公开(公告)号：US20120324771A1

公开(公告)日：2012-12-27

申请号：US13169911

申请日：2011-06-27

申请人： RAMIN SAFAVI ,  XIAOPING ZHOU ,  ZHICUN GAO ,  LARRY TAYLOR

发明人： RAMIN SAFAVI ,  XIAOPING ZHOU ,  ZHICUN GAO ,  LARRY TAYLOR

IPC分类号： G09F9/33 ,  H05K7/00

CPC分类号： F21V21/00 ,  G09F9/33 ,  G09F13/0413 ,  G09F21/048 ,  G09F27/008 ,  H05K7/183

摘要： Disclosed is a displayed device having a top and bottom elongate rail and a display module for displaying alpha numeric information to passengers on a mass transit vehicle. The display modules may be mounted along a top and bottom edge directly to the top and bottom elongate rails. End caps are mounted to the ends of the elongate rail forming a structurally sound frame about the display module.

摘要翻译： 公开了一种具有顶部和底部细长轨道的显示装置和用于向公共交通车辆上的乘客显示字母数字信息的显示模块。 显示模块可以沿着顶部和底部边缘直接安装到顶部和底部细长轨道。 端盖安装到细长导轨的端部，形成围绕显示模块的结构上良好的框架。

公开(公告)号：US20150371877A1

公开(公告)日：2015-12-24

申请号：US14840204

申请日：2015-08-31

申请人： XING LIN ,  DOUGLAS A. BUCHBERGER, JR. ,  XIAOPING ZHOU ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

发明人： XING LIN ,  DOUGLAS A. BUCHBERGER, JR. ,  XIAOPING ZHOU ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

IPC分类号： H01L21/67 ,  H01J37/32

CPC分类号： H01L21/67069 ,  H01J37/32532 ,  H01J37/32577 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/6831

摘要： Apparatus for processing a substrate is disclosed herein. In some embodiments, a substrate support may include a substrate support having a support surface for supporting a substrate the substrate support having a central axis; a first electrode disposed within the substrate support to provide RF power to a substrate when disposed on the support surface; an inner conductor coupled to the first electrode about a center of a surface of the first electrode opposing the support surface, wherein the inner conductor is tubular and extends from the first electrode parallel to and about the central axis in a direction away from the support surface of the substrate support; an outer conductor disposed about the inner conductor; and an outer dielectric layer disposed between the inner and outer conductors, the outer dielectric layer electrically isolating the outer conductor from the inner conductor. The outer conductor may be coupled to electrical ground.

摘要翻译： 本文公开了用于处理衬底的装置。 在一些实施例中，衬底支撑件可以包括具有用于支撑衬底的支撑表面的衬底支撑件，衬底支撑件具有中心轴线; 设置在所述基板支撑件内的第一电极，用于当设置在所述支撑表面上时向基板提供RF功率; 内部导体，其围绕第一电极的与支撑表面相对的表面的中心耦合到第一电极，其中内部导体是管状的，并且从第一电极沿着远离支撑表面的方向平行于中心轴并围绕中心轴线延伸 的基板支撑; 设置在内部导体周围的外部导体; 以及设置在所述内部和外部导体之间的外部电介质层，所述外部电介质层将所述外部导体与所述内部导体电隔离。 外部导体可以耦合到电气接地。

公开(公告)号：US20120091108A1

公开(公告)日：2012-04-19

申请号：US13097822

申请日：2011-04-29

申请人： XING LIN ,  DOUGLAS A. BUCHBERGER, Jr. ,  XIAOPING ZHOU ,  VALENTIN TODOROW ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

发明人： XING LIN ,  DOUGLAS A. BUCHBERGER, Jr. ,  XIAOPING ZHOU ,  VALENTIN TODOROW ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

IPC分类号： H05B1/00

CPC分类号： H05B6/105 ,  H01L21/67109 ,  H01L21/6831

摘要： Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.

摘要翻译： 本文提供了在处理期间控制基板的温度的方法和装置。 在一些实施例中，用于保持和控制衬底温度的装置可以包括电介质材料的圆盘; 设置在靠近所述圆盘的表面的所述圆盘中的电极，待保持基板的电极; 以及多个加热器元件，其布置在圆盘中并且布置成同心环以提供独立的温度控制区。

公开(公告)号：US20120097332A1

公开(公告)日：2012-04-26

申请号：US12910547

申请日：2010-10-22

申请人： XING LIN ,  DOUGLAS A. BUCHBERGER, JR. ,  XIAOPING ZHOU ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

发明人： XING LIN ,  DOUGLAS A. BUCHBERGER, JR. ,  XIAOPING ZHOU ,  ANDREW NGUYEN ,  ANCHEL SHEYNER

IPC分类号： C23F1/08

CPC分类号： H01L21/67069 ,  H01J37/32532 ,  H01J37/32577 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/6831

摘要： Apparatus for processing a substrate is disclosed herein. In some embodiments, a substrate support may include a substrate support having a support surface for supporting a substrate the substrate support having a central axis; a first electrode disposed within the substrate support to provide RF power to a substrate when disposed on the support surface; an inner conductor coupled to the first electrode about a center of a surface of the first electrode opposing the support surface, wherein the inner conductor is tubular and extends from the first electrode parallel to and about the central axis in a direction away from the support surface of the substrate support; an outer conductor disposed about the inner conductor; and an outer dielectric layer disposed between the inner and outer conductors, the outer dielectric layer electrically isolating the outer conductor from the inner conductor. The outer conductor may be coupled to electrical ground.

摘要翻译： 本文公开了用于处理衬底的装置。 在一些实施例中，衬底支撑件可以包括具有用于支撑衬底的支撑表面的衬底支撑件，衬底支撑件具有中心轴线; 设置在所述基板支撑件内的第一电极，用于当设置在所述支撑表面上时向基板提供RF功率; 内部导体，其围绕第一电极的与支撑表面相对的表面的中心耦合到第一电极，其中内部导体是管状的，并且从第一电极沿着远离支撑表面的方向平行于中心轴并围绕中心轴线延伸 的基板支撑; 设置在内部导体周围的外部导体; 以及设置在所述内部和外部导体之间的外部电介质层，所述外部电介质层将所述外部导体与所述内部导体电隔离。 外部导体可以耦合到电气接地。

公开(公告)号：US20110180243A1

公开(公告)日：2011-07-28

申请号：US12886255

申请日：2010-09-20

申请人： KALLOL BERA ,  XIAOPING ZHOU ,  DOUGLAS A. BUCHBERGER, JR. ,  ANDREW NGUYEN ,  HAMID TAVASSOLI ,  SURAJIT KUMAR ,  SHAHID RAUF

发明人： KALLOL BERA ,  XIAOPING ZHOU ,  DOUGLAS A. BUCHBERGER, JR. ,  ANDREW NGUYEN ,  HAMID TAVASSOLI ,  SURAJIT KUMAR ,  SHAHID RAUF

IPC分类号： F28F3/12

CPC分类号： F28F3/12 ,  F28F2013/001

摘要： Apparatus for controlling thermal uniformity of a substrate is provided herein. In some embodiments, the thermal uniformity of the substrate may be controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate may be controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate may include a substrate support having a support surface to support a substrate thereon; and a plurality of flow paths having a substantially equivalent fluid conductance disposed within the substrate support to flow a heat transfer fluid beneath the support surface.

摘要翻译： 本文提供了用于控制基板的热均匀性的装置。 在一些实施例中，可以将衬底的热均匀性控制得更均匀。 在一些实施例中，可以将所述衬底的热均匀性控制为以所需图案不均匀。 在一些实施例中，用于控制衬底的热均匀性的装置可以包括具有用于在其上支撑衬底的支撑表面的衬底支撑件; 以及多个流动路径，其具有设置在所述基板支撑件内的基本相当的流体电导，以使传热流体在所述支撑表面下方流动。