公开(公告)号：US09777372B2

公开(公告)日：2017-10-03

申请号：US14453791

申请日：2014-08-07

Applicant: REGENTS OF THE UNIVERSITY OF MINNESOTA

Inventor： Sang-Hyun Oh ,  Xiaoshu Chen

IPC: C23C16/40 ,  C23C16/455 ,  G02B5/00 ,  G02B1/10 ,  B82Y20/00 ,  G02B1/14

CPC classification number: C23C16/45525 ,  B82Y20/00 ,  C23C16/403 ,  G02B1/105 ,  G02B1/14 ,  G02B5/008 ,  Y10S977/784 ,  Y10T29/49002 ,  Y10T428/24628

Abstract: A method for fabricating articles for use in optics, electronics, and plasmonics includes large scale lithography or other patterning and conformal deposition such as by atomic layer deposition.

公开(公告)号：US20150044428A1

公开(公告)日：2015-02-12

申请号：US14453791

申请日：2014-08-07

Applicant: REGENTS OF THE UNIVERSITY OF MINNESOTA

Inventor： Sang-Hyun Oh ,  Xiaoshu Chen

IPC: C23C16/455 ,  G02B1/10 ,  B32B43/00 ,  B32B3/14 ,  B32B37/24 ,  C23C16/06 ,  C23C16/40 ,  G02B5/00 ,  B32B37/00

CPC classification number: C23C16/45525 ,  B82Y20/00 ,  C23C16/403 ,  G02B1/105 ,  G02B1/14 ,  G02B5/008 ,  Y10S977/784 ,  Y10T29/49002 ,  Y10T428/24628

Abstract: A method for fabricating articles for use in optics, electronics, and plasmonics includes large scale lithography or other patterning and conformal deposition such as by atomic layer deposition.

Abstract translation: 用于制造用于光学，电子学和等离子体激元的制品的方法包括大规模光刻或其它图案化和保形沉积，例如通过原子层沉积。