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公开(公告)号:US6153350A
公开(公告)日:2000-11-28
申请号:US161148
申请日:1998-09-25
申请人: Recai Sezi , Michael Keitmann , Gunther Schmid
发明人: Recai Sezi , Michael Keitmann , Gunther Schmid
IPC分类号: G03F7/032 , C08G69/32 , C08G69/42 , C08G73/22 , C08G75/32 , G03F7/023 , G03C1/52 , C08G69/00
CPC分类号: G03F7/0233 , C08G73/22 , C08G75/32
摘要: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.6 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.3 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明的聚苯并恶唑和聚苯并噻唑前体具有以下部分结构:其中:A 1至A 6彼此独立地为-H,F,CH 3,CF 3,OCH 3,OCF 3,CH 2 CH 3,CF 2 CF 3,OCH 2 CH 3或OCF 3 CF 3; T为O或S,m为1; Z是碳环或杂环芳族基团。
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公开(公告)号:US06437178B2
公开(公告)日:2002-08-20
申请号:US09901218
申请日:2001-07-09
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: C07G22934
CPC分类号: C07D213/643 , C07C69/92 , C07C217/90
摘要: The invention relates to novel o-aminophenolcarboxylic acids or o-aminothiophenolcarboxylic acids of the following structure in which: A1 to A7 are—independently of one another—H, CH3, OCH3, CH2CH3 or OCH2CH3; T is O or S, and m is 0 or 1; Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新型邻氨基苯甲酸或邻氨基苯硫酚羧酸,其中:A 1至A 7彼此独立地为H,CH 3,OCH 3,CH 2 CH 3或OCH 2 CH 3; T为O或S,m为0 或1; Z是碳环或杂环芳族基团。
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公开(公告)号:US06310238B1
公开(公告)日:2001-10-30
申请号:US09161147
申请日:1998-09-24
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: C07C22910
CPC分类号: C07D213/643 , C07C69/92 , C07C217/90
摘要: The invention relates to novel o-aminophenolcarboxylic acids or o-aminothiophenolcarboxylic acids of the following structure in which: A1 to A7 are—independently of one another—H, CH3, OCH3, CH2CH3 or OCH2CH3; T is O or S, and m is 0 or 1; Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新型邻氨基苯甲酸或邻氨基苯硫酚羧酸,其中:A 1至A 7彼此独立地为H,CH 3,OCH 3,CH 2 CH 3或OCH 2 CH 3; T为O或S,m为0 或1; Z是碳环或杂环芳族基团。
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公开(公告)号:US6120970A
公开(公告)日:2000-09-19
申请号:US161202
申请日:1998-09-25
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: G03F7/032 , C08G69/32 , C08G69/42 , C08G73/22 , C08G75/32 , G03F7/023 , G03C1/52 , C08G69/00
CPC分类号: C08G75/32 , C08G73/22 , G03F7/0233
摘要: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明的聚苯并恶唑和聚苯并噻唑前体具有以下部分结构:其中:A 1至A 7彼此独立地为-H,F,CH 3,CF 3,OCH 3,OCF 3,CH 2 CH 3,CF 2 CF 3,OCH 2 CH 3或OCF 2 CF 3; T为O或S,m为1; Z是碳环或杂环芳族基团。
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公开(公告)号:US6150558A
公开(公告)日:2000-11-21
申请号:US161144
申请日:1998-09-24
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: C07D247/00 , C07C201/12 , C07C205/38 , C07C213/02 , C07C217/90 , C07D239/52 , C07D255/02 , C07D257/12 , C07D487/04 , G03F7/023
CPC分类号: C07C217/90 , C07D239/52 , G03F7/0233
摘要: The invention relates to novel bis-o-aminophenols, and bis-o-aminothiophenols of the following structure: ##STR1## where A.sup.1 to A.sup.6 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.6 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新的双邻氨基苯酚和双-O-氨基噻吩:其中A1至A6彼此独立地为-H,F,CH3,CF3,OCH3,OCF3,CH2CH3,CF2CF3,OCH2CH3 或OCF 2 CF 3,其中基团A1至A6中的至少一个必须为F或含F的基团; T为O或S,m为0或1; Z是碳环或杂环芳族基团。
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公开(公告)号:US05998662A
公开(公告)日:1999-12-07
申请号:US160875
申请日:1998-09-25
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: C07C213/04 , C07B61/00 , C07C217/90 , C07D213/64 , C07D213/643 , C07D213/68 , C07C229/00
CPC分类号: C07D213/643 , C07C217/90 , C07D213/68
摘要: The invention relates to novel o-aminophenolcarboxylic acids, and o-aminothiophenolcarboxylic acids of the following structure: ##STR1## where A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.3 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新型邻氨基苯酚羧酸和邻氨基苯硫酚羧酸:其中A1至A7彼此独立地为-H,F,CH3,CF3,OCH3,OCF3,CH2CH3,CF2CF3,OCH2CH3或OCF2CF3 其中基团A1至A3中的至少一个必须为F或含F的基团; T为O或S,m为0或1; Z是碳环或杂环芳族基团。
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公开(公告)号:US06599687B1
公开(公告)日:2003-07-29
申请号:US09156441
申请日:1998-09-18
申请人: Ewald Günther , Recai Sezi , Michael Keitmann
发明人: Ewald Günther , Recai Sezi , Michael Keitmann
IPC分类号: G03C500
CPC分类号: H01L21/02118 , G03F7/0387 , G03F7/2024 , H01L21/02282 , H01L21/312 , H01L23/3171 , H01L2224/274 , H01L2924/01019 , H01L2924/10253 , H01L2924/12041 , Y10S430/143 , Y10S430/167 , H01L2924/00
摘要: A process for producing structured or patterned protective and insulating layers includes applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying. The layer is patterned or structured by irradiation with UV light or X-rays through the use of a mask or by guidance of a UV or electron beam and by subsequent aqueous-alkali development. The patterned or structured layer is irradiated over the whole area with UV light and then tempered or heat-treated.
摘要翻译: 用于生产结构化或图案化的保护和绝缘层的方法包括将光敏聚羟基酰胺或聚羟基酰亚胺的溶液施加到基底上并干燥。 通过使用掩模或通过UV或电子束的引导以及随后的水 - 碱显影,通过用UV光或X射线照射来对该层进行图案化或结构化。 图案化或结构化层用UV光照射在整个区域上,然后进行回火或热处理。
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公开(公告)号:US06320081B1
公开(公告)日:2001-11-20
申请号:US09161149
申请日:1998-09-24
申请人: Michael Keitmann , Recai Sezi , Andreas Weber
发明人: Michael Keitmann , Recai Sezi , Andreas Weber
IPC分类号: C07C32124
CPC分类号: C07C205/38 , C07C205/37 , C07C323/09
摘要: The invention relates to novel o-nitrophenol derivatives and o-nitrothiophenol derivatives of the following structure: where: A1 to A3 are—independently of one another—H, F, CH3, CF3, OCH3, OCF3, CH2CH3, CF2CF3, OCH2CH3 or OCF2CF3; T is O or S; R is an aliphatic or araliphatic radical; and R* is H or R.
摘要翻译: 本发明涉及以下结构的新型邻硝基苯酚衍生物和邻硝基苯硫酚衍生物:其中:A 1至A 3彼此独立地为-H,F,CH 3,CF 3,OCH 3,OCF 3,CH 2 CH 3,CF 2 CF 3,OCH 2 CH 3或OCF 2 CF 3 ; T为O或S; R是脂族或芳脂族基; 和R *是H或R.
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公开(公告)号:US06156902A
公开(公告)日:2000-12-05
申请号:US161549
申请日:1998-09-24
申请人: Recai Sezi , Michael Keitmann , Andreas Weber
发明人: Recai Sezi , Michael Keitmann , Andreas Weber
IPC分类号: C07D247/00 , C07C217/90 , C07C319/14 , C07C323/31 , C07D213/60 , C07D213/69 , C07D255/02 , C07D257/12 , C07D471/04 , C07D211/72 , C07C221/00
CPC分类号: C07D213/69 , C07C217/90
摘要: The invention relates to novel bis-o-aminophenols, and bis-o-aminothiophenols of the following structure: ##STR1## where A.sup.1 to A.sup.3 are--independently of one another--H, CH.sub.3, OCH.sub.3, CH.sub.2 CH.sub.3, or OCH.sub.2 CH.sub.3T is O or S, andZ is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新型双邻氨基苯酚和双-O-氨基噻吩酚:其中A1至A3彼此独立地为H,CH3,OCH3,CH2CH3或OCH2CH3,T为O或S,以及 Z是碳环或杂环芳族基团。
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公开(公告)号:US6096921A
公开(公告)日:2000-08-01
申请号:US388274
申请日:1999-09-01
申请人: Recai Sezi , Michael Keitmann
发明人: Recai Sezi , Michael Keitmann
IPC分类号: C07C213/04 , C07B61/00 , C07C217/90 , C07D213/64 , C07D213/643 , C07D213/68 , C07C215/28 , C07C229/08 , C07C229/34 , C07C321/30
CPC分类号: C07D213/643 , C07C217/90 , C07D213/68
摘要: The invention relates to novel o-aminophenolcarboxylic acids, and o-aminothiophenolcarboxylic acids of the following structure: ##STR1## where A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3, where at least one of the radicals A.sup.1 to A.sup.3 must be F or an F-containing group; T is O or S, and m is 0 or 1; and Z is a carbocyclic or heterocyclic aromatic radical.
摘要翻译: 本发明涉及以下结构的新型邻氨基苯酚羧酸和邻氨基苯硫酚羧酸:其中A1至A7彼此独立地为-H,F,CH3,CF3,OCH3,OCF3,CH2CH3,CF2CF3,OCH2CH3或OCF2CF3 其中基团A1至A3中的至少一个必须为F或含F的基团; T为O或S,m为0或1; Z是碳环或杂环芳族基团。
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