公开(公告)号：US10374131B2

公开(公告)日：2019-08-06

申请号：US15747728

申请日：2016-08-03

Applicant: OSRAM Opto Semiconductors GmbH

Inventor： Julian Ikonomov ,  Martin Lemberger ,  Bjoern Muermann

IPC: H01L33/40 ,  H01L33/36 ,  H01L33/38 ,  H01L33/42 ,  H01L33/46 ,  H01L33/32

Abstract: The invention relates to an optoelectronic component. The component includes a semiconductor layer sequence having an active layer that is designed to emit electromagnetic radiation during operation of the component, at least one current-spreading layer on a radiation outlet surface of the semiconductor layer sequence, wherein the current-spreading layer is connected to a contact structure in an electrically conductive manner by means of an adhesion layer. The adhesion layer comprises a titanium oxide, wherein in the titanium oxide the oxygen has the oxidation state W0, with W0=−2, and the titanium has the oxidation state WT, with 0

公开(公告)号：US09863033B2

公开(公告)日：2018-01-09

申请号：US15318330

申请日：2015-06-11

Applicant: OSRAM Opto Semiconductors GmbH

Inventor： Martin Lemberger ,  Michael Schmal ,  Julian Ikonomov

IPC: H01L33/46 ,  C23C14/22 ,  C23C14/50 ,  H01L33/38 ,  H01L31/0232 ,  H01L31/0224 ,  H01L33/20 ,  H01L31/0352

CPC classification number: C23C14/225 ,  C23C14/505 ,  H01L31/022408 ,  H01L31/02327 ,  H01L31/035281 ,  H01L33/20 ,  H01L33/38 ,  H01L33/46 ,  H01L2933/0025

Abstract: What is specified is a method for producing a coating comprising the following steps: —providing a material source having a top surface and a main coating direction, —providing a substrate holder having a top surface, —providing at least one base layer, having a coating surface remote from the substrate holder, on the top surface of the substrate, —attaching the substrate holder to a rotating arm, which has a length along a main direction of extent of the rotating arm, —setting the length of the rotating arm in such a manner that a normal angle (φ) throughout the method is at least 30° and at most 75°, —applying at least one coating to that side of the base layer which has the coating surface by means of the material source, wherein—during the coating process with the coating, the substrate holder is rotated about a substrate axis of rotation running along the main direction of extent of the rotating arm.