摘要:
Disclosed is a device for performing radiation assisted chemical processing including a fluid path, defined at least in part by a first surface of a wall transparent to radiation useful for performing radiation assisted chemical processing, and a gas discharge or plasma chamber arranged for producing the radiation, wherein the chamber is defined at least in part by a second surface of the transparent wall, opposite the first A related method of forming a photocatalytic reactor comprises among other steps the step of wash-coating the fluid path so as to deposit a photocatalytic material therein, wherein the step of wash-coating includes depositing, and not depositing or removing photocatalytic mateπal, respectively, on a first portion or from a second portion of the of non-circular cross section of the path, the second portion including at least some of the first surface of the wall of transparent material
摘要:
An essentially nonporous honeycomb substrate having greater than 900 cells per square inch and with a catalyst coating having a thickness less than 1 micron. The coated essentially nonporous honeycomb may be used, for example, for gas phase reactions.
摘要:
A microreaction device or system (4) includes at least one thermal control fluidic passage (C,E) and a principal working fluidic passage (A) with average cross-sectional area in the range of 0.25 to 100 mm2, and having a primary entrance (92) and multiple secondary entrances (94) with the spacing between secondary entrances (94) having a length along the passage (A) of at least two times the root of the average cross-sectional area of the passage (A). The device or system (4) also includes at least one secondary working fluidic passage (B) having an entrance (102) and multiple exits (106) including a final exit (106), each exit (106) being in fluid communication with a corresponding one of the multiple secondary entrances (94) of the principal fluidic passage (A).