HIGH REGISTRATION PARTICLES-TRANSFERRING SYSTEM

    公开(公告)号:US20200173026A1

    公开(公告)日:2020-06-04

    申请号:US16781813

    申请日:2020-02-04

    IPC分类号: C23C16/50 H01L23/00 H01L21/67

    摘要: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

    High registration particles-transferring system

    公开(公告)号:US10604843B2

    公开(公告)日:2020-03-31

    申请号:US15591959

    申请日:2017-05-10

    IPC分类号: C23C16/50 H01L23/00 H01L21/67

    摘要: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.