Organic electrically conductive compound and an organic electroluminescent device including the compound
    1.
    发明授权
    Organic electrically conductive compound and an organic electroluminescent device including the compound 失效
    有机导电化合物和包含该化合物的有机电致发光器件

    公开(公告)号:US06709772B2

    公开(公告)日:2004-03-23

    申请号:US10256894

    申请日:2002-09-27

    IPC分类号: H05B3312

    摘要: An organic electrically conductive compound represented by general formula (1): and an organic electroluminescent device using the compound are provided, wherein n is an integer from 1 to 10, k represents any of integers from 2 to n+1, Ar1, Ar1′, Ar2, and Ar2′ are substituted or non-substituted aromatic hydrocarbon rings or heterocyclic rings that share a bond between carbons at 2,3-positions or 4,5-positions of a pyrrole ring in general formula (1) and are fused with the pyrrole ring, respectively, Ar3 is a divalent group of a substituted or non-substituted aromatic hydrocarbon or heterocyclic compound, and R1, R1′, Rk, and Rk′ are aliphatic hydrocarbon groups or substituted or non-substituted aryl or heterocyclic groups, respectively.

    摘要翻译: 提供由通式(1)表示的有机导电化合物和使用该化合物的有机电致发光器件,其中n为1至10的整数,k表示2至n + 1中的任何整数,Ar 1,Ar 1' ,Ar2和Ar2'是在通式(1)中的吡咯环的2,3位或4,5位上的碳之间具有共价键的取代或未取代的芳族烃环或杂环,并且与 吡咯环分别为取代或未取代的芳烃或杂环化合物的二价基团,R1,R1',Rk和Rk'为脂族烃基或取代或未取代的芳基或杂环基, 分别。

    Organic electrically conductive compound and an organic electroluminescent device including the compound
    2.
    发明授权
    Organic electrically conductive compound and an organic electroluminescent device including the compound 失效
    有机导电化合物和包含该化合物的有机电致发光器件

    公开(公告)号:US06706424B2

    公开(公告)日:2004-03-16

    申请号:US10256845

    申请日:2002-09-27

    IPC分类号: H05B3312

    摘要: An organic electrically conductive compound represented by general formula (1): and an organic elctroluminescent device using the compound are provided, wherein n is an integer from 2 to 10, k represents any of integers from 1 to n, Ar1, Ar1′, Ar2, and Ar2′ are substituted or non-substituted aromatic hydrocarbon rings or heterocyclic rings that share a bond between carbons at 2,3-positions or 4,5-positions of a pyrrole ring in general formula (1) and are fused with the pyrrole ring, respectively, and Rk and Rk′ are aliphatic hydrocarbon groups or substituted or non-substituted aryl or heterocyclic groups, respectively.

    摘要翻译: 提供由通式(1)表示的有机导电化合物和使用该化合物的有机电致发光器件,其中n为2至10的整数,k表示1至n中的任何整数,Ar 1,Ar 1',Ar 2 和Ar2'是在通式(1)中的吡咯环的2,3-位或4,5位上的碳之间具有共轭键的取代或未取代的芳族烃环或杂环,并与吡咯稠合 Rk和Rk'分别是脂族烃基或取代或未取代的芳基或杂环基。

    Pattern dimension measurement method and charged particle beam apparatus
    4.
    发明授权
    Pattern dimension measurement method and charged particle beam apparatus 有权
    图案尺寸测量方法和带电粒子束装置

    公开(公告)号:US09297649B2

    公开(公告)日:2016-03-29

    申请号:US14001433

    申请日:2011-12-12

    摘要: The present invention aims to provide a pattern dimension measurement method for accurately measuring an amount of shrinkage of a pattern that shrinks and an original dimension value before the shrinkage and a charged particle beam apparatus.In order to attain the above-mentioned object, there are proposed a pattern dimension measurement method and a charged particle beam apparatus that are characterized by: forming a thin film on a sample including the pattern after carrying out beam scanning onto a first portion of the pattern; acquiring a first measurement value by scanning a beam onto a region corresponding to the first portion on which the thin film is formed; acquiring a second measurement value by scanning a beam onto a second portion that has identical dimensions as those of the first portion on design data; and finding the amount of shrinkage of the pattern based on subtraction processing of subtracting the first measurement value from the second measurement value.

    摘要翻译: 本发明的目的在于提供一种图形尺寸测量方法,用于精确测量收缩的图案的收缩量和收缩前的原始尺寸值以及带电粒子束装置。 为了实现上述目的,提出了一种图案尺寸测量方法和带电粒子束装置,其特征在于:在对包含图案的样品进行束扫描之后,在包含该图案的样品上形成薄膜至第一部分 模式; 通过将光束扫描到与其上形成有薄膜的第一部分对应的区域来获取第一测量值; 通过将光束扫描到与设计数据上的第一部分具有相同尺寸的第二部分上来获取第二测量值; 并且基于从第二测量值减去第一测量值的减法处理来找出图案的收缩量。

    Estimating shape based on comparison between actual waveform and library in lithography process
    5.
    发明授权
    Estimating shape based on comparison between actual waveform and library in lithography process 有权
    基于光刻过程中实际波形与库之间的比较估算形状

    公开(公告)号:US08671366B2

    公开(公告)日:2014-03-11

    申请号:US13390354

    申请日:2010-07-15

    IPC分类号: G06F17/50

    摘要: The present invention aims at proposing a library creation method and a pattern shape estimation method in which it is possible, when estimating a shape based on comparison between an actual waveform and a library, to appropriately estimate the shape.As an illustrative embodiment to achieve the object, there are proposed a method of selecting a pattern by referring to a library, a method of creating a library by use of pattern cross-sectional shapes calculated through an exposure process simulation in advance, and a method for selecting a pattern shape stored in the library.

    摘要翻译: 本发明旨在提出一种库创建方法和图案形状估计方法,其中当基于实际波形和库之间的比较来估计形状时,可以适当地估计形状。 作为实现该目的的说明性实施例,提出了通过参照库来选择图案的方法,通过使用预先通过曝光处理模拟计算的图案横截面形状来创建库的方法,以及方法 用于选择存储在库中的图案形状。

    PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请
    PATTERN DIMENSION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 有权
    图案尺寸测量方法和充电颗粒光束装置

    公开(公告)号:US20140048706A1

    公开(公告)日:2014-02-20

    申请号:US14001433

    申请日:2011-12-12

    IPC分类号: G01N23/00

    摘要: The present invention aims to provide a pattern dimension measurement method for accurately measuring an amount of shrinkage of a pattern that shrinks and an original dimension value before the shrinkage and a charged particle beam apparatus.In order to attain the above-mentioned object, there are proposed a pattern dimension measurement method and a charged particle beam apparatus that are characterized by: forming a thin film on a sample including the pattern after carrying out beam scanning onto a first portion of the pattern; acquiring a first measurement value by scanning a beam onto a region corresponding to the first portion on which the thin film is formed; acquiring a second measurement value by scanning a beam onto a second portion that has identical dimensions as those of the first portion on design data; and finding the amount of shrinkage of the pattern based on subtraction processing of subtracting the first measurement value from the second measurement value.

    摘要翻译: 本发明的目的在于提供一种图形尺寸测量方法,用于精确测量收缩的图案的收缩量和收缩前的原始尺寸值以及带电粒子束装置。 为了实现上述目的,提出了一种图案尺寸测量方法和带电粒子束装置,其特征在于:在对包含图案的样品进行束扫描之后,在包含该图案的样品上形成薄膜至第一部分 模式; 通过将光束扫描到与其上形成有薄膜的第一部分对应的区域来获取第一测量值; 通过将光束扫描到与设计数据上的第一部分具有相同尺寸的第二部分上来获取第二测量值; 并且基于从第二测量值减去第一测量值的减法处理来找出图案的收缩量。

    IMAGE PROCESSING APPARATUS AND COMPUTER PROGRAM
    7.
    发明申请
    IMAGE PROCESSING APPARATUS AND COMPUTER PROGRAM 有权
    图像处理设备和计算机程序

    公开(公告)号:US20130279793A1

    公开(公告)日:2013-10-24

    申请号:US13882141

    申请日:2011-10-26

    IPC分类号: G06T7/00

    摘要: An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the present invention proposes an image processing apparatus and a computer program which acquires image data, and detects edge branch points from this image data. Here, at each of the edge branch points, an edge associated therewith branches off in at least three or more directions. According to this configuration, it becomes possible to detect a defect such as a scum without utilizing the reference-pattern image. As a consequence, it becomes possible to detect the scum at high speed and with high precision.

    摘要翻译: 本发明的目的是提供一种图像处理装置和计算机程序,其以高速和高精度检测浮渣等缺陷。 为了实现上述目的,本发明提出一种图像处理装置和计算机程序,其获取图像数据,并从该图像数据检测边缘分支点。 这里,在每个边缘分支点处,与其相关联的边缘在至少三个或更多个方向上分支。 根据该结构,能够在不利用基准图案图像的情况下检测浮渣等缺陷。 因此,可以高速,高精度地检测浮渣。

    Transmitter
    8.
    发明授权
    Transmitter 有权
    发射机

    公开(公告)号:US08085870B2

    公开(公告)日:2011-12-27

    申请号:US12309140

    申请日:2007-03-20

    IPC分类号: H04L25/49

    CPC分类号: H04B1/707 H04B2201/70706

    摘要: A transmitter suppresses peak power occurring in a transmission signal. The transmitter generates peak suppression signals for suppressing the peak power in the transmission signal respectively, synthesizes the peak suppression signals generated, and subtracts a signal as a synthesis result from the transmission signal.

    摘要翻译: 发射机抑制发射信号中发生的峰值功率。 发射机分别产生用于抑制发送信号中的峰值功率的峰值抑制信号,合成产生的峰值抑制信号,并从发送信号中减去作为合成结果的信号。

    Transmitter
    9.
    发明授权
    Transmitter 有权
    发射机

    公开(公告)号:US07974581B2

    公开(公告)日:2011-07-05

    申请号:US12068926

    申请日:2008-02-13

    IPC分类号: H04B1/68

    摘要: A transmitter suppresses a peak level of a multi-carrier signal produced by synthesizing a plurality of carrier signals. Specifically, a peak level suppression signal for a multi-carrier signal is generated. The generated peak level suppression signal is adjusted in accordance with the levels of respective carriers constituting the multi-carrier signal. And, the adjusted peak level suppression signal for each carrier is subtracted from an input signal, thereby generating a multi-carrier signal whose peak level is suppressed.

    摘要翻译: 发射机抑制通过合成多个载波信号而产生的多载波信号的峰值电平。 具体地,产生用于多载波信号的峰值电平抑制信号。 所生成的峰值电平抑制信号根据构成多载波信号的各个载波的电平进行调整。 并且,从输入信号中减去每个载波的调整峰值电平抑制信号,从而产生其峰值电平被抑制的多载波信号。

    Method and Apparatus for Pattern Position and Overlay Measurement
    10.
    发明申请
    Method and Apparatus for Pattern Position and Overlay Measurement 有权
    图形位置和叠加测量的方法和装置

    公开(公告)号:US20110155904A1

    公开(公告)日:2011-06-30

    申请号:US12648766

    申请日:2009-12-29

    IPC分类号: G01N23/00 G01B15/00

    摘要: Systems and methods using imaged device patterns to measure overlay between different layers in a semiconductor manufacturing process, such as a double-patterning process. Images of pattern features are acquired by scanning electron microscopy. The position of a patterning layer is determined using positions of pattern features for the patterning layer in the images. A relative position of each patterning layer with respect to other pattern features or patterning layers is determined in vector form based on the determined pattern positions. Overlay error is determined based on a comparison of the relative position with reference values from design or simulation. Overlay can be measured with high precision and accuracy by utilizing pattern symmetry.

    摘要翻译: 使用成像装置图案的系统和方法来测量半导体制造工艺中的不同层之间的覆盖层,例如双重图案化工艺。 通过扫描电子显微镜获得图案特征的图像。 使用图像中的图案化层的图案特征的位置来确定图案化层的位置。 基于所确定的图案位置,以向量形式确定每个图案形成层相对于其它图案特征或图案化层的相对位置。 叠加误差是根据相对位置与设计或模拟参考值的比较来确定的。 可以通过利用图案对称性以高精度和精度测量覆盖层。