公开(公告)号：US09916962B2

公开(公告)日：2018-03-13

申请号：US15466333

申请日：2017-03-22

Applicant: NuFlare Technology, Inc.

Inventor： Shinsuke Nishimura ,  Munehiro Ogasawara ,  Takanao Touya ,  Hirofumi Morita

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492 ,  H01J2237/153

Abstract: A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through a corresponding one of the plural openings; and a plurality of stages of lenses, arranged such that a reduction ratio of multi-beams by at least one lens of a stage before the last stage lens is larger than that of the multi-beams by the last stage lens, to correct distortion of a formed image obtained by forming an image of the aperture array by the multi-beams, and to form the image of the aperture array by the multi-beams at a height position between the last stage lens and a last-but-one stage lens, and at the surface of a target object.