公开(公告)号：US6130433A

公开(公告)日：2000-10-10

申请号：US303598

申请日：1999-05-03

申请人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Chih-Hsien Chang

发明人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Chih-Hsien Chang

IPC分类号： H01J37/00 ,  H01J37/317

CPC分类号： H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/1825 ,  H01J2237/31701

摘要： The present invention relates to an ion source chamber of a high energy implanter. The ion source chamber comprises a main chamber for generating ions for ion implantation, a vent-pipe having two open ends, one end of the vent-pipe being connected to the main chamber for releasing air from the main chamber, a releasing valve connected to another end of the vent-pipe for releasing the air in the main chamber when the pressure of the air in the main chamber exceeds a predetermined pressure, and a filtering device installed between the vent-pipe and the releasing valve for filtering impurities contained in the air carried by the vent-pipe so as to prevent the impurities from falling into the releasing valve.

摘要翻译： 本发明涉及高能注入机的离子源室。 离子源室包括用于产生用于离子注入的离子的主室，具有两个开放端的排气管，排气管的一端连接到主室，用于从主室释放空气，释放阀连接到 当主室中的空气的压力超过预定压力时，用于释放主室中的空气的排气管的另一端;以及安装在通气管和释放阀之间的过滤装置，用于过滤包含在主室中的杂质 由排气管携带的空气，以防止杂质落入释放阀。

公开(公告)号：US6019664A

公开(公告)日：2000-02-01

申请号：US281944

申请日：1999-03-31

申请人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

发明人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

IPC分类号： G01B5/06 ,  B24B49/00

CPC分类号： G01B5/06

摘要： A height gauge device for wafer, which is mounted under a cooling water pipe of a back-grinding machine; the device comprises a height gauge box, a measuring rod, a L-shaped linking rod and a resilient member; a signal sensor is mounted inside the height gauge box for measuring the height of a wafer; both ends of the measuring rod are connected with the signal sensor and the L-shaped linking rod respectively; the L-shaped linking rod is mounted with a probing needle; the resilient member is mounted between the L-shaped linking and the cooling water pipe; in height gauging operation, the probing needle on the L-shaped linking needle should be raised first so as to put a wafer under the probing needle, and to have the probing needle pressed against the wafer by means of the resilient force of the resilient member; consequently, the resilient member is subject to elastic fatigue or break; the resilient member of the height gauge device can be replaced directly without opening the height box so as to save time and maintenance cost.

摘要翻译： 一种用于晶片的高度计装置，安装在背磨机的冷却水管下; 该装置包括高度计箱，测量杆，L形连杆和弹性构件; 信号传感器安装在高度计盒内部，用于测量晶片的高度; 测量杆的两端分别与信号传感器和L形连杆相连; L型连杆安装有探针; 弹性件安装在L形连接件和冷却水管之间; 在高度测量操作中，应首先抬起L形连接针上的探针，以将晶片放置在探针下方，并使探针通过弹性构件的弹力将其推压到晶片上 ; 因此，弹性构件遭受弹性疲劳或断裂; 可以直接更换高度计装置的弹性构件而不打开高度盒，以节省时间和维护成本。

公开(公告)号：US06291827B1

公开(公告)日：2001-09-18

申请号：US09276865

申请日：1999-03-26

申请人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Fu-Chih Huang

发明人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Dong-Tay Tsai ,  Fu-Chih Huang

IPC分类号： H01J37317

CPC分类号： H01J37/3171 ,  H01J2237/08

摘要： A novel insulating apparatus for a conductive line is disclosed. The proposed insulating apparatus can be applied to various conductive lines with different shapes. The problem of short circuit can be solved by the present insulating apparatus with the novel connecting configuration. The present invention comprises a plurality of insulator rings worn on the conductive line in series, wherein the insulator rings are annular cylinders. Each of the annular cylinders has an outer diameter larger than the inner diameter of the ones next to it. In addition, each of the annular cylinders has a length sized according to the desired flexibility of the conductive line.

摘要翻译： 公开了一种用于导线的新型绝缘装置。 所提出的绝缘装置可以应用于具有不同形状的各种导线。 本发明的绝缘装置具有新颖的连接结构，可以解决短路问题。 本发明包括串联在导线上的多个绝缘体环，其中绝缘环是环形圆筒。 每个环形圆柱体的外径大于其旁边的内径。 此外，每个环形圆柱体具有根据导电线的期望的柔性来定尺寸的长度。

公开(公告)号：US06568988B1

公开(公告)日：2003-05-27

申请号：US09628138

申请日：2000-07-28

申请人： Yi-Hua Chin ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

发明人： Yi-Hua Chin ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Dong-Tay Tsai

IPC分类号： B24B4900

CPC分类号： B24B49/10 ,  B24B27/0023 ,  B24B37/04

摘要： A chemical mechanical polishing apparatus has a plurality of electric machines for executing mechanical polishing motions, at least two control systems for controlling the mechanical polishing motions, at least two signal wires connected with the two control systems for transmitting signals of the two control systems, and a wave filter comprising two terminals connected with the two signal wires respectively for filtering out the signal whose voltage exceeds a predetermined value in the two signal wires.

摘要翻译： 化学机械抛光装置具有用于执行机械抛光运动的多个电机，用于控制机械抛光运动的至少两个控制系统，与两个控制系统连接的用于传送两个控制系统的信号的至少两个信号线，以及 一个滤波器，包括分别与两条信号线连接的两个端子，用于滤除两条信号线中电压超过预定值的信号。

公开(公告)号：US06299218B1

公开(公告)日：2001-10-09

申请号：US09262065

申请日：1999-03-04

申请人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

发明人： Pei-Wei Tsai ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

IPC分类号： F16L2700

CPC分类号： H01L21/67017 ,  F16L27/02

摘要： A structure for connecting fluid channel of fluid delivery system is disclosed. This connecting structure limits the length of the flow-guiding pipe extending into the delivery channel, to reduce particle contaminates and the probability of crack. The present pipe union connecting structure comprises a first pipe, a second pipe mounted to the first pipe, and an inner pipe extending from the first pipe into the second pipe with a certain extending length. The extending length of the inner pipe is less than the proportion of the minimum distance between the inner wall of the second pipe and the outlet of the inner pipe when standstill, to the tangent value of a certain angle &thgr;, which is the maximum inclined angle between the second pipe and the inner pipe.

摘要翻译： 公开了一种用于连接流体输送系统的流体通道的结构。 这种连接结构限制了延伸到输送通道中的导流管的长度，以减少颗粒污染和裂纹的可能性。 本管接头连接结构包括第一管，安装到第一管的第二管和从第一管延伸到具有一定延伸长度的第二管中的内管。 内管的延伸长度小于当静止时第二管的内壁和内管的出口之间的最小距离与一定角度θ（其是最大倾斜角度）的切线值的比例 在第二管和内管之间。

公开(公告)号：US5892232A

公开(公告)日：1999-04-06

申请号：US735981

申请日：1996-10-25

申请人： Pei-Wei Tsai ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Min-Huei Lin

发明人： Pei-Wei Tsai ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Min-Huei Lin

IPC分类号： H01J27/08 ,  H01J27/00

CPC分类号： H01J27/08

摘要： An arc chamber including a reaction chamber, a filament element used to generate electrons, a first power supply means set for providing power to the filament element, a second power supply means utilized for creating a potential to increase the ionization efficiency, a plurality of gas injected openings set to inject suitable gas into the reaction chamber and be ionized in a gaseous plasma by impact from electrons, a first filament insulator, and three second filament insulators used for isolation. The first filament insulator includes a truncated corn portion and a ring portion. The truncated corn portion has a hole formed threrethrough itself. The ring portion is coaxially connected to the smaller surface of the truncated corn portion. The second filament insulator includes a truncated corn portion and two ring portions. Similarily, the truncated corn portion has a hole through formed therethrough. The ring portions are respectively coaxially connected to the two surfaces of the truncated corn portion. In the preferred embodiment, three first filament insulators and one second filament insulator are set on the filament element for isolation. The filament insulators are screwed into the filament element and exactly attached on the side wall of the reaction chamber.

摘要翻译： 包括反应室，用于产生电子的灯丝元件的电弧室，用于向灯丝元件供电的第一电源装置，用于产生提高电离效率的电位的第二电源装置，多个气体 注入的开口设置成将合适的气体注入反应室，并通过来自电子的冲击，第一细丝绝缘体和用于隔离的三个第二长丝绝缘体在气态等离子体中离子化。 第一长丝绝缘体包括截顶玉米部分和环部分。 截断的玉米部分具有自身形成的孔。 环部分同轴连接到截顶玉米部分的较小表面。 第二长丝绝缘体包括截顶玉米部分和两个环部分。 类似地，截头玉米部分具有通过其形成的孔。 环部分别同轴地连接到截顶玉米部分的两个表面。 在优选实施例中，将三个第一灯丝绝缘体和一个第二灯丝绝缘体设置在灯丝元件上用于隔离。 灯丝绝缘子拧入灯丝元件并精确地附着在反应室的侧壁上。

公开(公告)号：US5942041A

公开(公告)日：1999-08-24

申请号：US714217

申请日：1996-09-16

申请人： Yung-Tsun Lo ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Pei-Wei Tsai

发明人： Yung-Tsun Lo ,  Tzu-Hsin Huang ,  Hua-Jen Tseng ,  Pei-Wei Tsai

IPC分类号： C23C14/50 ,  C23C16/458 ,  H01L21/687 ,  C23C16/00

CPC分类号： H01L21/68721 ,  C23C14/50 ,  C23C16/4585 ,  H01L21/68757

摘要： A clamp used in clamping semi-conductor wafers during processing operations permits ready release of the wafer and avoids adherence of the clamp to materials deposited onto the wafer which otherwise tend to stick the wafer to the clamp. Adhesion of the deposited materials to the clamp is avoided by providing the clamping surfaces of the clamp with a minimum surface roughness achieved by machining, grinding, etching or other techniques.

摘要翻译： 在处理操作期间用于夹紧半导体晶片的夹具允许晶片的准备释放，并避免夹具粘附到沉积到晶片上的材料，否则倾向于将晶片粘贴到夹具上。 通过提供具有通过机械加工，研磨，蚀刻或其它技术实现的最小表面粗糙度的夹具的夹紧表面来避免将沉积的材料粘合到夹具上。

公开(公告)号：US06386213B1

公开(公告)日：2002-05-14

申请号：US09479535

申请日：2000-01-07

申请人： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Yu-Hua Yeh

发明人： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Yu-Hua Yeh

IPC分类号： B08B304

CPC分类号： H01L21/67057 ,  H01L21/67028 ,  H01L21/68 ,  Y10S134/902

摘要： A plate-tilting apparatus adapted to be used in a semiconductor-manufacturing process is disclosed. The plate-tilting apparatus is used for preventing thin wafers from being collected in a cassette contacted with each other after the thin wafers are taken out of a solution. It includes a plate having the container locked thereon and having a first edge pivotally connected to a basal plane of a tank used in the semiconductor-manufacturing process, and a plate-lifting device connected to a second edge of the plate opposite to the first edge for lifting the second edge of the plate, so that the plate can be tilted at a specific angle.

摘要翻译： 公开了一种适用于半导体制造工艺的平板倾斜装置。 平板倾斜装置用于在将薄晶片从溶液中取出之后防止薄晶片收集在彼此接触的盒中。 它包括具有锁定在其上的容器的板，并且具有可枢转地连接到在半导体制造工艺中使用的罐的基面的第一边缘，以及连接到板的与第一边缘相对的第二边缘的升降装置 用于提升板的第二边缘，使得板可以以特定的角度倾斜。

公开(公告)号：US20050092721A1

公开(公告)日：2005-05-05

申请号：US10976620

申请日：2004-10-29

申请人： Cheng-Min Pan ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Sheng-Feng Hung

发明人： Cheng-Min Pan ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Sheng-Feng Hung

IPC分类号： B26D7/00 ,  B23K26/38

CPC分类号： B26D7/0006 ,  H01J2237/31701 ,  Y10T29/49002 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49135 ,  Y10T82/10 ,  Y10T82/2502 ,  Y10T83/875

摘要： The present invention provides a method and a set of trimming accessories for trimming rubber plate used in an ion implanter. The rubber plate is suitable for use in an ion implanter, wherein the ion implanter has a platform with multiple primary holes and multiple primary notches. In specific embodiments, the set of trimming accessories includes trimming equipment such as a knife or preferably a laser; a template with secondary holes corresponding to primary holes and secondary notches corresponding to primary notches. The template is used as a guide to form a plurality of tertiary holes in the rubber plate corresponding to the plurality of secondary holes of the template and to form a plurality of tertiary notches in the rubber plate corresponding to the plurality of secondary notches of the template. The trimmed rubber plate can then be placed on the platform so that the tertiary holes of the rubber plate match the primary holes of the platform and the tertiary notches of the rubber plate match the primary notches of the platform.

摘要翻译： 本发明提供了用于离子注入机中使用的修整橡胶板的修整配件的方法和一套。 橡胶板适用于离子注入机，其中离子注入机具有具有多个主孔和多个初级凹口的平台。 在具体实施例中，该组修剪配件包括修剪设备，例如刀或优选地是激光; 具有对应于主孔的次级孔和对应于初级凹口的次级凹口的模板。 该模板用作在对应于模板的多个次级孔的橡胶板中形成多个第三孔的指导，并且在对应于模板的多个次级凹口的橡胶板中形成多个第三缺口 。 然后将修剪后的橡胶板放置在平台上，使得橡胶板的第三孔与平台的主孔匹配，橡胶板的第三凹口与平台的主槽相匹配。

公开(公告)号：US06386139B1

公开(公告)日：2002-05-14

申请号：US09390319

申请日：1999-09-07

申请人： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

发明人： Sheng-Feng Hung ,  Hua-Jen Tseng ,  Chun-Chieh Lee ,  Gwo-Yuh Yang

IPC分类号： C23C1600

CPC分类号： C23C14/50 ,  C23C14/56

摘要： A wafer load/unload apparatus used to load/unload the wafer into/from the clamp ring for performing the E-Gun evaporation process is disclosed. The apparatus comprises a base, a central cylinder and a plurality of peripheral cylinders. The base has an even upper surface, and the central cylinder and the plurality of the peripheral cylinders are connected to the upper surface of the base respectively, wherein the plurality of the peripheral cylinders are located around the central cylinders. A recessed trench penetrating through sidewalls of the central cylinder is formed on a top surface of the central cylinder. The central cylinder can penetrate through a clamp ring, wherein the clamp ring is used to load a wafer for performing the E-Gun evaporating process. The spacing distances between the plurality of peripheral cylinders and the central cylinder are bigger than the width of the clamp ring. The plurality of peripheral cylinders are used to prevent the wafer which is placed on the top surface of the central cylinder from falling down.

摘要翻译： 公开了一种用于将晶片装入/卸载夹持环的晶片装载/卸载装置，用于执行E-Gun蒸发过程。 该装置包括基座，中心圆筒和多个周边圆筒。 基座具有均匀的上表面，并且中心圆筒和多个周边圆筒分别连接到基座的上表面，其中多个周边圆柱体位于中心圆筒周围。 穿过中心圆筒的侧壁的凹槽形成在中心圆柱体的顶表面上。 中心圆筒可以穿过夹紧环，其中夹紧环用于加载用于执行电子枪蒸发过程的晶片。 多个周边圆筒和中心圆筒之间的间隔距离大于夹紧环的宽度。 多个周边圆筒用于防止放置在中心圆柱顶表面上的晶片掉落。