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    X-RAY GENERATOR AND X-RAY ANALYSIS DEVICE
    1.
    发明申请
    X-RAY GENERATOR AND X-RAY ANALYSIS DEVICE 审中-公开

    公开(公告)号：US20190272929A1

    公开(公告)日：2019-09-05

    申请号：US16284777

    申请日：2019-02-25

    申请人： Rigaku Corporation

    发明人： Kazuhiko Omote ,  Takeshi Osakabe ,  Tetsuya Ozawa ,  Licai Jiang ,  Boris Verman

    IPC分类号： G21K1/06 ,  G21K1/02 ,  G01N23/201

    摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

    X-ray generating apparatus
    2.
    发明授权
    X-ray generating apparatus 有权
    X射线发生装置

    公开(公告)号：US09159524B2

    公开(公告)日：2015-10-13

    申请号：US14055453

    申请日：2013-10-16

    申请人： RIGAKU CORPORATION

    发明人： Martin Horvarth ,  Jiri Marsik ,  Ladislav Pina ,  Vaclav Jelinek ,  Naohisa Osaka ,  Kazuhiko Omote ,  Makoto Kambe ,  Licai Jiang ,  Bonglea Kim

    IPC分类号： H01J35/14

    CPC分类号： H01J35/14 ,  H01J2235/081 ,  H01J2235/083

    摘要： The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.

    摘要翻译： X射线产生装置100将电子束e1施加到靶150上以产生X射线x1，并且包括被配置为聚焦电子束e1的永磁体透镜120，设置在电子束侧的校正线圈130 e1相对于永磁体透镜120，并且被配置为在电子束e1的行进方向上校正由永久磁铁透镜120形成的聚焦位置，以及被施加聚焦电子束的目标150。 因此，与一般装置相比，装置结构可以非常紧凑和重量轻。 此外，通过校正线圈130，可以精细地调节磁场的强度，并且可以精细地调整电子束e1的行进方向上的聚焦位置。

    X-ray small angle optical system
    4.
    发明授权
    X-ray small angle optical system 有权

    公开(公告)号：US10429325B2

    公开(公告)日：2019-10-01

    申请号：US15259581

    申请日：2016-09-08

    申请人： Rigaku Corporation

    发明人： Kazuki Ito ,  Kazuhiko Omote ,  Licai Jiang

    IPC分类号： G01N23/201

    摘要： Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

    X-RAY SMALL ANGLE OPTICAL SYSTEM
    5.
    发明申请
    X-RAY SMALL ANGLE OPTICAL SYSTEM 审中-公开
    X射线小角度光学系统

    公开(公告)号：US20170074809A1

    公开(公告)日：2017-03-16

    申请号：US15259581

    申请日：2016-09-08

    申请人： Rigaku Corporation

    发明人： Kazuki ITO ,  Kazuhiko OMOTE ,  Licai Jiang

    IPC分类号： G01N23/201

    摘要： Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

    摘要翻译： 本发明提供一种X射线小角度光学系统，其容易实现期望的角度分辨率，包括：具有微焦点的X射线源; 多层反射镜，具有椭圆反射面，并且被配置为收集从X射线源发射的X射线并照射样品; 以及X射线检测器，被配置为检测从样品产生的散射的X射线，其中多层反射镜的椭圆反射表面具有焦点A和焦点B，其中X射线源被布置成使得 微焦点包括焦点A，其中X射线检测器布置在焦点B的多层反射镜侧。

    Total reflection x-ray fluorescence spectrometer
    6.
    发明授权
    Total reflection x-ray fluorescence spectrometer 有权

    公开(公告)号：US11867646B2

    公开(公告)日：2024-01-09

    申请号：US18034886

    申请日：2021-11-01

    申请人： Rigaku Corporation

    发明人： Makoto Kambe ,  Kazuhiko Omote ,  Toshifumi Higuchi ,  Tsutomu Tada ,  Hajime Fujimura ,  Masahiro Nonoguchi ,  Licai Jiang ,  Boris Verman ,  Yuriy Platonov

    IPC分类号： G01N23/223

    CPC分类号： G01N23/223

    摘要： Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

    X-ray generator and x-ray analysis device
    8.
    发明授权
    X-ray generator and x-ray analysis device 有权

    公开(公告)号：US10854348B2

    公开(公告)日：2020-12-01

    申请号：US16284777

    申请日：2019-02-25

    申请人： Rigaku Corporation

    发明人： Kazuhiko Omote ,  Takeshi Osakabe ,  Tetsuya Ozawa ,  Licai Jiang ,  Boris Verman

    IPC分类号： G21K1/00 ,  G21K1/06 ,  G01N23/201 ,  G21K1/02 ,  H05G1/02

    摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.