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    Intaglio printing plate coating apparatus
    2.
    发明授权
    Intaglio printing plate coating apparatus 有权

    公开(公告)号：US09970096B2

    公开(公告)日：2018-05-15

    申请号：US15588627

    申请日：2017-05-06

    Applicant: KBA-NOTASYS SA

    Inventor： François Gremion ,  Laurent Claude

    IPC: C23C14/35 ,  C23C14/24 ,  B41F9/00

    CPC classification number: C23C14/24 ,  B41F9/00 ,  B41N3/003 ,  C23C14/14 ,  C23C14/165 ,  C23C14/3464 ,  C23C14/35 ,  C23C14/46 ,  C23C14/50 ,  H01J37/3405 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3447 ,  H01J37/3461 ,  H01J2237/332

    Abstract: There is described an intaglio printing plate coating apparatus comprising a vacuum chamber having an inner space adapted to receive at least one intaglio printing plate to be coated, a vacuum system coupled to the vacuum chamber adapted to create vacuum in the inner space of the vacuum chamber, and a physical vapour deposition (PVD) system adapted to perform deposition of wear-resistant coating material under vacuum onto an engraved surface of the intaglio printing plate, which physical vapour deposition system includes at least one coating material target comprising a source of the wear-resistant coating material to be deposited onto the engraved surface of the intaglio printing plate. The vacuum chamber is arranged so that the intaglio printing plate to be coated sits substantially vertically in the inner space of the vacuum chamber with its engraved surface facing the at least one coating material target. The intaglio printing plate coating apparatus further comprises a movable carrier located within the inner space of the vacuum chamber and adapted to support and cyclically move the intaglio printing plate in front of and past the at least one coating material target.

    Magnetic-field-generating apparatus for magnetron sputtering
    4.
    发明授权
    Magnetic-field-generating apparatus for magnetron sputtering 有权
    用于磁控溅射的磁场产生装置

    公开(公告)号：US09580797B2

    公开(公告)日：2017-02-28

    申请号：US13981252

    申请日：2012-01-12

    Applicant: Yoshihiko Kuriyama ,  Masahiro Mita

    Inventor： Yoshihiko Kuriyama ,  Masahiro Mita

    IPC: C23C14/34 ,  C23C14/35 ,  H01J37/34

    CPC classification number: C23C14/351 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/345 ,  H01J37/3452 ,  H01J37/3461

    Abstract: A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a linear portion and corner portions, the linear portion comprising a magnetic base, a center permanent magnet disposed on its surface, and side permanent magnets disposed on both sides thereof with a gap; the center and side permanent magnets being vertically magnetized with opposite polarities; the corner portions comprising a non-magnetic base, a center magnetic pole member disposed on its surface, a semicircular or semi-polygonal, peripheral magnetic pole member, and plural permanent magnets arranged between both magnetic pole members with their magnetization directions in parallel to a target surface; and the magnetic poles of plural permanent magnets opposing the center magnetic pole member having the same polarity as those of the center permanent magnet opposing the target.

    Abstract translation: 一种用于磁控溅射的赛道形磁场产生装置，包括直线部分和角部分，线性部分包括磁性基座，设置在其表面上的中心永磁​​体和设置在其两侧的侧面永久磁体，间隙 ; 中心和侧面永磁体以相反的极性垂直磁化; 所述角部包括非磁性基座，设置在其表面上的中心磁极部件，半圆形或半多边形的外围磁极部件，以及布置在两个磁极部件之间的多个永磁体，其磁化方向与 目标表面 以及与中心磁极构件相对的多个永久磁铁的磁极与与靶相对的中心永磁​​体的极性相同。

    MAGNETRON ASSEMBLY FOR PHYSICAL VAPOR DEPOSITION CHAMBER
    5.
    发明申请
    MAGNETRON ASSEMBLY FOR PHYSICAL VAPOR DEPOSITION CHAMBER 有权
    用于物理蒸气沉积室的MAGNETRON装配

    公开(公告)号：US20160035547A1

    公开(公告)日：2016-02-04

    申请号：US14725527

    申请日：2015-05-29

    Applicant: APPLIED MATERIALS, INC.

    Inventor： WILLIAM JOHANSON ,  BRIJ DATTA ,  FUHONG ZHANG ,  ADOLPH MILLER ALLEN ,  YU Y. LIU ,  PRASHANTH KOTHNUR

    IPC: H01J37/34 ,  C23C14/35

    CPC classification number: H01J37/3405 ,  C23C14/35 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3461

    Abstract: Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.

    Abstract translation: 本文提供了磁控管组件的方法和装置。 在一些实施例中，磁控管组件包括具有中心轴线并可围绕中心轴线旋转的分流板，耦合到分流板的第一表面并沿分流板的周边边缘设置360度的闭环磁极，以及 耦合在分流板的第一表面处的开环磁极，其中开环磁极包括围绕中心轴设置的两排磁体。

    Rotation Plus Vibration Magnet for Magnetron Sputtering Apparatus
    6.
    发明申请
    Rotation Plus Vibration Magnet for Magnetron Sputtering Apparatus 有权
    用于磁控溅射装置的旋转加振动磁铁

    公开(公告)号：US20130213797A1

    公开(公告)日：2013-08-22

    申请号：US13397957

    申请日：2012-02-16

    Applicant: Bo-Hung Lin ,  Ming-Chih Tsai ,  You-Hua Chou ,  Chung-En Kao

    Inventor： Bo-Hung Lin ,  Ming-Chih Tsai ,  You-Hua Chou ,  Chung-En Kao

    IPC: C23C14/35

    CPC classification number: C23C14/351 ,  C23C14/35 ,  H01J37/32669 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3461

    Abstract: In some embodiments, the present disclosure relates to a plasma processing system comprising a magnetron configured to provide a symmetric magnetic track through a combination of vibrational and rotational motion. The disclosed magnetron comprises a magnetic element configured to generate a magnetic field. The magnetic element is attached to an elastic element connected between the magnetic element and a rotational shaft configured to rotate magnetic element about a center of the sputtering target. The elastic element is configured to vary its length during rotation of the magnetic element to change the radial distance between the rotational shaft and the magnetic element. The resulting magnetic track enables concurrent motion of the magnetic element in both an angular direction and a radial direction. Such motion enables a symmetric magnetic track that provides good wafer uniformity and a short deposition time.

    Abstract translation: 在一些实施例中，本公开涉及等离子体处理系统，其包括被配置为通过振动和旋转运动的组合提供对称磁轨的磁控管。 所公开的磁控管包括被配置为产生磁场的磁性元件。 磁性元件附接到连接在磁性元件和旋转轴之间的弹性元件，该旋转轴构造成围绕溅射靶的中心旋转磁性元件。 弹性元件构造成在磁性元件的旋转期间改变其长度以改变旋转轴和磁性元件之间的径向距离。 由此产生的磁道能够使磁性元件在角度方向和径向方向上同时运动。 这样的运动能够提供良好的晶片均匀性和较短的沉积时间的对称磁迹。

    Cylindrical Magnetron Having a Shunt
    8.
    发明申请
    Cylindrical Magnetron Having a Shunt 有权
    具有分流的圆柱形磁控管

    公开(公告)号：US20110186427A1

    公开(公告)日：2011-08-04

    申请号：US12887065

    申请日：2010-09-21

    Applicant: Mark A. Bernick ,  Richard Newcomb

    Inventor： Mark A. Bernick ,  Richard Newcomb

    IPC: C23C14/35 ,  C23C14/54

    CPC classification number: H01J37/3461 ,  C23C14/3407 ,  C23C14/35 ,  C23C14/54 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/345 ,  H01J37/347 ,  H01J2237/3323 ,  Y10T29/49002

    Abstract: A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.

    Abstract translation: 一种用于可旋转圆柱形磁控溅射装置的磁控溅射电极，所述电极包括限定磁体接收室的阴极体和围绕阴极体的圆柱形靶。 目标物能够围绕阴极体旋转。磁体装置被容纳在磁体容纳室内，磁体装置包括多个磁体。 分流器固定到阴极体并且靠近磁体装置的一侧，分流器在基本平行于磁体装置侧面的平面中延伸。 还公开了一种在可旋转的圆柱形磁控溅射装置中微调磁控溅射电极的方法。

    Split magnet ring on a magnetron sputter chamber
    9.
    发明授权
    Split magnet ring on a magnetron sputter chamber 有权
    在磁控溅射室上分开磁环

    公开(公告)号：US07618521B2

    公开(公告)日：2009-11-17

    申请号：US11218756

    申请日：2005-09-02

    Applicant: Xinyu Fu

    Inventor： Xinyu Fu

    IPC: C23C14/35

    CPC classification number: H01J37/3408 ,  C23C14/165 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3461

    Abstract: A split magnet ring, particularly useful in a magnetron plasma reactor sputter depositing tantalum or tungsten or other barrier metal into a via and also resputter etching the deposited material from the bottom of the via onto the via sidewalls. The magnet ring includes two annular magnet rings composed of the same axial polarity separated by a non-magnetic spacing of at least the axial length of one magnet and associated poles. A small unbalanced magnetrons rotates about the back of the target having an outer pole of the same polarity as the ring magnets surrounding a weaker inner pole of the opposite pole.

    Abstract translation: 分裂磁环，特别适用于磁控管等离子体反应器中，将钽或钨或其他阻挡金属溅射沉积到通孔中，并且还重新溅射将沉积的材料从通孔的底部蚀刻到通孔侧壁上。 磁环包括由相同的轴向极性组成的两个环形磁环，所述相同的轴向极性由至少一个磁体的轴向长度和相关电极的非磁性间隔分开。 一个小的不平衡磁控管围绕目标的背部转动，该外部磁极的外极与围绕相对极的较弱内极的环形磁体相同。

    Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
    10.
    发明授权
    Magnetically enhanced capacitive plasma source for ionized physical vapor deposition 有权
    用于电离物理气相沉积的磁增强电容等离子体源

    公开(公告)号：US07315128B2

    公开(公告)日：2008-01-01

    申请号：US11381866

    申请日：2006-05-05

    Applicant: Mirko Vukovic ,  Derrek Andrew Russell

    Inventor： Mirko Vukovic ,  Derrek Andrew Russell

    IPC: H01J7/24 ,  H01J17/14

    CPC classification number: H01J37/3405 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32532 ,  H01J37/3266 ,  H01J37/32724 ,  H01J37/3414 ,  H01J37/3461 ,  H01J37/3497 ,  H01J2237/332

    Abstract: A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and maybe a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surface magnet generally parallel to the electrode surface with a magnetic field extending radially over the electrode surface. Side magnets, such as inner and outer annular ring magnets, have polar axes that intersect the electrode with poles closest to the electrode of the same polarity as the adjacent pole of the surface magnet. A ferromagnetic back plate or back magnet interconnects the back poles of the side magnets. A ferromagnetic shield behind the magnet pack confines the field away from the iPVD material source.

    Abstract translation: 用于iPVD的电容等离子体源被浸没在强的局部磁场中，并且可以是用于iPVD的电感耦合等离子体（ICP）源的替代。 源极包括环形电极，其后面具有磁体组件，其包括大致平行于电极表面的表面磁体，其中磁场沿电极表面径向延伸。 诸如内外环形磁铁的侧磁体具有与电极相交的极轴，极点与最靠近与表面磁体的相邻磁极相同极性的电极。 铁磁背板或后磁铁将侧磁体的后极互连。 磁铁组件后面的铁磁屏蔽将场离开iPVD材料源。

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