Semiconductor Device
    1.
    发明申请
    Semiconductor Device 有权
    半导体器件

    公开(公告)号:US20150115342A1

    公开(公告)日:2015-04-30

    申请号:US14517657

    申请日:2014-10-17

    Abstract: Provided is a semiconductor device including a substrate of a first conductivity type, a first circuit region, a separation region, a second circuit region, and a rectifying element. The rectifying element has a second conductivity type layer, a first high concentration second conductivity type region, a second high concentration second conductivity type region, an element isolation film, a first insulation layer, and a first conductive film. A first contact is coupled to the first high concentration second conductivity type region, and a second contact is coupled to the second high concentration second conductivity type region. A third contact is coupled to the first conductive film. The first contact, the second contact and the third contact are separated from each other.

    Abstract translation: 提供了包括第一导电类型的衬底,第一电路区域,分离区域,第二电路区域和整流元件的半导体器件。 整流元件具有第二导电类型层,第一高浓度第二导电类型区域,第二高浓度第二导电类型区域,元件隔离膜,第一绝缘层和第一导电膜。 第一触点耦合到第一高浓度第二导电类型区域,第二触点耦合到第二高浓度第二导电类型区域。 第三触点耦合到第一导电膜。 第一触点,第二触点和第三触点彼此分离。

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