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8 条记录 (耗时 0.025 秒)

    Transmission, shiftable in a track pattern
    3.
    发明授权
    Transmission, shiftable in a track pattern 失效
    传输，以轨迹模式移位

    公开(公告)号：US06722219B2

    公开(公告)日：2004-04-20

    申请号：US10047979

    申请日：2002-01-14

    申请人： Reinhard Berger ,  Marc Hauptmann ,  Michael Gallion ,  Martin Vornehm ,  Martin Zimmermann

    发明人： Reinhard Berger ,  Marc Hauptmann ,  Michael Gallion ,  Martin Vornehm ,  Martin Zimmermann

    IPC分类号： F16H5902

    CPC分类号： F16H61/28 ,  F16H59/68 ,  F16H59/70 ,  F16H61/12 ,  F16H2061/1208 ,  F16H2061/1224 ,  F16H2061/1284 ,  Y10T74/19251 ,  Y10T74/1926

    摘要： A motor vehicle transmission is shiftable in a track pattern with a selector track and shift tracks. A shifter element moves along the tracks when the transmission is shifted from one gear ratio to another. The shifts are directed by a control device sending command signals to an actuator device which, in turn, applies an actuating force to the transmission. A main position-detecting device detects the position of the shifter element relative to the selector track and shift tracks, and a redundant position-detecting device performs an additional, redundant determination of the shifter-element position.

    摘要翻译： 机动车辆变速器可以在具有选择器轨道和换档轨道的轨道图案中移动。 当变速器从一个齿轮比转换到另一个齿轮比时，换档元件沿轨道移动。 换档由控制装置引导，该控制装置向执行器装置发送指令信号，致动器装置又向传动装置施加致动力。 主位置检测装置检测移位元件相对于选择器轨道和移位轨迹的位置，并且冗余位置检测装置执行移位元件位置的额外冗余确定。

    Method and Apparatus for Cleaning Semiconductor Substrates
    7.
    发明申请
    Method and Apparatus for Cleaning Semiconductor Substrates 有权
    用于清洁半导体衬底的方法和装置

    公开(公告)号：US20120266912A1

    公开(公告)日：2012-10-25

    申请号：US13453832

    申请日：2012-04-23

    申请人： Paul Mertens ,  Steven Brems ,  Elisabeth Camerotto ,  Marc Hauptmann

    发明人： Paul Mertens ,  Steven Brems ,  Elisabeth Camerotto ,  Marc Hauptmann

    IPC分类号： B08B3/12 ,  B08B13/00

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  H01L21/02096

    摘要： The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.

    摘要翻译： 本发明涉及用于清洗衬底，特别是诸如硅晶片的半导体衬底的方法和装置。 将衬底相对于在所述液体中产生的声波以一定角度放置在包含清洁液体的容器中。 该角度对应于透射角，即波不会从基板表面反射的角度。 阻尼材料设置在罐中，布置成吸收基本上所有这样透过基底的波。 通过本发明的方法可以获得清洁效率方面的显着改进。

    Method and apparatus for cleaning semiconductor substrates
    8.
    发明授权
    Method and apparatus for cleaning semiconductor substrates 有权
    用于清洁半导体衬底的方法和装置

    公开(公告)号：US09378989B2

    公开(公告)日：2016-06-28

    申请号：US13453832

    申请日：2012-04-23

    申请人： Paul Mertens ,  Steven Brems ,  Elisabeth Camerotto ,  Marc Hauptmann

    发明人： Paul Mertens ,  Steven Brems ,  Elisabeth Camerotto ,  Marc Hauptmann

    IPC分类号： B08B3/12 ,  B08B13/00 ,  H01L21/67 ,  H01L21/02

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  H01L21/02096

    摘要： The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.

    摘要翻译： 本发明涉及用于清洗衬底，特别是诸如硅晶片的半导体衬底的方法和装置。 将衬底相对于在所述液体中产生的声波以一定角度放置在包含清洁液体的容器中。 该角度对应于透射角，即波不会从基板表面反射的角度。 阻尼材料设置在罐中，布置成吸收基本上所有这样透过基底的波。 通过本发明的方法可以获得清洁效率方面的显着改进。