公开(公告)号：US09081189B2

公开(公告)日：2015-07-14

申请号：US12256055

申请日：2008-10-22

申请人： Osamu Tanitsu

发明人： Osamu Tanitsu

IPC分类号： G03B27/54 ,  G03B27/72 ,  G02B26/08 ,  G02B27/09 ,  G03F7/20

摘要： To optionally forming a multilevel light intensity distribution on an illumination pupil plane, the illumination apparatus implements Köhler illumination on an illumination target surface, using as a light source the light intensity distribution formed on the illumination pupil plane on the basis of light from a light source. The illumination apparatus has a spatial light modulator, a condensing optical system, and a control unit. The spatial light modulator has a plurality of reflecting surfaces which are two-dimensionally arranged and postures of which can be controlled independently of each other. The condensing optical system condenses light from the reflecting surfaces to form a predetermined light intensity distribution on the illumination pupil plane. The control unit controls the number of reflecting surfaces contributing to arriving light, for each of points on the illumination pupil plane forming the light intensity distribution, according to a light intensity distribution to be formed on the illumination pupil plane.

公开(公告)号：US09019474B2

公开(公告)日：2015-04-28

申请号：US13449115

申请日：2012-04-17

申请人： Osamu Tanitsu

发明人： Osamu Tanitsu

IPC分类号： G03B27/54 ,  G03B27/72 ,  G02B27/09 ,  G03F7/20 ,  G02B27/28

摘要： An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.

公开(公告)号：US08913227B2

公开(公告)日：2014-12-16

申请号：US12929944

申请日：2011-02-25

申请人： Osamu Tanitsu

发明人： Osamu Tanitsu

IPC分类号： G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/70108

摘要： According to one embodiment, an illumination optical system configured to illuminate an illumination target surface on the basis of light from a light source comprises a distribution forming optical system and a correction unit. The distribution forming optical system forms a pupil intensity distribution on an illumination pupil of the illumination optical system. The correction unit changes an emission direction of a beam according to an incidence position of the beam, in order to correct the pupil intensity distribution. The correction unit is arranged at or near a position of the illumination pupil, or, arranged at or near a position optically conjugate with the illumination pupil.

摘要翻译： 根据一个实施例，被配置为基于来自光源的光来照射照明目标表面的照明光学系统包括分布形成光学系统和校正单元。 分布形成光学系统在照明光学系统的照明光瞳上形成光瞳强度分布。 校正单元根据光束的入射位置改变光束的发射方向，以便校正光瞳强度分布。 校正单元布置在照明光瞳的位置处或附近，或者布置在与照明瞳孔光学共轭的位置处或附近。

公开(公告)号：US20100245796A1

公开(公告)日：2010-09-30

申请号：US12797680

申请日：2010-06-10

申请人： Osamu Tanitsu

发明人： Osamu Tanitsu

IPC分类号： G03F7/20 ,  G02B27/12 ,  G02B5/30 ,  G03B27/54 ,  G03B27/72

CPC分类号： G02B27/10 ,  G02B3/0062 ,  G02B3/0068 ,  G03F7/70075 ,  G03F7/70108

摘要： An optical integrator is able to keep down a light-quantity loss in modified illumination with an illumination optical apparatus. An optical integrator of a wavefront division type according to the present invention has a plurality of refracting surface regions which refract incident light, and a plurality of deflecting surface regions provided corresponding to the plurality of refracting surface regions and adapted for changing a traveling direction of the incident light. The plurality of refracting surface regions include a plurality of first refracting surface regions includes an arcuate contour with the center projecting in a first direction, and a plurality of second refracting surface regions includes an arcuate contour with the center projecting in a second direction.

摘要翻译： 光学积分器能够通过照明光学装置降低改进照明中的光量损失。 根据本发明的波前分割型的光学积分器具有折射入射光的多个折射表面区域和对应于多个折射表面区域设置的多个偏转表面区域，并且适于改变该入射光的行进方向 入射光。 多个折射表面区域包括多个第一折射表面区域，包括具有中心沿第一方向突出的弧形轮廓，并且多个第二折射表面区域包括中心沿第二方向突出的弓形轮廓。

公开(公告)号：US07515247B2

公开(公告)日：2009-04-07

申请号：US11979516

申请日：2007-11-05

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US20060181690A1

公开(公告)日：2006-08-17

申请号：US11403922

申请日：2006-04-14

申请人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

发明人： Hisashi Nishinaga ,  Ikuo Hikima ,  Mitsunori Toyoda ,  Masahiro Nakagawa ,  Tsuneyuki Hagiwara ,  Yasushi Mizuno ,  Naonori Kita ,  Osamu Tanitsu ,  Nozomu Emura

IPC分类号： G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/706 ,  G03F7/7085

摘要： A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

公开(公告)号：US20060171138A1

公开(公告)日：2006-08-03

申请号：US10565412

申请日：2004-06-29

申请人： Kenichi Muramatsu ,  Norio Komine ,  Osamu Tanitsu ,  Hirohisa Tanaka

发明人： Kenichi Muramatsu ,  Norio Komine ,  Osamu Tanitsu ,  Hirohisa Tanaka

IPC分类号： G01D11/28

CPC分类号： G03F7/70566

摘要： An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed. A phase advancing axis direction in association with the double refraction variation of a light transmitting member formed of fluorite is so set as to almost agree with or cross almost perpendicularly to the field vibration direction of a linearly polarized light incident to a light transmitting member.

摘要翻译： 一种照明光学系统，其能够防止通过由诸如萤石的立方晶系晶体材料形成的透光构件的线偏振光的偏振状态的变化。 一种照明光学系统，包括用于提供线性偏振光以照射要被来自光源单元的光照射的表面（M，W）的光源单元（1）。 该系统设置有偏光状态切换装置（10,20），该偏振状态切换装置设置在光源单元和被照射表面之间的光路上，用于将照亮被照射的表面的光的偏振状态 线性极化状态和非线性极化状态。 极化状态切换装置具有用于根据需要改变入射的线偏振光的偏振面的相位构件（10）和根据需要对入射的线偏振光进行去偏振的消偏振器（20）。 与萤石形成的透光构件的双折射变化相关的相位推进轴方向设定为几乎与入射到透光构件的线偏振光的场振动方向一致或几乎垂直。

公开(公告)号：US20060055834A1

公开(公告)日：2006-03-16

申请号：US11140103

申请日：2005-05-31

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G02F1/1335

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US06597430B1

公开(公告)日：2003-07-22

申请号：US09979042

申请日：2001-12-31

申请人： Kenji Nishi ,  Osamu Tanitsu ,  Kyoji Nakamura

发明人： Kenji Nishi ,  Osamu Tanitsu ,  Kyoji Nakamura

IPC分类号： G03B2742

CPC分类号： G03F7/70583

摘要： An exposure method is provided, in which a speckle pattern (interference fringe) formed on a pattern of a transfer objective can be reduced without complicating an illumination optical system so much, without increasing the size of the illumination optical system so much, and without prolonging the exposure time, even when an exposure light beam having high coherence is used. A laser beam (LB) as an exposure light beam from an exposure light source (9) is introduced into a ring-shaped delay optical system (22), for example, via a modified illumination mechanism (19) and a light-collecting lens (21). A plurality of light fluxes, which have passed through the interior of the delay optical system (22) a variety of numbers of times depending on angular apertures in accordance with internal reflection, are superimposed and extracted as a laser beam (LB3). The laser beam (LB3) illuminates a reticle (R), for example, via a fly's eye lens (25) and a condenser lens (7).

摘要翻译： 提供了一种曝光方法，其中可以在不使照明光学系统复杂化的情况下减少形成在转印物体的图案上的散斑图案（干涉条纹），而不会增加照明光学系统的尺寸，并且不延长 曝光时间，即使使用具有高相干性的曝光光束。 作为来自曝光光源（9）的曝光光束的激光束（LB）被引入到环形延迟光学系统（22）中，例如经由改进的照明机构（19）和聚光透镜 （21）。 通过根据内部反射而穿过延迟光学系统（22）的内部多个次数的多个光束被叠加并提取为激光束（LB3）。 激光束（LB3）例如通过蝇眼透镜（25）和聚光透镜（7）照射掩模版（R）。

公开(公告)号：US5581605A

公开(公告)日：1996-12-03

申请号：US399683

申请日：1995-03-07

申请人： Katsuhiko Murakami ,  Kiyoto Mashima ,  Takashi Mori ,  Osamu Tanitsu

发明人： Katsuhiko Murakami ,  Kiyoto Mashima ,  Takashi Mori ,  Osamu Tanitsu

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00

CPC分类号： G02B3/0056 ,  B82Y10/00 ,  G02B3/0012 ,  G02B3/0025 ,  G02B3/005 ,  G03F7/70075 ,  G03F7/702 ,  G03F7/70233 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

摘要： An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.

摘要翻译： 根据本发明的用于X射线反射的光学元件设置有多个细小的凸面或规则地布置在基底上的凹面。 反射X射线的多层膜形成在凸面或凹面上。 凸面或凹面的形状使得当X射线进入每个凹面或凸面时，它们被多层薄膜以一定的发散角度反射，结果是多个二次X射线源具有 发散角形成在与凹面或凸面相隔一定距离的同一平面上。 由此，形成多个次级X射线源，能够在广泛的区域内均匀地照射X射线。