公开(公告)号：US20180293720A1

公开(公告)日：2018-10-11

申请号：US15482243

申请日：2017-04-07

申请人： NuFlare Technology, Inc.

发明人： Shusuke YOSHITAKE ,  Manabu ISOBE ,  Thomas SCHERUEBL ,  Dirk BEYER ,  Sven HEISIG

IPC分类号： G06T7/00 ,  H01L21/67 ,  H01L21/027 ,  G06T7/73 ,  G06T7/12 ,  G03F1/72 ,  G03F1/84 ,  G03F7/20 ,  G03F1/70 ,  G03F1/42

摘要： A pattern inspection apparatus includes: an optical image acquiring mechanism to acquire optical image data of a corresponding divided pattern for each of masks for multiple patterning has been formed; a position deviation map generating processing circuitry to generate position deviation maps regarding the corresponding divided pattern; a difference position value map generating processing circuitry to generate one difference position value map defining a difference value between relative position deviation amounts of the each minimum element of the position deviation maps; a region specifying processing circuitry to specify at least one region having the difference value exceeding a threshold of distance between patterns laying side-by-side by using the difference position value map; and an output mechanism to output at least coordinates, a type of defect, and information of a reference image of each region specified for the each region specified.

公开(公告)号：US20180101941A1

公开(公告)日：2018-04-12

申请号：US15723948

申请日：2017-10-03

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Eiji MATSUMOTO ,  Manabu ISOBE

IPC分类号： G06T7/00 ,  G03F1/84 ,  G03F1/36 ,  G06F17/30

CPC分类号： G06T7/001 ,  G03F1/36 ,  G03F1/84 ,  G06F16/583 ,  G06T7/0008 ,  G06T2207/30148

摘要： To include generating a reference image based on a comparison between design data of a mask having patterns and an optical image of the mask in a first region of the mask designated in advance, and confirming whether the generated reference image has effectiveness, the generating and the confirming being performed by a reference circuit, in which the confirmation on whether the reference image has effectiveness includes adding, as a confirmation region in which whether the reference image has effectiveness is to be confirmed, a second region of the mask in addition to the first region set in advance as the confirmation region, the adding being performed by an addition circuit, and confirming whether the reference image has effectiveness in the confirmation region including the first region and the second region, the confirming being performed by the reference circuit.

公开(公告)号：US20150279024A1

公开(公告)日：2015-10-01

申请号：US14208757

申请日：2014-03-13

申请人： NuFlare Technology, Inc.

发明人： Hideo TSUCHIYA ,  Manabu ISOBE ,  Hiroteru AKIYAMA ,  Makoto YABE ,  Takafumi INOUE ,  Nobutaka KIKUIRI

IPC分类号： G06T7/00 ,  G06K9/62

CPC分类号： G06T7/0006 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F1/84 ,  G03F7/7065 ,  G06K9/6215 ,  G06T7/0008 ,  G06T7/001 ,  G06T7/74 ,  G06T2200/24 ,  G06T2207/30108 ,  G06T2207/30148 ,  G06T2207/30168

摘要： An inspection method comprising, virtually dividing a sample, in which a plurality of chip patterns are formed, into a plurality of strip-shaped stripes along a predetermined direction to acquire an optical image of the chip pattern in each of the stripes, performing filtering based on design data of the chip pattern to produce a reference image corresponding to the optical image, comparing the chip pattern using a die-to-database method and comparing a repetitive pattern portion in the chip pattern using a cell method, obtaining at least one of a dimension difference and a dimension ratio between a pattern of the optical image and a pattern of the reference image compared to the pattern of the optical image by the die-to-database method; and obtaining a dimension distribution of the plurality of chip patterns from at least one of the dimension difference and the dimension ratio.

摘要翻译： 一种检查方法，其特征在于，沿着规定的方向，将形成有多个芯片图案的样品实际上分割为多个条状条，从而获得每个条纹中的芯片图案的光学图像， 对所述芯片图案的设计数据进行编码以产生与所述光学图像相对应的参考图像，使用芯片到数据库方法比较所述芯片图案，并使用单元方法比较所述芯片图案中的重复图案部分，获得至少一个 通过模 - 数据库方法与光学图像的图案相比，光学图像的图案和参考图像的图案之间的尺寸差和尺寸比; 以及从所述尺寸差和尺寸比中的至少一个获得所述多个芯片图案的尺寸分布。