公开(公告)号：US09297649B2

公开(公告)日：2016-03-29

申请号：US14001433

申请日：2011-12-12

申请人： Hiroki Kawada ,  Norio Hasegawa ,  Toru Ikegami

发明人： Hiroki Kawada ,  Norio Hasegawa ,  Toru Ikegami

IPC分类号： G01B15/06 ,  G01N23/225 ,  H01J37/28 ,  H01J37/22 ,  G01N23/00 ,  H01J37/244

CPC分类号： G01B15/06 ,  G01N23/00 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention aims to provide a pattern dimension measurement method for accurately measuring an amount of shrinkage of a pattern that shrinks and an original dimension value before the shrinkage and a charged particle beam apparatus.In order to attain the above-mentioned object, there are proposed a pattern dimension measurement method and a charged particle beam apparatus that are characterized by: forming a thin film on a sample including the pattern after carrying out beam scanning onto a first portion of the pattern; acquiring a first measurement value by scanning a beam onto a region corresponding to the first portion on which the thin film is formed; acquiring a second measurement value by scanning a beam onto a second portion that has identical dimensions as those of the first portion on design data; and finding the amount of shrinkage of the pattern based on subtraction processing of subtracting the first measurement value from the second measurement value.

摘要翻译： 本发明的目的在于提供一种图形尺寸测量方法，用于精确测量收缩的图案的收缩量和收缩前的原始尺寸值以及带电粒子束装置。 为了实现上述目的，提出了一种图案尺寸测量方法和带电粒子束装置，其特征在于：在对包含图案的样品进行束扫描之后，在包含该图案的样品上形成薄膜至第一部分 模式; 通过将光束扫描到与其上形成有薄膜的第一部分对应的区域来获取第一测量值; 通过将光束扫描到与设计数据上的第一部分具有相同尺寸的第二部分上来获取第二测量值; 并且基于从第二测量值减去第一测量值的减法处理来找出图案的收缩量。

公开(公告)号：US20140048706A1

公开(公告)日：2014-02-20

申请号：US14001433

申请日：2011-12-12

申请人： Hiroki Kawada ,  Norio Hasegawa ,  Toru Ikegami

发明人： Hiroki Kawada ,  Norio Hasegawa ,  Toru Ikegami

IPC分类号： G01N23/00

CPC分类号： G01B15/06 ,  G01N23/00 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention aims to provide a pattern dimension measurement method for accurately measuring an amount of shrinkage of a pattern that shrinks and an original dimension value before the shrinkage and a charged particle beam apparatus.In order to attain the above-mentioned object, there are proposed a pattern dimension measurement method and a charged particle beam apparatus that are characterized by: forming a thin film on a sample including the pattern after carrying out beam scanning onto a first portion of the pattern; acquiring a first measurement value by scanning a beam onto a region corresponding to the first portion on which the thin film is formed; acquiring a second measurement value by scanning a beam onto a second portion that has identical dimensions as those of the first portion on design data; and finding the amount of shrinkage of the pattern based on subtraction processing of subtracting the first measurement value from the second measurement value.

摘要翻译： 本发明的目的在于提供一种图形尺寸测量方法，用于精确测量收缩的图案的收缩量和收缩前的原始尺寸值以及带电粒子束装置。 为了实现上述目的，提出了一种图案尺寸测量方法和带电粒子束装置，其特征在于：在对包含图案的样品进行束扫描之后，在包含该图案的样品上形成薄膜至第一部分 模式; 通过将光束扫描到与其上形成有薄膜的第一部分对应的区域来获取第一测量值; 通过将光束扫描到与设计数据上的第一部分具有相同尺寸的第二部分上来获取第二测量值; 并且基于从第二测量值减去第一测量值的减法处理来找出图案的收缩量。

公开(公告)号：US20150036914A1

公开(公告)日：2015-02-05

申请号：US14239803

申请日：2012-05-24

申请人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

发明人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

IPC分类号： G06K9/46 ,  G06T7/00

CPC分类号： G06K9/4604 ,  B82Y10/00 ,  B82Y40/00 ,  G01B15/04 ,  G01N23/22 ,  G06T7/0004 ,  H01J37/3174 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2816 ,  H01J2237/31754 ,  H01J2237/31796 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).

摘要翻译： 在本发明中，在测量时，使用CD-SEM，当用电子束照射时收缩的抗蚀剂的长度为了在收缩之前高精度地估计抗蚀剂的形状和尺寸，收缩数据库 预先准备了各种图案，所述收缩数据库包含在电子束照射之前获得的横截面形状数据，横截面形状数据组和CD-SEM图像数据组，其在各种电子束照射条件下获得 ，以及基于这样的数据和数据组的模型，并且获得要测量的抗蚀剂图案的CD-SEM图像（S102），然后将CD-SEM图像和收缩数据库中的数据彼此进行比较（S103 ），并且估计并输出收缩前的图案的形状和尺寸（S104）。

公开(公告)号：US08502144B2

公开(公告)日：2013-08-06

申请号：US13190847

申请日：2011-07-26

申请人： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

发明人： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC分类号： H01J37/28 ,  H01J37/256 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/282

摘要： A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.

摘要翻译： 用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异 参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元 由工具状态监视单元监视的多个扫描电子显微镜中的每一个。 工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

公开(公告)号：US20130146763A1

公开(公告)日：2013-06-13

申请号：US13700096

申请日：2011-05-25

申请人： Hiroki Kawada ,  Osamu Inoue ,  Miyako Matsui ,  Takahiro Kawasaki ,  Naoshi Itabashi ,  Takashi Takahama ,  Katsumi Setoguchi ,  Osamu Komuro

发明人： Hiroki Kawada ,  Osamu Inoue ,  Miyako Matsui ,  Takahiro Kawasaki ,  Naoshi Itabashi ,  Takashi Takahama ,  Katsumi Setoguchi ,  Osamu Komuro

IPC分类号： G01B15/00 ,  G06K9/62

CPC分类号： G01B15/00 ,  G06K9/6201 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2817 ,  H01J2237/2826 ,  Y10T428/24355

摘要： An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.

摘要翻译： 本发明的目的是提供一种快速且精确地测量或评估视野中的失真和带电粒子束装置的图像处理装置。 为了实现该目的，提出了一种图像处理装置等，其获取成像目标的第一区域的第一图像和位于与第一区域不同的位置的第二区域的第二图像，并且部分地与 所述第一区域确定所述第二图像中的测量点和所述第二图像的与所述第一图像和所述第二图像的重叠区域中的多个位置的特定区域相对应的第二部分之间的距离。

公开(公告)号：US08369602B2

公开(公告)日：2013-02-05

申请号：US12190818

申请日：2008-08-13

申请人： Atsuko Yamaguchi ,  Jiro Yamamoto ,  Hiroki Kawada

发明人： Atsuko Yamaguchi ,  Jiro Yamamoto ,  Hiroki Kawada

IPC分类号： G06K9/00

CPC分类号： G06K9/4604 ,  G06T7/0006 ,  G06T7/13 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/30148

摘要： Disclosed herewith is a length measurement system, which obtains a value closer to its true one when figuring out the size and edge roughness of a pattern from a noise-included pattern image. Among plural band-like regions representing a portion around an edge in an image respectively, the system calculates the dependency of the edge point position on the image processing parameter at each of a narrow width band-like portion and a wide width band-like portion to calculate an image processing condition that calculates each measured value closer to its true value or estimates the true value itself.

摘要翻译： 本文公开了一种长度测量系统，当从包含噪声的图案图像中确定图案的尺寸和边缘粗糙度时，其获得接近其真实值的值。 在分别表示图像中的边缘周围的多个带状区域中，系统计算边缘点位置对窄幅带状部分和宽幅带状部分中的每一个处的图像处理参数的依赖性 以计算更接近其真实值的每个测量值的图像处理条件或估计真实值本身。

公开(公告)号：US08207512B2

公开(公告)日：2012-06-26

申请号：US12898455

申请日：2010-10-05

申请人： Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

发明人： Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

IPC分类号： G21K7/00 ,  A61N5/00 ,  G21G5/00

CPC分类号： H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2826

摘要： The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses.

摘要翻译： 本发明提供一种用于测量捕获用于测量的图像的半导体装置等的微尺寸（CD值）的带电粒子束装置。 对于本发明，使用用于校准的样品，其上在视场中排列有通过晶体各向异性蚀刻技术产生的表面上具有已知角度的多个多面体结构物体。 基于每个多面体结构物体的图像上的几何变形来计算视野内的每个位置处的束着陆角。 用于均衡视场内每个位置的束着陆角的光束控制参数被预先注册。 当进行尺寸测量时，根据待测图案的位置在观察区域中应用登记的光束控制参数。 因此，本发明提供了减少相对于具有相同束着陆角的样品的电子束着角的变化引起的CD值的变化的方法，以及用于减少由电子差异引起的仪器误差的方法 设备之间的束着陆角度。

公开(公告)号：US20110278453A1

公开(公告)日：2011-11-17

申请号：US13190847

申请日：2011-07-26

申请人： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

发明人： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/282

摘要： A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.

摘要翻译： 用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异 参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异与工具状态之间的关系的输出单元 由工具状态监视单元监视的多个扫描电子显微镜中的每一个。 工具状态监视单元通过使用多个扫描电子显微镜中的每一个来对多个扫描电子显微镜中的每个扫描电子显微镜的工具状态进行监视，同时对参考图案进行成像。

公开(公告)号：US07684937B2

公开(公告)日：2010-03-23

申请号：US12078840

申请日：2008-04-07

申请人： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

发明人： Atsuko Yamaguchi ,  Hiroshi Fukuda ,  Hiroki Kawada ,  Tatsuya Maeda

IPC分类号： G01B5/28

CPC分类号： G01B15/08 ,  G01N23/2251 ,  G03F7/70625 ,  H01J2237/223 ,  H01J2237/2817

摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

摘要翻译： 设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。 设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。 或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

公开(公告)号：US20100038535A1

公开(公告)日：2010-02-18

申请号：US12560091

申请日：2009-09-15

申请人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

发明人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

IPC分类号： G01Q20/00 ,  G01N23/00

CPC分类号： H01J37/28 ,  G01B15/00 ,  G01N23/225 ,  H01J2237/2814

摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

摘要翻译： 本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。 在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。