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    Controlled-grain-precious metal sputter targets
    5.
    发明授权
    Controlled-grain-precious metal sputter targets 有权
    受控颗粒贵金属溅射靶

    公开(公告)号：US07740723B2

    公开(公告)日：2010-06-22

    申请号：US11804082

    申请日：2007-05-17

    申请人： Andrew C. Perry ,  Paul S. Gilman ,  Wendell Stuber ,  Binu Mathew

    发明人： Andrew C. Perry ,  Paul S. Gilman ,  Wendell Stuber ,  Binu Mathew

    IPC分类号： C22F1/16

    CPC分类号： C22C5/04 ,  C22F1/14 ,  C23C14/3414

    摘要： A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance for silver an gold sputter targets.

    摘要翻译： 贵金属溅射靶具有选自铂，钯，铑，铱，钌，锇及其单相合金的组成。 溅射靶的晶粒结构至少约99％重结晶，并且具有小于约200μm的晶粒尺寸以改善溅射均匀性。 用于制造这些溅射靶的低温方法对于提高银溅射靶的溅射性能也是有效的。

    Controlled-grain-precious metal sputter targets
    6.
    发明授权
    Controlled-grain-precious metal sputter targets 有权
    受控颗粒贵金属溅射靶

    公开(公告)号：US07235143B2

    公开(公告)日：2007-06-26

    申请号：US10214671

    申请日：2002-08-08

    申请人： Andrew C. Perry ,  Paul S. Gilman ,  Wendell Stuber ,  Binu Mathew

    发明人： Andrew C. Perry ,  Paul S. Gilman ,  Wendell Stuber ,  Binu Mathew

    IPC分类号： C22C5/04

    CPC分类号： C22C5/04 ,  C22F1/14 ,  C23C14/3414

    摘要： A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance for silver and gold sputter targets.

    摘要翻译： 贵金属溅射靶具有选自铂，钯，铑，铱，钌，锇及其单相合金的组成。 溅射靶的晶粒结构至少约99％重结晶，并且具有小于约200μm的粒度以改善溅射均匀性。 用于制造这些溅射靶的低温方法对于改善银和金溅射靶的溅射性能也是有效的。

    Switching video streams for a display without a visible interruption
    7.
    发明授权
    Switching video streams for a display without a visible interruption 有权
    切换显示器的视频流，而不会有明显的中断

    公开(公告)号：US08730251B2

    公开(公告)日：2014-05-20

    申请号：US12795468

    申请日：2010-06-07

    申请人： Binu Mathew ,  William C. Athas ,  Nils E. Mattisson

    发明人： Binu Mathew ,  William C. Athas ,  Nils E. Mattisson

    IPC分类号： G09G5/39 ,  G09G5/399 ,  G09G5/36

    CPC分类号： G09G5/399 ,  G09G5/395

    摘要： The disclosed embodiments provide a system that facilitates driving a display in a computer system. During operation, the system receives an input video stream from a graphics source. The system directs the input video stream through a front memory buffer and a back memory buffer to produce an output video stream. While directing the input video stream through the set of memory buffers, the system writes a video frame from the input video stream into the back buffer, and concurrently drives the output video stream from a preceding video frame in the front buffer. When the writing of the video frame completes, the system switches buffers so that the back buffer becomes the front buffer, which drives the output video stream, and the front buffer becomes either a spare buffer or the back buffer, which receives a subsequent frame from the input video stream.

    摘要翻译： 所公开的实施例提供了有助于驱动计算机系统中的显示器的系统。 在操作期间，系统从图形源接收输入视频流。 系统通过前置存储器缓冲器和后置存储器缓冲器来引导输入视频流以产生输出视频流。 在将输入视频流引导通过该组存储器缓冲器的同时，系统将视频帧从输入视频流写入后缓冲器，同时从前缓冲器中的前一视频帧驱动输出视频流。 当视频帧的写入完成时，系统切换缓冲器，使得后缓冲器变为前缓冲器，其驱动输出视频流，并且前缓冲器变为备用缓冲器或后缓冲器，后缓冲器从后缓冲器接收后续帧 输入视频流。

    SWITCHING VIDEO STREAMS FOR A DISPLAY WITHOUT A VISIBLE INTERRUPTION
    8.
    发明申请
    SWITCHING VIDEO STREAMS FOR A DISPLAY WITHOUT A VISIBLE INTERRUPTION 有权
    切换视频流，无显示中断

    公开(公告)号：US20110298814A1

    公开(公告)日：2011-12-08

    申请号：US12795468

    申请日：2010-06-07

    申请人： Binu Mathew ,  William C. Athas ,  Nils E. Mattisson

    发明人： Binu Mathew ,  William C. Athas ,  Nils E. Mattisson

    IPC分类号： G09G5/399 ,  G09G5/39

    CPC分类号： G09G5/399 ,  G09G5/395

    摘要： The disclosed embodiments provide a system that facilitates driving a display in a computer system. During operation, the system receives an input video stream from a graphics source, wherein the input video stream comprises a sequence of video frames. Next, the system directs the input video stream through a set of two or more memory buffers including a front buffer and a back buffer to produce an output video stream, which is used to drive the display. While directing the input video stream through the set of memory buffers, the system writes a video frame from the input video stream into the back buffer, and concurrently drives the output video stream from a preceding video frame in the front buffer. When the writing of the video frame completes, the system switches buffers so that the back buffer becomes the front buffer, which drives the output video stream, and the front buffer becomes either a spare buffer or the back buffer, which receives a subsequent frame from the input video stream.

    摘要翻译： 所公开的实施例提供了有助于驱动计算机系统中的显示器的系统。 在操作期间，系统从图形源接收输入视频流，其中输入视频流包括一系列视频帧。 接下来，系统通过一组包括前缓冲器和后缓冲器的两个或多个存储器缓冲器来引导输入视频流，以产生用于驱动显示器的输出视频流。 在将输入视频流引导通过该组存储器缓冲器的同时，系统将视频帧从输入视频流写入后缓冲器，同时从前缓冲器中的前一视频帧驱动输出视频流。 当视频帧的写入完成时，系统切换缓冲器，使得后缓冲器变为前缓冲器，其驱动输出视频流，并且前缓冲器变为备用缓冲器或后缓冲器，后缓冲器从后缓冲器接收后续帧 输入视频流。

    Controlled-grain-precious metal sputter targets
    9.
    发明申请
    Controlled-grain-precious metal sputter targets 有权
    受控颗粒贵金属溅射靶

    公开(公告)号：US20080017282A1

    公开(公告)日：2008-01-24

    申请号：US11804082

    申请日：2007-05-17

    申请人： Andrew Perry ,  Paul Gilman ,  Wendell Stuber ,  Binu Mathew

    发明人： Andrew Perry ,  Paul Gilman ,  Wendell Stuber ,  Binu Mathew

    IPC分类号： C22F1/16

    CPC分类号： C22C5/04 ,  C22F1/14 ,  C23C14/3414

    摘要： A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance-for silver an gold sputter targets.

    摘要翻译： 贵金属溅射靶具有选自铂，钯，铑，铱，钌，锇及其单相合金的组成。 溅射靶的晶粒结构至少约99％重结晶，并且具有小于约200μm的粒度以改善溅射均匀性。 用于制造这些溅射靶的低温方法对于提高溅射性能也是有效的 - 对于银金溅射靶。