公开(公告)号：US20160209641A1

公开(公告)日：2016-07-21

申请号：US14599047

申请日：2015-01-16

Applicant: Pixtronix, Inc.

Inventor： Michael Andrew Gingras ,  Javier Villarreal ,  Mark Bradford Andersson ,  Joyce Wu ,  Hung-Chien Lin ,  Chin-Yuan Ho

IPC: G02B26/02 ,  G09G3/34

CPC classification number: G02B26/02 ,  G02B26/023 ,  G09G3/3433 ,  H01L2924/0002 ,  H01L2924/00

Abstract: This disclosure provides systems, methods and apparatus for reducing capacitance between interconnects in a display apparatus. In one aspect, a display apparatus can include a plurality of light modulators each having a shutter suspended over a substrate. A first suspended interconnect can electrically couple a first light modulator and a second light modulator. A majority of the length of the first suspended interconnect can be suspended a first height above the substrate. A second suspended interconnect can electrically couple the first light modulator and a third light modulator. A majority of the length of the second suspended interconnect can be above the substrate at a different height than the first suspended interconnect.

Abstract translation: 本公开提供了用于降低显示装置中的互连之间的电容的系统，方法和装置。 一方面，显示装置可以包括多个光调制器，每个光调制器具有悬挂在基板上的快门。 第一悬挂互连可以电耦合第一光调制器和第二光调制器。 第一悬挂互连的长度的大部分可以悬挂在衬底上方的第一高度。 第二悬挂互连可以电耦合第一光调制器和第三光调制器。 第二悬浮互连的大部分长度可以在与第一悬挂互连不同的高度的基板之上。

公开(公告)号：US20170092205A1

公开(公告)日：2017-03-30

申请号：US14864409

申请日：2015-09-24

Applicant: Pixtronix, Inc.

Inventor： Chin-Yuan Ho ,  Javier Villarreal ,  Hung-Chien Lin

IPC: G09G3/34

CPC classification number: G02B26/023

Abstract: This disclosure provides systems, methods, and apparatus for providing protective coatings on electromechanical systems (EMS) devices. A display apparatus can include an electrostatic actuation assembly for controlling the position of a suspended portion of a display element. The electrostatic actuation assembly can include a load beam, drive beam, and a coating disposed over a portion of the drive beam. The coating can include a plurality of raised tabs spaced apart from each other. One or both of the size of the raised tabs and a pitch between raised tabs can be varied along a surface of the drive beam. The voltage used to actuate the actuator is, in part, related to the shape and relative position of the load and drive beams. The raised tabs can be sized, spaced, or positioned to affect a desired rest position and rest shape of the drive beam relative to the load beam.

公开(公告)号：US20160096729A1

公开(公告)日：2016-04-07

申请号：US14508342

申请日：2014-10-07

Applicant: Pixtronix, Inc.

Inventor： Javier Villarreal ,  Timothy Brosnihan ,  Chin-Yuan Ho ,  Hung-Chien Lin

IPC: B81C1/00 ,  B81B7/02 ,  G06T1/20 ,  B81B3/00

CPC classification number: G06T1/20 ,  B81B2201/045 ,  B81B2201/047 ,  B81B2203/0307 ,  B81C1/0019 ,  B81C2201/0108 ,  B81C2201/0132 ,  B81C2201/014 ,  B81C2201/0181 ,  G02B26/02

Abstract: This disclosure provides systems, methods and apparatus including processes that use two layers of resist, with a layer of etch stop material in between. The two layers of resist may be etched in separate processes to form devices having vias with sidewalls that extend through both layers of resist

Abstract translation: 本公开提供了包括使用两层抗蚀剂的工艺的系统，方法和设备，其间具有一层蚀刻停止材料。 可以在单独的工艺中蚀刻两层抗蚀剂，以形成具有延伸穿过两层抗蚀剂的侧壁的通路的器件