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公开(公告)号:US07838062B2
公开(公告)日:2010-11-23
申请号:US11807567
申请日:2007-05-29
IPC分类号: B05D1/32
CPC分类号: H01L31/022425 , H01L21/0337 , H01L21/31144 , H01L21/76802 , H01L31/022441 , H01L31/0682 , Y02E10/547
摘要: Fabrication of a solar cell using a printed contact mask. The contact mask may include dots formed by inkjet printing. The dots may be formed in openings between dielectric layers (e.g., polyimide). Intersections of overlapping dots may form gaps that define contact regions. The spacing of the gaps may be dictated by the alignment of nozzles that dispense the dots. Using the dots as a contact mask, an underlying dielectric layer may be etched to form the contact regions through the underlying dielectric layer. Metal contact fingers may be formed over the wafer to form electrical connections to corresponding diffusion regions through the contact regions.
摘要翻译: 使用印刷接触掩模制造太阳能电池。 接触掩模可以包括通过喷墨印刷形成的点。 点可以形成在电介质层(例如,聚酰亚胺)之间的开口中。 重叠点的交点可形成限定接触区域的间隙。 间隙的间距可以由分配点的喷嘴的对准来决定。 使用点作为接触掩模,可以蚀刻下面的介电层以形成通过下面的介电层的接触区域。 金属接触指可以形成在晶片之上,以形成通过接触区域的相应扩散区域的电连接。
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公开(公告)号:US08883247B2
公开(公告)日:2014-11-11
申请号:US12949523
申请日:2010-11-18
IPC分类号: B05D7/00 , H01L31/0224 , H01L21/768 , H01L31/068 , H01L21/033 , H01L21/311
CPC分类号: H01L31/022425 , H01L21/0337 , H01L21/31144 , H01L21/76802 , H01L31/022441 , H01L31/0682 , Y02E10/547
摘要: Fabrication of a solar cell using a printed contact mask. The contact mask may include dots formed by inkjet printing. The dots may be formed in openings between dielectric layers (e.g., polyimide). Intersections of overlapping dots may form gaps that define contact regions. The spacing of the gaps may be dictated by the alignment of nozzles that dispense the dots. Using the dots as a contact mask, an underlying dielectric layer may be etched to form the contact regions through the underlying dielectric layer. Metal contact fingers may be formed over the wafer to form electrical connections to corresponding diffusion regions through the contact regions.
摘要翻译: 使用印刷接触掩模制造太阳能电池。 接触掩模可以包括通过喷墨印刷形成的点。 点可以形成在电介质层(例如,聚酰亚胺)之间的开口中。 重叠点的交点可形成限定接触区域的间隙。 间隙的间距可以由分配点的喷嘴的对准来决定。 使用点作为接触掩模,可以蚀刻下面的介电层以形成通过下面的介电层的接触区域。 金属接触指可以形成在晶片之上,以形成通过接触区域的相应扩散区域的电连接。
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公开(公告)号:US20080299297A1
公开(公告)日:2008-12-04
申请号:US11807567
申请日:2007-05-29
IPC分类号: B05D5/12
CPC分类号: H01L31/022425 , H01L21/0337 , H01L21/31144 , H01L21/76802 , H01L31/022441 , H01L31/0682 , Y02E10/547
摘要: Fabrication of a solar cell using a printed contact mask. The contact mask may include dots formed by inkjet printing. The dots may be formed in openings between dielectric layers (e.g., polyimide). Intersections of overlapping dots may form gaps that define contact regions. The spacing of the gaps may be dictated by the alignment of nozzles that dispense the dots. Using the dots as a contact mask, an underlying dielectric layer may be etched to form the contact regions through the underlying dielectric layer. Metal contact fingers may be formed over the wafer to form electrical connections to corresponding diffusion regions through the contact regions.
摘要翻译: 使用印刷接触掩模制造太阳能电池。 接触掩模可以包括通过喷墨印刷形成的点。 点可以形成在电介质层(例如,聚酰亚胺)之间的开口中。 重叠点的交点可形成限定接触区域的间隙。 间隙的间距可以由分配点的喷嘴的对准来决定。 使用点作为接触掩模,可以蚀刻下面的介电层以形成通过下面的介电层的接触区域。 金属接触指可以形成在晶片之上,以形成通过接触区域的相应扩散区域的电连接。
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