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Patent Agency Ranking
公开(公告)号：US20230242400A1
公开(公告)日：2023-08-03
申请号：US17269006
申请日：2019-01-25
Applicant: OCI COMPANY LTD.
Inventor： Deokyun Kim , Hyejin Kim , Kyungyeol Kim , Yongil Kim
CPC classification number: C01B15/0135 , B01D61/48 , B01D3/145 , B01D61/025 , B01D61/58 , B01D15/08 , B08B3/08 , B01D2313/221 , B01D2313/40 , B01D2317/025 , H01L21/02041
Abstract: The present invention relates to a method for purifying hydrogen peroxide, and more particularly, to a method including purifying a crude product of hydrogen peroxide using a primary purification system, and purifying a primarily purified hydrogen peroxide solution using a secondary purification system. One of the primary purification system and the secondary purification system includes an electrodeionization system, and the other one of the primary purification system and the secondary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof.
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公开(公告)号：US12258268B2
公开(公告)日：2025-03-25
申请号：US17269006
申请日：2019-01-25
Applicant: OCI COMPANY LTD.
Inventor： Deokyun Kim , Hyejin Kim , Kyungyeol Kim , Yongil Kim
IPC: C01B15/013 , B01D3/14 , B01D15/08 , B01D61/02 , B01D61/42 , B01D61/48 , B01D61/58 , B08B3/08 , H01L21/02
Abstract: The present invention relates to a method for purifying hydrogen peroxide, and more particularly, to a method including purifying a crude product of hydrogen peroxide using a primary purification system, and purifying a primarily purified hydrogen peroxide solution using a secondary purification system. One of the primary purification system and the secondary purification system includes an electrodeionization system, and the other one of the primary purification system and the secondary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof.
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公开(公告)号：US20230057388A1
公开(公告)日：2023-02-23
申请号：US17792891
申请日：2021-01-15
Inventor： Younghun Park , Eungchul Kim , Taesung Kim , Sangyup Lee , Kyungyeol Kim , Hwisu Oh
Abstract: The present invention relates to a method for separating and collecting single aggregates from fumed silica, and a method for classifying a shape of the collected single aggregates, and more specifically, includes preparing a slurry in which fumed silica is dispersed in water; aerosolizing the slurry; and collecting single aggregates of the finned silica in the aerosol using the electric field.
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公开(公告)号：US11890621B2
公开(公告)日：2024-02-06
申请号：US17792891
申请日：2021-01-15
Inventor： Younghun Park , Eungchul Kim , Taesung Kim , Sangyup Lee , Kyungyeol Kim , Hwisu Oh
CPC classification number: B03C3/0175 , B03C3/014 , B03C3/45 , B03C2201/32
Abstract: The present invention relates to a method for separating and collecting single aggregates from fumed silica, and a method for classifying a shape of the collected single aggregates, and more specifically, includes preparing a slurry in which fumed silica is dispersed in water; aerosolizing the slurry; and collecting single aggregates of the finned silica in the aerosol using the electric field.
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公开(公告)号：US20230054423A1
公开(公告)日：2023-02-23
申请号：US17792893
申请日：2021-01-15
Inventor： Younghun Park , Eungchul Kim , Taesung Kim , Sangyup Lee , Kyungyeol Kim , Hwisu Oh
IPC: C09K3/14 , C09G1/02 , C01B33/18 , H01L21/762 , H01L21/3105
Abstract: The present invention relates to an abrasive and a planarization method using the same, and more particularly, includes fumed silica. A BET specific surface area of the fumed silica is 200 m2/g to 450 m2/g, a shape of aggregates dispersed in the abrasive has an elongated shape or a round shape, and a ratio of the round shape of the aggregates is 50% to 90%.
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