公开(公告)号：US20120181166A1

公开(公告)日：2012-07-19

申请号：US13007228

申请日：2011-01-14

申请人： QIAN LUO ,  Ye Xu ,  Tza-Jing Gung ,  Xianmin Tang

发明人： QIAN LUO ,  Ye Xu ,  Tza-Jing Gung ,  Xianmin Tang

IPC分类号： C23C14/35

CPC分类号： C23C14/345 ,  C23C14/3492 ,  C23C14/35 ,  H01J37/3455

摘要： Embodiments of the present invention generally relate to methods for physical vapor deposition processes. The methods generally include synchronizing process chamber conditions with the position of a magnetron. As the magnetron is scanned over a first area of a target, the conditions within the chamber are adjusted to a first set of predetermined process conditions. As the magnetron is subsequently scanned over a second area of the target, the conditions within the chamber are adjusted to a second set of predetermined process conditions different the first set. The target may be divided into more than two areas. By correlating the position of the magnetron with different sets of process conditions, film uniformity can be improved by reducing center-to-edge non-uniformities, such as re-sputter rates which may be higher when the magnetron is near the edge of the target.

摘要翻译： 本发明的实施方案一般涉及物理气相沉积方法的方法。 方法通常包括使处理室条件与磁控管的位置同步。 当磁控管在目标的第一区域上被扫描时，腔室内的条件被调整到第一组预定的工艺条件。 随着磁控管随后在目标的第二区域上扫描，腔室内的条件被调整到与第一组不同的第二组预定过程条件。 目标可分为两个以上的区域。 通过将磁控管的位置与不同的工艺条件相关联，可以通过减小中心到边缘的不均匀性来改善膜均匀性，例如当磁控管靠近靶的边缘时可能更高的再溅射速率 。

公开(公告)号：US20120024229A1

公开(公告)日：2012-02-02

申请号：US13195171

申请日：2011-08-01

申请人： GUOJUN LIU ,  XIANMIN TANG ,  QIAN LUO ,  YONG CAO

发明人： GUOJUN LIU ,  XIANMIN TANG ,  QIAN LUO ,  YONG CAO

IPC分类号： C23C16/511 ,  H01F7/02

CPC分类号： H04M3/58 ,  H01F7/0278 ,  H01J37/3408 ,  H01J37/3461 ,  H04L65/1016 ,  H04M2207/18 ,  H04W48/20 ,  H04W60/00 ,  H04W76/10

摘要： Magnetrons for use in physical vapor deposition (PVD) chambers and methods of use thereof are provided herein. In some embodiments, an apparatus may include a support member having an axis of rotation; a plurality of first magnets coupled to the support member on a first side of the axis of rotation and having a first polarity oriented in a first direction perpendicular to the support member; and a second magnet coupled to the support member on a second side of the axis of rotation opposite the first side and having a second polarity oriented in a second direction opposite the first direction. In some embodiments, the apparatus is capable of forming a magnetic field including one or more magnetic nulls that modulate local plasma uniformity in a physical vapor deposition (PVD) chamber.

摘要翻译： 本文提供了用于物理气相沉积（PVD）室的磁控管及其使用方法。 在一些实施例中，装置可以包括具有旋转轴线的支撑构件; 多个第一磁体，其在所述旋转轴线的第一侧上联接到所述支撑构件，并且具有在垂直于所述支撑构件的第一方向上定向的第一极性; 以及第二磁体，其在所述旋转轴线的与所述第一侧相反的第二侧上与所述支撑构件相耦合，并且具有在与所述第一方向相反的第二方向上定向的第二极性。 在一些实施例中，该装置能够形成包括调制物理气相沉积（PVD）室中的局部等离子体均匀性的一个或多个磁零点的磁场。