,  Hideki Ina ,  Yoshiyuki Sekine

发明人： Nobuyoshi Tanaka ,  Kenji Saito ,  Hideki Ina ,  Yoshiyuki Sekine

IPC分类号： G03F7/20 ,  G03F7/24 ,  G03B27/58 ,  G03B27/42

CPC分类号： G03F7/24 ,  G03F7/703 ,  G03H2001/043 ,  G03H2001/085

摘要： An exposure apparatus for exposing a pattern on a device material includes a holder for chucking and holding a silicon ball, a spherical reticle on which a hologram of a circuit pattern to be exposed is formed, a light source, a focusing optical system for focusing light emitted by the light source on a first position, and an elliptic mirror having a first focal point at the first position and a second focal point at the central position of the silicon ball (reticle). The center of the reticle coincides with the center of the silicon ball.

摘要翻译： 用于在装置材料上曝光图案的曝光装置包括用于夹持和保持硅球的保持器，其上形成有要暴露的电路图案的全息图的球形掩模版，光源，用于聚焦光的聚焦光学系统 由光源在第一位置发射的椭圆镜和在第一位置具有第一焦点的椭圆镜和位于硅球（掩模版）的中心位置处的第二焦点）。 掩模版的中心与硅球的中心重合。

公开(公告)号：US5414465A

公开(公告)日：1995-05-09

申请号：US176463

申请日：1994-01-03

申请人： Yasumasa Kodama ,  Yoshiyuki Sekine

发明人： Yasumasa Kodama ,  Yoshiyuki Sekine

IPC分类号： H04N9/09 ,  H04N9/04

CPC分类号： H04N9/045 ,  H04N2209/046

摘要： A luminance signal generating apparatus including a first CCD device, and a second CCD device disposed at a position obliquely displaced relative to a spatial position of the first CCD device, an interpolating circuit for interpolating an output from the second CCD device. A low band luminance signal generating circuit generates a low band luminance signal on the basis of an output from the interpolating circuit. A high band luminance signal generating circuit generates a high band luminance signal on the basis of output signals from the first and second CCD devices and the interpolation signal from the interpolating circuit. A luminance signal generating circuit generates a luminance signal on the basis of the low band luminance signal and the high band luminance signal from the low band luminance signal generating circuit and the high band luminance generating circuit.

摘要翻译： 一种亮度信号发生装置，包括第一CCD装置和设置在相对于第一CCD装置的空间位置倾斜移位的位置的第二CCD装置，用于内插来自第二CCD装置的输出的内插电路。 低频带亮度信号发生电路根据内插电路的输出产生低频亮度信号。 高频带亮度信号发生电路根据来自第一和第二CCD器件的输出信号和来自内插电路的内插信号产生高频带亮度信号。 亮度信号发生电路根据来自低频带亮度信号发生电路和高频带亮度发生电路的低频带亮度信号和高频带亮度信号，生成亮度信号。

公开(公告)号：US08027025B2

公开(公告)日：2011-09-27

申请号：US12145639

申请日：2008-06-25

申请人： Yoshiyuki Sekine

发明人： Yoshiyuki Sekine

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70891 ,  G03B27/54

摘要： An exposure apparatus which exposes a substrate with exposure light, includes a projection optical system which projects a pattern image of an original onto the substrate; a first illumination unit which illuminates the original with the exposure light; and a second illumination unit which guides illumination light that is different from the exposure light for exposing the substrate to the projection optical system, the second illumination unit includes a modifier which modifies an illumination distribution of the illumination light entering an optical element near a pupil of the projection optical system and an optical element which is the closest to the original in the projection optical system.

摘要翻译： 曝光用曝光用基板的曝光装置包括将原稿的图案图像投影到基板上的投影光学系统; 用曝光灯照亮原稿的第一照明单元; 以及第二照明单元，其引导与所述曝光用光不同的照明光，以将所述基板曝光到所述投影光学系统，所述第二照明单元包括修改器，其对进入光学元件附近的光学元件的照明光的照度分布进行修改， 投影光学系统和在投影光学系统中与原稿最接近的光学元件。

公开(公告)号：US08411253B2

公开(公告)日：2013-04-02

申请号：US12492736

申请日：2009-06-26

申请人： Yoshiyuki Sekine ,  Kenji Yamazoe

发明人： Yoshiyuki Sekine ,  Kenji Yamazoe

IPC分类号： G03B27/32

CPC分类号： G03F7/70666 ,  G03F7/705

摘要： A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the plurality of areas, generating, for each of the plurality of areas, a plurality of shifted pupil functions by shifting a pupil function in accordance with a position of each of divided point sources, defining, for each of the plurality of areas, a matrix including the plurality of pupil functions, calculating, for each of the plurality of areas, eigenvalues and eigenfunctions by performing singular value decomposition of the matrix, and calculating, for each of the plurality of areas, the light intensity distribution based on a diffracted light distribution from the mask and the eigenvalues and the eigenfunctions.

摘要翻译： 一种包含计算机可执行指令的计算机可读介质，其使得计算机执行计算投影光学系统的图像平面上形成的光强度分布的处理步骤。 当执行时，介质使计算机执行将有效光源划分成多个区域的步骤，通过根据位置移动光瞳功能，为多个区域中的每一个产生多个移位光瞳功能 对于每个分割点源，为每个多个区域定义包括多个瞳孔函数的矩阵，通过执行矩阵的奇异值分解来计算多个区域中的每个区域的特征值和本征函数，并且计算 对于多个区域中的每一个，基于来自掩模的衍射光分布和特征值以及特征函数的光强度分布。

公开(公告)号：US07106455B2

公开(公告)日：2006-09-12

申请号：US10091985

申请日：2002-03-06

申请人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

发明人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

IPC分类号： G01B9/02

CPC分类号： G01B11/2441 ,  G01B11/255

摘要： There is provided an interferometer for measuring a surface shape of an optical element using interference, including a reference wave-front generating unit for generating a reference wave front for measuring the surface shape, which is provided in a target optical path, and includes an Alvarez lens.

公开(公告)号：US20060176461A1

公开(公告)日：2006-08-10

申请号：US11349897

申请日：2006-02-09

申请人： Yoshiyuki Sekine

发明人： Yoshiyuki Sekine

IPC分类号： G03B27/54

CPC分类号： G03F7/70941 ,  G03F7/70341

摘要： A projection optical system for projecting a pattern of a first object onto a second object. The projection optical system includes a field stop provided to an optical element in the projection optical system, which is closest to the second object. The field stop is provided for shielding the outside of a pattern projected area on the second object.

摘要翻译： 一种用于将第一物体的图案投影到第二物体上的投影光学系统。 投影光学系统包括设置在最靠近第二物体的投影光学系统中的光学元件的场停止。 提供场挡板用于屏蔽第二物体上的图案投影区域的外部。

公开(公告)号：US20060066829A1

公开(公告)日：2006-03-30

申请号：US11233593

申请日：2005-09-22

申请人： Yoshiyuki Sekine

发明人： Yoshiyuki Sekine

IPC分类号： G03B27/54

CPC分类号： G03F7/70283 ,  G03F7/70291

摘要： A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection optical system that uses first diffracted light among lights exited from the optical modulator to project a pattern onto an object to be exposed includes the steps of detecting second diffracted light having an order different from that of the first diffracted light among the lights exited from the optical modulator, and obtaining a state of the pattern projected onto the object based on a detection result by the detecting step.

摘要翻译： 一种曝光装置的图案监视方法，包括具有提供具有多个相位差的入射光的至少一个元件的光调制器，以及投影光学系统，其使用从光调制器退出的光中的第一衍射光将图案投影到 要曝光的物体包括检测从光调制器退出的光中具有与第一衍射光不同的次序的第二衍射光的步骤，并且基于由光调制器的检测结果获得投射到物体上的图案的状态 检测步骤。

公开(公告)号：US06417940B1

公开(公告)日：2002-07-09

申请号：US09434296

申请日：1999-11-05

申请人： Yoshiyuki Sekine

发明人： Yoshiyuki Sekine

IPC分类号： G03H108

CPC分类号： G03H1/0841 ,  G03H1/0244 ,  G03H1/0276 ,  G03H1/08 ,  G03H2001/048 ,  G03H2001/085 ,  G03H2001/221 ,  G03H2001/2218 ,  G03H2001/263 ,  G03H2240/13 ,  G03H2240/42

摘要： A phase type computer hologram has a plurality of cells for applying a predetermined phase to different portions of a wavefront of light, wherein no phase skip larger than &pgr; is present in the cells. Such a phase type computer hologram can be produced by a process of determining phases for a plurality of cells, respectively, smoothening a distribution of the phases of the cells, by shifting the phase of at least one of the cells by 2&pgr;, and forming, on a substrate, the cells whose phase distribution is smoothened in the smoothening step.

摘要翻译： 相位计算机全息图具有多个单元，用于将预定相位施加到光波前的不同部分，其中在单元中不存在大于pi的相位跳跃。 这样的相位计算机全息图可以通过分别通过将至少一个单元的相位移动2pi来分别确定单元的相位的分布来确定相位的分布的步骤来确定多个单元的相位的处理， 在基板上，在平滑化步骤中相位分布平滑的单元。

公开(公告)号：US20100053580A1

公开(公告)日：2010-03-04

申请号：US12492736

申请日：2009-06-26

申请人： Yoshiyuki Sekine ,  Kenji Yamazoe

发明人： Yoshiyuki Sekine ,  Kenji Yamazoe

IPC分类号： G03B27/42

CPC分类号： G03F7/70666 ,  G03F7/705

摘要： A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the plurality of areas, generating, for each of the plurality of areas, a plurality of shifted pupil functions by shifting a pupil function in accordance with a position of each of divided point sources, defining, for each of the plurality of areas, a matrix including the plurality of pupil functions, calculating, for each of the plurality of areas, eigenvalues and eigenfunctions by performing singular value decomposition of the matrix, and calculating, for each of the plurality of areas, the light intensity distribution based on a diffracted light distribution from the mask and the eigenvalues and the eigenfunctions.

摘要翻译： 一种包含计算机可执行指令的计算机可读介质，其使得计算机执行计算投影光学系统的图像平面上形成的光强度分布的处理步骤。 当执行时，介质使计算机执行将有效光源划分成多个区域的步骤，通过根据位置移动光瞳功能，为多个区域中的每一个产生多个移位光瞳功能 对于每个分割点源，为每个多个区域定义包括多个瞳孔函数的矩阵，通过执行矩阵的奇异值分解来计算多个区域中的每个区域的特征值和本征函数，并且计算 对于多个区域中的每一个，基于来自掩模的衍射光分布和特征值以及特征函数的光强度分布。

公开(公告)号：US07511888B2

公开(公告)日：2009-03-31

申请号：US11139337

申请日：2005-05-26

申请人： Yoshiyuki Sekine

发明人： Yoshiyuki Sekine

IPC分类号： G02B1/10

CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G21K1/062

摘要： A projection optical system having a multilayered film mirror arranged to provide an approximately uniform reflectance throughout a predetermined light incidence angle range to thereby assure a desired optical performance. A projection exposure apparatus having such a projection optical system, and a device manufacturing method using such an exposure apparatus. A non-periodic film is used in a reflection multilayered film upon a mirror having a largest light incidence angle range or a mirror having a largest average of light incidence angle, and this effectively reduces a pupil transmittance distribution in the projection optical system.

摘要翻译： 一种具有多层膜镜的投影光学系统，其布置成在预定的光入射角范围内提供近似均匀的反射率，从而确保期望的光学性能。 具有这种投影光学系统的投影曝光装置和使用这种曝光装置的装置制造方法。 在具有最大光入射角范围的反射镜或具有最大平均光入射角的反射镜的反射多层膜中使用非周期性膜，这有效地降低了投影光学系统中的光瞳透射率分布。